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Method of producing oxide ceramic layers on barrier layer-forming metals and articles produced by the method

  • US 5,385,662 A
  • Filed: 11/25/1992
  • Issued: 01/31/1995
  • Est. Priority Date: 11/27/1991
  • Status: Expired due to Term
First Claim
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1. A method of producing oxide ceramic layers on Al, Mg, Ti, Ta, Zr, Nb, Hf, Sb, W, Mo, V, Bi or their alloys, the method comprising carrying out a plasma-chemical anodic oxidation in a substantially chloride-free electrolytic bath having less than 5×

  • 10-3 mol/l chloride ions and a pH value of 2-8 and a constant bath temperature of between -30°

    to +15°

    C., and maintaining constant in the electrolytic bath a current density of at least 1 A/dm2 until the voltage reaches an end value;

    the electrolytic bath containing phosphate ions, borate ions and fluoride ions in a quantity of up to a total of 2 mol/l, and a stabilizer selected from the group consisting of urea, hexamethylenediamine and hexamethylenetetramine, glycol and glycerin in a quantity of up to 1.5 mol/l.

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