Method for reduction of off-current in thin film transistors
First Claim
1. A method of fabricating a thin film transistor (TFT) having relatively low off-current comprising the steps of:
- forming a TFT body having a gate electrode, a gate dielectric layer disposed over said gate electrode, a semiconductor layer disposed over said gate dielectric layer, a doped semiconductor layer disposed over said semiconductor layer, and a source-drain metal layer disposed over said doped semiconductor layer;
forming a channel region in said TFT body, said channel region being exposed and defined by etching said source-drain metal layer, the underlying doped semiconductor layer, and a portion of the underlying semiconductor layer so as to form source and drain electrodes; and
passivating the channel region, the step of passivating further comprising the steps of wet etching the exposed channel region for a first etch time, dry etching the exposed channel region for a second etch time, wet etching the exposed channel region for a third etch time, treating the exposed channel region with a cleansing solution, and annealing the exposed channel region.
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Abstract
A method of fabricating a thin film transistor having reduced off-current leakage includes the steps of forming a TFT body with a channel region disposed between a source electrode and a drain electrode and then passivating the exposed portion of the channel region. The passivation includes the steps of wet etching the exposed portions of the channel region in an hydrofluoric acid etchant for a first selected etch time; dry etching the exposed channel region in a reactive ion etching procedure for a second selected etch time; wet etching the channel region again with hydrofluoric acid for a third selected etch time; and then treating the channel region with a cleansing agent, such as photoresist stripper; and annealing the exposed portion of the channel region.
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Citations
13 Claims
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1. A method of fabricating a thin film transistor (TFT) having relatively low off-current comprising the steps of:
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forming a TFT body having a gate electrode, a gate dielectric layer disposed over said gate electrode, a semiconductor layer disposed over said gate dielectric layer, a doped semiconductor layer disposed over said semiconductor layer, and a source-drain metal layer disposed over said doped semiconductor layer; forming a channel region in said TFT body, said channel region being exposed and defined by etching said source-drain metal layer, the underlying doped semiconductor layer, and a portion of the underlying semiconductor layer so as to form source and drain electrodes; and passivating the channel region, the step of passivating further comprising the steps of wet etching the exposed channel region for a first etch time, dry etching the exposed channel region for a second etch time, wet etching the exposed channel region for a third etch time, treating the exposed channel region with a cleansing solution, and annealing the exposed channel region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification