Polishing apparatus

• US 5,384,986 A
• Filed: 09/22/1993
• Issued: 01/31/1995
• Est. Priority Date: 09/24/1992
• Status: Expired due to Term

• Current Assignee: Ebara Corporation
• Original Assignee: Ebara Corporation
• Inventors: Kimura, Norio, Ishikawa, Seiji, Hirose, Masayoshi, Kawashima, Kiyotaka, Ishii, You
• Primary Examiner(s): Rachuba, Maurina T.
• Application Number:
  US08/124,648
• Time in Patent Office: 496 Days
• Field of Search: 51/262 A, 51/165.78, 51/129, 51/130, 51/131.1, 51/131.2, 51/131.3, 51/131.4, 51/131.5, 51/132, 51/133, 51/134
• US Class Current: 451/444
• CPC Class Codes: B24B 37/26 characterised by the shape of the lapping pad surface, e.g. grooved
• CPC Class Codes: B24B 53/017 Devices or means for dressing, cleaning or otherwise conditioning lapping tools

Abstract

A turntable with an abrasive cloth mounted thereon and a top ring positioned above the turntable are independently rotatably provided. The top ring holds a workpiece to be polished and presses the workpiece against the abrasive cloth. The turntable and the top ring are rotated to polish the surface of the workpiece to a flat mirror finish on the abrasive cloth. A rotatable brush pressed against the abrasive cloth is rotated about an axis substantially perpendicularly to the plane of the abrasive cloth, and oscillated substantially radially between radially inner and outer positions over the abrasive cloth. A cleaning solution is sprayed from a nozzle onto the abrasive cloth. The turntable has a bank along an outer circumferential edge thereof for preventing a protective solution, which is supplied to the abrasive cloth to keep the abrasive cloth wet and prevent it, from flowing off the turntable when the turntable is stationary.

Claims

1. A polishing apparatus for polishing a surface of a workpiece, comprising:

a turntable with an abrasive cloth mounted on an upper surface thereof;

a top ring positioned above said turntable for supporting the workpiece to be polished and pressing the workpiece against said abrasive cloth;

a rotatable brush facing said abrasive cloth;

first actuating means for rotating said rotatable brush about an axis substantially perpendicularly to the plane of said abrasive cloth;

second actuating means for oscillating said rotatable brush substantially radially between radially inner and outer positions over said abrasive cloth; and

a nozzle for supplying a cleaning solution onto said abrasive cloth.

2. The polishing apparatus according to claim 1, wherein said second actuating means comprises an angularly movable arm supporting said brush on one end thereof and a swinging mechanism for oscillating said arm.

3. The polishing apparatus according to claim 1, further comprising means for vertically moving said rotatable brush toward and away from said abrasive cloth.

4. A polishing apparatus for polishing a surface of a workpiece, comprising:

a turntable with an abrasive cloth mounted on an upper surface thereof;

a top ring positioned above said turntable for supporting the workpiece to be polished and pressing the workpiece against said abrasive cloth; and

a bank provided on said turntable along an outer circumferential edge thereof for preventing a protective solution, which is supplied to said abrasive cloth to keep the abrasive cloth from drying when said turntable is held at rest, from flowing off said turntable, said bank having a slanted surface inclined radially inwardly of said turntable for allowing the protective solution to be scattered away from said turntable over said slanted surface under centrifugal forces when said turntable is rotated.

5. The polishing apparatus according to claim 4, further comprising an annular solution retainer fixedly mounted on said turntable along said outer circumferential edge of the turntable, said bank being integrally formed on said annular solution retainer.

6. The polishing apparatus according to claim 4, wherein said bank is integrally formed on said turntable.

7. A polishing apparatus for polishing a surface of a workpiece, comprising:

a turntable with an abrasive cloth mounted on an upper surface thereof;

a top ring positioned above said turntable for supporting the workpiece to be polished and pressing the workpiece against said abrasive cloth;

a rotatable brush facing said abrasive cloth;

first actuating means for rotating said rotatable brush about an axis substantially perpendicular to the plane of said abrasive cloth;

second actuating means for reciprocally moving said rotatable brush substantially radially between radially inner and outer positions over said abrasive cloth;

a nozzle for supplying a cleaning solution onto said abrasive cloth; and

a bank provided on said turntable along an outer circumferential edge thereof for preventing a protective solution, which is supplied to said abrasive cloth to keep the abrasive cloth from drying when said turntable is held at rest, from flowing off said turntable, said bank having a slanted surface inclined downwardly in a radially inward direction of said turntable for allowing the protective solution to be scattered away from said turntable over said slanted surface under centrifugal forces when said turntable is rotated.

8. The polishing apparatus according to claim 7, wherein said second actuating means comprises an angularly movable arm supporting said brush on one end thereof and a swinging mechanism for reciprocally swinging said arm.

9. The polishing apparatus according to claim 7, further comprising means for vertically moving said rotatable brush toward and away from said abrasive cloth.

10. The polishing apparatus according to claim 7, further comprising an annular solution retainer fixedly mounted on said turntable along said outer circumferential edge of the turntable, said bank being integrally formed on said annular solution retainer.

11. The polishing apparatus according to claim 7, wherein said bank is integrally formed on said turntable.