Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control

• US 5,392,124 A
• Filed: 12/17/1993
• Issued: 02/21/1995
• Est. Priority Date: 12/17/1993
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Barbee, Steven G., Heinz, Tony F., Silvestri, Victor J., Hofer, Ulrich, Li, Leping
• Primary Examiner(s): Rosenberger, Richard A.
• Assistant Examiner(s): VIERRA EISENBERG, JASON D
• Application Number:
  US08/169,876
• Time in Patent Office: 431 Days
• Field of Search: 356/382, 356/381, 356/372, 356/369, 156/626
• US Class Current: 356/632
• CPC Class Codes: G01B 11/0683 measurement during deposition or removal of the layer

Abstract

A method and apparatus for detecting an etching endpoint of a film on a substrate whereby a first excitation beam of light having a prescribed wavelength is provided, the first light beam substantially containing only a first harmonic component of light at that wavelength. The first light beam is directed at a prescribed incident angle to an interface between the film and the substrate, the first light beam being reflected off the interface to thereby provide a second light beam, the second light beam containing the first harmonic component of the first light beam and a generated second harmonic component. The generated second harmonic component is detected and a first output signal representative thereof is provided. A generated second harmonic component reference of the first light beam is produced and a second output signal representative of a generated second harmonic component reference is provided. The detected second harmonic component of the first light beam is normalized, as a function of the first and second output signals, in real-time, and a third output signal representative of an occurrence of a prescribed change in the normalized detected second harmonic component is provided. The prescribed change corresponds to the etching endpoint of the film on the substrate.

Claims

1. An apparatus for real-time in-situ detection of an etching endpoint of a film on a substrate during etching of the film, said apparatus comprising:

a) means for providing a first excitation beam of light, the first light beam having a wavelength and furthermore substantially containing only a first harmonic component of light at that wavelength;

b) means for directing the first light beam at a prescribed incident angle to an interface between the film and the substrate, the first light beam being reflected off the interface to thereby provide a second light beam, the second light beam containing the first harmonic component of the first light beam and a generated second harmonic component, the second harmonic component thereof being generated as a result of the reflection of the first light beam off the interface;

c) means for detecting the generated second harmonic component of the first light beam, said detecting means providing a first output signal representative of the detected second harmonic component;

d) means for producing a generated second harmonic component reference of the first light beam, said second harmonic component reference producing means providing a second output signal representative of a generated second harmonic component reference, wherein said second harmonic component reference means comprises i) a beam splitter positioned intermediate said first light beam providing means and said directing means for partially reflecting and partially transmitting the first light beam, the partially reflected portion of the first light beam providing a fourth light beam, wherein the partially transmitted portion of the first light beam is received by said directing means, ii) a third interference filter for filtering the fourth light beam to remove substantially all but a first harmonic component of the fourth light beam, iii) a reference medium for receiving the fourth light beam on a first side thereof and providing a fifth light beam exiting from a second side thereof, the fifth light beam containing the first harmonic component and a generated reference second harmonic component, iv) a specially coated dichroic mirror for efficiently reflecting the generated reference second harmonic component and efficiently transmitting the first harmonic component of the fifth light beam, the reflected portion of the fifth light beam providing a sixth light beam, v) a fourth interference filter for further removing any residual first harmonic component light from the sixth light beam to provide a seventh light beam, the seventh light beam containing substantially the generated reference second harmonic component of the fifth light beam, and vi) a second monochrometer equipped with a photomultiplier tube for receiving the seventh light beam, said second monochrometer providing the second output signal representative of the second harmonic component reference; and

e) means responsive to the first and second output signals for normalizing the generated second harmonic component of the first light beam detected by said detection means in real-time, said real-time normalizing means providing a third output signal representative of an occurrence of a prescribed change in the normalized detected second harmonic component of the first light beam, the prescribed change corresponding to an etching end-point of the film on the substrate.

2. The apparatus of claim 1, wherein

said first light beam providing means comprises a YAG laser for producing light having a wavelength of 1.06 μ

m, said first light beam providing means further comprising a first interference filter for filtering the YAG laser light to substantially contain only a first harmonic component thereof.

