Method for fabricating an optical waveguide

• US 5,385,594 A
• Filed: 12/04/1992
• Issued: 01/31/1995
• Est. Priority Date: 12/06/1991
• Status: Expired due to Fees

• Current Assignee: Sumitomo Electric Industries Limited (Sumitomo Corporation)
• Original Assignee: Sumitomo Electric Industries Limited (Sumitomo Corporation)
• Inventors: Ishikawa, Shinji, Saito, Masahide, Aikawa, Haruhiko, Hirose, Chisai, Urano, Akira, Kanamori, Hiroo
• Primary Examiner(s): Jones, W. Gary
• Assistant Examiner(s): Griffin, Steven P.
• Application Number:
  US07/986,001
• Time in Patent Office: 788 Days
• Field of Search: 65/3.1, 65/3.11, 65/3.12, 65/60.1, 65/60.2, 65/3.2, 65/60.4, 65/60.5, 65/18.2, 385/123, 385/127, 385/128, 385/130, 385/131, 385/132, 427/162, 427/224, 427/419.7, 427/419.6, 427/314, 427/372
• US Class Current: 65/60.2
• CPC Class Codes: C03B 19/14 by gas- or vapour- phase reaction processes
• CPC Class Codes: C03B 19/1453 Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
• CPC Class Codes: C03C 17/02 with glass C03C17/34, C03C17/44 take precedence
• CPC Class Codes: G02B 2006/12038 Glass (SiO2 based materials)
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method

Abstract

In the first step, a fuel and raw material gases are fed to burner while flames from the burner scan a Si substrate. Synthesized fine glass particles are deposited on the substrate to form a first porous vitreous layer to be an under cladding layer. In the second step, the first porous vitreous layer is heated by the flames. A bulk density of an upper part of the first porous vitreous layer is raised to 0.3 g/cm³. Having a raised bulk density, this upper part functions as a shield layer against GeO₂. In the third step, a second porous vitreous layer, to be a core layer, is deposited uniformly on the first porous vitreous layer. In the fourth step, the first and the second porous vitreous layers are sintered. In this case, the shield layer with a higher bulk density hinders the GeO₂ component which has evaporated from the second porous vitreous layer from diffusing into the first porous vitreous layer.

Claims

1. A process for forming an optical waveguide, comprising the steps of:

(a) increasing a bulk density of at least an upper portion of a first porous vitreous layer while the first porous vitreous layer is being formed by Flame Hydrolysis Deposition,

(b) forming a second porous vitreous layer on the first porous vitreous layer by Flame Hydrolysis Deposition, where the second porous vitreous layer contains a refractive index increasing dopant; and

(c) heating the first and second porous vitreous layers to form an under cladding layer and a core layer, respectively, where the under cladding layer and the core layer comprise a transparent glass layer.

2. A process for forming an optical waveguide, comprising the steps of:

(a) depositing glass soot on a substrate by Flame Hydrolysis Deposition to form a first porous vitreous layer,

(b) heating at least an upper portion of the first porous vitreous layer to increase a bulk density of at least the upper portion of the first porous vitreous layer;

(c) depositing glass soot containing a refractive index increasing dopant on the first porous vitreous layer by Flame Hydrolysis Deposition to form a second porous vitreous layer; and

(d) heating the first and second porous vitreous layers to form an under cladding layer and a core layer, respectively, where the under cladding layer and the core layer comprise a transparent glass layer.

3. A process for forming an optical waveguide according to claim 2, further comprising the steps of:

(e) etching the core layer to form an optical waveguide pattern;

(f) depositing glass soot on the optical waveguide pattern and the under cladding layer by Flame Hydrolysis Deposition to form a third porous vitreous layer; and

(g) heating the third porous vitreous layer to form an over cladding layer comprising a transparent glass layer.

4. A process for forming an optical waveguide according to claim 2, wherein

the refractive index increasing dopant comprises at least one selected from a group consisting of GeO₂, P₂ O₅, and Al₂ O₃.

5. A process for forming an optical waveguide according to claim 2, wherein

the upper portion of the first porous vitreous layer has a bulk density of above about 0.3 g/cm³.

6. A process for forming an optical waveguide according to claim 2, wherein

the upper portion of the first porous vitreous layer has a larger bulk density than the bulk density of the second porous vitreous layer.

7. A process for forming an optical waveguide, comprising the steps of:

(a) depositing glass soot on a substrate by Flame Hydrolysis Deposition to form a first porous vitreous layer having a first bulk density, where the first bulk density is larger than a predetermined bulk density;

(b) depositing glass soot containing a refractive index increasing dopant on the first porous vitreous layer to form a second porous vitreous layer having a second bulk density; and

(c) heating the first porous vitreous layer and the second porous vitreous layer to form an under cladding layer and a core layer, respectively, comprising transparent glass layers,

the predetermined bulk density being large enough to substantially prevent the refractive index increasing dopant contained in the second porous vitreous layer from diffusing into the first porous vitreous layer during said step (c).

8. A process for forming an optical waveguide according to claim 7, further comprising the steps of:

(d) etching the core layer to form an optical waveguide pattern;

(e) forming a third porous vitreous layer on the optical waveguide pattern and the under cladding layer by Flame Hydrolysis Deposition; and

(f) heating the third porous vitreous layer to form an over cladding layer comprising a transparent glass layer.

9. A process for forming an optical waveguide according to claim 7, wherein

the refractive index increasing dopant comprises at least one selected from a group consisting of GeO₂, P₂ O₅, and Al₂ O₃.

10. A process for forming an optical waveguide according to claim 7, wherein

the predetermined bulk density is above about 0.3 g/cm³.

11. A process for forming an optical waveguide according to claim 7, wherein

the predetermined bulk density is larger than the second bulk density.