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Vacuum vapor deposition

  • US 5,380,415 A
  • Filed: 02/03/1994
  • Issued: 01/10/1995
  • Est. Priority Date: 02/03/1994
  • Status: Expired due to Term
First Claim
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1. Apparatus for coating a thin metal film by depositing vapors from a source of the metal onto a substrate spaced from said source, said apparatus comprising an enclosed substantially sealed chamber, a gas tungsten arc welding torch including a torch body mounted within said chamber, an elongated hollow tungsten electrode carried within and electrically insulated from said body, said electrode having a tip disposed externally of said body, an elongated bore extending through said electrode from within said body and opening at said tip, means for supplying a gas to said torch communicating with said bore so that said gas flows out said tip, means for supplying electrical power to said electrode, support means for mounting said source spaced from said tip of said electrode for forming an electrical arc between said tip and said source and for impingement of said gas from said tip upon said source to vaporize a portion of said source, substrate mounting means for mounting said substrate spaced from said electrode and said source for receiving vapors from said source, a shield of electrically non-conductive material disposed about said torch spaced from said tip for reflecting and precluding an arc from forming between said tip and said torch when electrical power is initially supplied to said electrode to form an arc, and means for reducing the pressure within said chamber to a substantial vacuum.

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