3. The apparatus of claim 1, wherein

said first light beam directing means comprises a specially coated dichroic mirror for efficiently reflecting the first light beam and for efficiently transmitting the second light beam.

4. The apparatus of claim 1, wherein

said second harmonic component detecting means comprises i) a second interference filter for filtering the second light beam to provide a third light beam, the third light beam containing substantially only the generated second harmonic component of the first light beam, and ii) a first monochrometer equipped with a photomultiplier tube for receiving the third light beam, said first monochrometer providing the first output signal representative of the detected second harmonic component.

5. The apparatus of claim 1, wherein

said real-time normalizing means comprises means for receiving the first and second output signals and normalizing the first output signal by the second output signal to provide a normalized output signal, said normalizing means further for i) generating a sequence of curve fitting expressions in real-time for a successive series of a prescribed number of data points taken from the normalized output signal, ii) taking a real-time derivative of the sequence of expressions, iii) determining a prescribed peak in the real-time derivative, the peak representative of a precursor to the etching endpoint, and iv) determining the prescribed change in the normalized detected second harmonic component representative of the etching endpoint as a function of the peak.

6. The apparatus of claim 1, further comprising:

f) means responsive to the third output signal for controlling a termination of etching of the film on the substrate.

7. The apparatus of claim 6, wherein

said first light beam providing means comprises a YAG laser for producing light having a wavelength of 1.06 μ

m, said first light beam providing means further comprising a first interference filter for filtering the YAG laser light to substantially contain only a first harmonic component thereof.

8. The apparatus of claim 6, wherein

said first light beam directing means comprises a specially coated dichroic mirror for efficiently reflecting the first light beam and for efficiently transmitting the second light beam.

9. The apparatus of claim 6, wherein

said second harmonic component detecting means comprises i) a second interference filter for filtering the second light beam to provide a third light beam, the third light beam containing substantially only the generated second harmonic component of the first light beam, and ii) a first monochrometer equipped with a photomultiplier tube for receiving the third light beam, said first monochrometer providing the first output signal representative of the detected second harmonic component.

10. The apparatus of claim 6, wherein

said real-time normalizing means comprises means for receiving the first and second output signals and normalizing the first output signal by the second output signal to provide a normalized output signal, said normalizing means further for i) generating a sequence of curve fitting expressions in real-time for a successive series of a prescribed number of data points taken from the normalized output signal, ii) taking a real-time derivative of the sequence of expressions, iii) determining a prescribed peak in the real-time derivative, the peak representative of a precursor to the etching endpoint, and iv) determining the prescribed change in the normalized detected second harmonic component representative of the etching endpoint as a function of the peak.

11. The apparatus of claim 6, wherein:

said control means is operable for terminating the etching of the film by physically removing the substrate from an etching environment.

12. The apparatus of claim 6, wherein:

said control means is operable for terminating the etching of the film by adjusting an effective etchant concentration of an etching environment.

13. The apparatus of claim 1, further comprising:

f) means positioned intermediate said first excitation light beam providing means and said directing means for rotating a polarization of the first light beam.

14. The apparatus of claim 13, wherein

said first light beam providing means comprises a YAG laser for producing light having a wavelength of 1.06 μ

m, said first light beam providing means further comprising a first interference filter for filtering the YAG laser light to substantially contain only a first harmonic component thereof.

15. The apparatus of claim 13, wherein

said first light beam directing means comprises a specially coated dichroic mirror for efficiently reflecting the first light beam and for efficiently transmitting the second light beam.

16. The apparatus of claim 13, wherein

said second harmonic component detecting means comprises i) a second interference filter for filtering the second light beam to provide a third light beam, the third light beam containing substantially only the generated second harmonic component of the first light beam, and ii) a first monochrometer equipped with a photomultiplier tube for receiving the third light beam, said first monochrometer providing the first output signal representative of the detected second harmonic component.

