Surface modification to create regions resistant to adsorption of biomolecules

• US 5,391,463 A
• Filed: 04/25/1991
• Issued: 02/21/1995
• Est. Priority Date: 04/14/1988
• Status: Expired due to Fees

• Current Assignee: Geo Corporation, the united states of america as represented by the secretary of the navy
• Original Assignee: Geo Corporation, the united states of america as represented by the secretary of the navy
• Inventors: Ligler, Frances S., Calvert, Jeff, Bhatia, Suresh, Georger, Jacque, Shriver-Lake, Lisa C., Dulcey, Charles
• Primary Examiner(s): NOT, DEFINED
• Assistant Examiner(s): Ashton, Rosemary
• Application Number:
  US07/691,491
• Time in Patent Office: 1,398 Days
• Field of Search: 430/326, 430/327, 430/280, 430/271, 430/272, 430/17, 430/322, 430/325, 430/927, 436/525, 436/527, 436/528, 436/905, 435/176, 435/180, 435/181, 250/492.1, 427/553
• US Class Current: 430/272.1
• CPC Class Codes: B01J 2219/00432 Photolithographic masks
• CPC Class Codes: B01J 2219/00603 Making arrays on substantially continuous surfaces
• CPC Class Codes: B01J 2219/00605 the compounds being directly bound or immobilised to solid supports
• CPC Class Codes: B01J 2219/0061 The surface being organic
• CPC Class Codes: B01J 2219/00612 the surface being inorganic
• CPC Class Codes: B01J 2219/00617 by chemical means
• CPC Class Codes: B01J 2219/00626 Covalent
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: B01J 2219/00711 Light-directed synthesis
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: B82Y 5/00 Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery
• CPC Class Codes: C12N 11/06 attached to the carrier via a bridging agent
• CPC Class Codes: C12N 11/14 Enzymes or microbial cells immobilised on or in an inorganic carrier
• CPC Class Codes: C12N 2535/10 Patterned coating
• CPC Class Codes: C12N 5/0068 General culture methods using substrates for specific animal cell type C12N5/06
• CPC Class Codes: C40B 60/14 for creating libraries
• CPC Class Codes: G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K
• CPC Class Codes: G03F 7/004 Photosensitive materials G03F7/12, G03F7/14 take precedence
• CPC Class Codes: G03F 7/24 : Curved surfaces G03F7/70 takes precedence
• CPC Class Codes: G06N 3/002 : Biomolecular computers, i.e. using biomolecules, proteins, cells using DNA G06N3/123; using neurons G06N3/061
• CPC Class Codes: Y10S 430/128 : Radiation-activated cross-linking agent containing
• CPC Class Codes: Y10S 436/905 : Photochemical activation of reactions

Abstract

Irradiating, with ultraviolet light, surfaces which contain thiol groups, epoxy groups, or vicinal diol groups, results in surfaces which exhibit a reduced adsorption of biomolecules. In the case of surfaces having thiol groups such irradiation also results in a reduced capacity for the bonding of heterobifunctional crosslinking reagents. Such irradiation may be carried out in a patternwise fashion to obtain patterned surfaces.

Claims

1. A method for preparing a patterned surface, comprising:

(i) irradiating in a patternwise fashion with ultraviolet light a surface having thiol groups to obtain a treated surface having (a) an area which has been irradiated and exhibits a resistance to biomolecule adsorption and (b) an area which has not been irradiated; and

(ii) contacting said treated surface with a heterobifunctional crosslinking reagent, which binds to the area of said surface which has not been irradiated, to convert the area of said surface which has not been irradiated to an area which exhibits biomolecule adsorption, wherein said surface having thiol groups is prepared by reacting a substrate with a compound of formula (I) ##STR3## wherein X, Y, and Z are each independently C_1-4 -alkyl or C_1-4 -alkoxy, provided that at least one of X, Y, and Z is C_1-4 -alkoxy, Ar is aryl, n is 1 to 20,n'"'"' is 1 to 20, l is 0 or 1, with the proviso that when l is 0, n'"'"' is 0.

2. The method of claim 1, wherein l is 0.

3. The method of claim 1, wherein n is 3, l is 0, and n'"'"' is 0.

4. The method of claim 1, wherein said irradiating comprises exposing said surface having thiol groups to 0.001 Joules/cm² to 20 Joules/cm² of light having a wavelength of from 0.1 nm to 500 nm.

5. The method of claim 1, wherein said irradiating comprises exposing said surface having thiol groups to 0.01 Joules/cm² to 5 Joules/cm² of light having a wavelength of from 120 nm to 400 nm.

6. A patterned surface, prepared by a method, comprising:

(i) irradiating in a patternwise fashion with ultraviolet light a surface having thiol groups to obtain a treated surface having (a) an area which has been irradiated and exhibits a resistance to biomolecule adsorption and (b) an area which has not been irradiated; and

(ii) contacting said treated surface with a heterobifunctional crosslinking reagent, which binds to the area of said surface which has not been irradiated, to convert the area of said surface which has not been irradiated to an area which exhibits biomolecule adsorption, wherein said surface having thiol groups is prepared by reacting a substrate with a compound of formula (I) ##STR4## wherein X, Y, and Z are each independently C_1-4 -alkyl or C_1-4 -alkoxy, provided that at least one of X, Y, and Z is C_1-4 -alkoxy, Ar is aryl, n is 1 to 20, n'"'"' is 1 to 20, l is 0 or 1, with the proviso that when l is 0, n'"'"' is 0.

7. The surface of claim 6, wherein l is 0.

8. The surface of claim 6, wherein n is 3, l is 0, and n'"'"' is 0.

9. The surface of claim 6, wherein said irradiating comprises exposing said surface having thiol groups to 0.001 Joules/cm² to 20 Joules/cm² of light having a wavelength of from 0.1 nm to 500 nm.

10. The surface of claim 6, wherein said irradiating comprises exposing said surface having thiol groups to 0.01 Joules/cm² to 5 Joules/cm² of light having a wavelength of from 120 nm to 400 nm.