17. The apparatus of claim 13, wherein

said real-time normalizing means comprises means for receiving the first and second output signals and normalizing the first output signal by the second output signal to provide a normalized output signal, said normalizing means further for i) generating a sequence of curve fitting expressions in real-time for a successive series of a prescribed number of data points taken from the normalized output signal, ii) taking a real-time derivative of the sequence of expressions, iii) determining a prescribed peak in the real-time derivative, the peak representative of a precursor to the etching endpoint, and iv) determining the prescribed change in the normalized detected second harmonic component representative of the etching endpoint as a function of the peak.

18. The apparatus of claim 13, further comprising:

g) means responsive to the third output signal for controlling a termination of etching of the film on the substrate.

19. The apparatus of claim 18, wherein:

said control means is operable for terminating the etching of the film by physically removing the substrate from an etching environment.

20. The apparatus of claim 18, wherein:

said control means is operable for terminating the etching of the film by adjusting an effective etchant concentration of an etching solution.

21. A method for real-time in-situ detection of an etching endpoint of a film on a substrate during etching of the film, said method comprising the steps of:

a) providing a first excitation beam of light, the first light beam having a wavelength and furthermore substantially containing only a first harmonic component of light at that wavelength;

b) directing the first light beam at a prescribed incident angle to an interface between the film and the substrate, the first light beam being reflected off the interface to thereby provide a second light beam, the second light beam containing the first harmonic component of the first light beam and a generated second harmonic component, the second harmonic component thereof being generated as a result of the reflection of the first light beam off the interface;

c) detecting the generating second harmonic component of the first light beam and providing a first output signal representative of the detected second harmonic component;

d) producing a generated second harmonic component reference of the first light beam and providing a second output signal representative of a generated second harmonic component reference, wherein producing the generated second harmonic component reference further comprises i) providing a beam splitter positioned for partially reflecting and partially transmitting the first light beam, the partially reflected portion of the first light beam providing a fourth light beam, ii) providing a third interference filter for filtering the fourth light beam to remove substantially all but a first harmonic component of the fourth light beam, iii) providing a reference medium for receiving the fourth light beam on a first side thereof to provide a fifth light beam exiting from a second side thereof, the fifth light beam containing the first harmonic component and a generated reference second harmonic component, iv) providing a specially coated dichroic mirror for efficiently reflecting the generated reference second harmonic component and efficiently transmitting the first harmonic component of the fifth light beam, the reflected portion of the fifth light beam providing a sixth light beam, v) providing a fourth interference filter for further removing any residual first harmonic component light from the sixth light beam to provide a seventh light beam, the seventh light beam containing substantially the generated reference second harmonic component of the fifth light beam, and vi) providing a second monochrometer equipped with a photomultiplier tube for receiving the seventh light beam, the second monochrometer providing the second output signal representative of the second harmonic component reference; and

e) normalizing the generated second harmonic component of the first light beam detected by said detection means in real-time as a function of the first and second output signals, said normalizing step further providing a third output signal representative of an occurrence of a prescribed change in the normalized detected second harmonic component of the first light beam, the prescribed change corresponding to an etching endpoint of the film on the substrate.

22. The method of claim 21, wherein

providing the first light beam further comprises providing a YAG laser for producing light having a wavelength of 1.06 μ

m and further providing a first interference filter for filtering the YAG laser light to substantially contain only a first harmonic component thereof.

23. The method of claim 21, wherein

directing the first light beam further comprises providing a specially coated dichroic mirror for efficiently reflecting the first light beam and for efficiently transmitting the second light beam.

24. The method of claim 21, wherein

detecting the generated second harmonic component further comprises i) providing a second interference filter for filtering the second light beam to provide a third light beam, the third light beam containing substantially only the generated second harmonic component of the first light beam, and ii) providing a first monochrometer equipped with a photomultiplier tube for receiving the third light beam, the first monochrometer providing the first output signal representative of the detected second harmonic component.

25. The method of claim 21, wherein

normalizing the generated second harmonic component further comprises providing a means for receiving the first and second output signals and normalizing the first output signal by the second output signal to provide a normalized output signal, said normalizing step further i) generating a sequence of curve fitting expressions in real-time for a successive series of a prescribed number of data points taken from the normalized output signal, ii) taking a real-time derivative of the sequence of expressions, iii) determining a prescribed peak in the real-time derivative, the peak representative of a prescursor to the etching endpoint, and iv) determining the prescribed change in the normalized detected second harmonic component representative of the etching endpoint as a function of the peak.

26. The method of claim 21, further comprising the step of:

f) controlling a termination of etching of the film on the substrate in response to the third output signal.

27. The method of claim 26, wherein

providing the first light beam further comprises providing a YAG laser for producing light having a wavelength of 1.06 μ

m and further providing a first interference filter for filtering the YAG laser light to substantially contain only a first harmonic component thereof.

28. The method of claim 26, wherein

directing the first light beam further comprises providing a specially coated dichroic mirror for efficiently reflecting the first light beam and for efficiently transmitting the second light beam.

29. The method of claim 26, wherein

detecting the generated second harmonic component further comprises i) providing a second interference filter for filtering the second light beam to provide a third light beam, the third light beam containing substantially only the generated second harmonic component of the first light beam, and ii) providing a first monochrometer equipped with a photomultiplier tube for receiving the third light beam, the first monochrometer providing the first output signal representative of the detected second harmonic component.

30. The method of claim 26, wherein

normalizing the generated second harmonic component further comprises providing a means for receiving the first and second output signals and normalizing the first output signal by the second output signal to provide a normalized output signal, said normalizing step further i) generating a sequence of curve fitting expressions in real-time for a successive series of a prescribed number of data points taken from the normalized output signal, ii) taking a real-time derivative of the sequence of expressions, iii) determining a prescribed peak in the real-time derivative, the peak representative of a precursor to the etching endpoint, and iv) determining the prescribed change in the normalized detected second harmonic component representative of the etching endpoint as a function of the peak.

31. The method of claim 26, wherein:

controlling the termination of the etching of the film further comprises physically removing the substrate from an etching environment.

32. The method of claim 26, wherein:

controlling the termination of the etching of the film further comprises adjusting an effective etchant concentration of an etching environment.

33. The method of claim 21, further comprising the step of:

f) rotating a polarization of the first light beam.

34. The method of claim 33, wherein

providing the first light beam further comprises providing a YAG laser for producing light having a wavelength of 1.06 μ

m and further providing a first interference filter for filtering the YAG laser light to substantially contain only a first harmonic component thereof.

35. The method of claim 33, wherein

directing the first light beam further comprises providing a specially coated dichroic mirror for efficiently reflecting the first light beam and for efficiently transmitting the second light beam.

36. The method of claim 33, wherein

detecting the generated second harmonic component further comprises i) providing a second interference filter for filtering the second light beam to provide a third light beam, the third light beam containing substantially only the generated second harmonic component of the first light beam, and ii) providing a first monochrometer equipped with a photomultiplier tube for receiving the third light beam, the first monochrometer providing the first output signal representative of the detected second harmonic component.

37. The method of claim 33, wherein

normalizing the generated second harmonic component further comprises providing a means for receiving the first and second output signals and normalizing the first output signal by the second output signal to provide a normalized output signal, said normalizing step further i) generating a sequence of curve fitting expressions in real-time for a successive series of a prescribed number of data points taken from the normalized output signal, ii) taking a real-time derivative of the sequence of expressions, iii) determining a prescribed peak in the real-time derivative, the peak representative of a precursor to the etching endpoint, and iv) determining the prescribed change in the normalized detected second harmonic component representative of the etching endpoint as a function of the peak.

38. The method of claim 33, still further comprising the step of:

g) controlling a termination of etching of the film on the substrate in response to the third output signal.

39. The method of claim 38, wherein:

controlling the termination of the etching of the film further comprises physically removing the substrate from an etching environment.

40. The method of claim 38, wherein:

controlling the termination of the etching of the film further comprises adjusting an effective etchant concentration of an etching environment.