Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms

• US 5,398,113 A
• Filed: 02/08/1993
• Issued: 03/14/1995
• Est. Priority Date: 02/08/1993
• Status: Expired due to Term

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: de Groot, Peter
• Primary Examiner(s): Limanek, Robert P.
• Assistant Examiner(s): Hardy, David B.
• Application Number:
  US08/014,707
• Time in Patent Office: 764 Days
• Field of Search: 356/359, 356/349, 356/360, 356/376, 356/384, 356/345, 356/357
• US Class Current: 356/497
• CPC Class Codes: G01B 11/2441 using interferometry
• CPC Class Codes: G01B 9/02083 characterised by particular signal processing and presentation
• CPC Class Codes: G01B 9/02084 Processing in the Fourier or frequency domain when not imaged in the frequency domain
• CPC Class Codes: G01B 9/0209 Low-coherence interferometers

Abstract

An optical system for measuring the topography of an object includes an interferometer with a multiple-color or white-light source, a mechanical scanning apparatus for varying the optical path difference between the object and a reference surface, a two-dimensional detector array, and digital signal processing apparatus for determining surface height from interference data. Interferograms for each of the detector image points in the field of view are generated simultaneously by scanning the object in a direction approximately perpendicular to the illuminated object surface while recording detector data in digital memory. These recorded interferograms for each image point are then transformed into the spatial frequency domain by Fourier analysis, and the surface height for each corresponding object surface point is obtained by examination of the complex phase as a function of spatial frequency. A complete three-dimensional image of the object surface is then constructed from the height data and corresponding image plane coordinates.

Claims

1. A method of topographically profiling a surface of an object, comprising the steps of:

illuminating the object surface and a reference surface in an interferometer with an illumination source so as produce an interference pattern on a two-dimensional detector optically aligned with the object surface and having a plurality of pixels each corresponding to a respective location on the object surface;

(b) varying an optical path difference between the reference surface and the object surface so as to produce at each detector pixel an interferogram for a respective object surface location, each said interferogram being defined by a pixel-received variation in interference illumination intensity for the respective object surface location as the optical path difference is varied;

(c) transforming each said interferogram into the spatial frequency domain to define, for each said pixel, transformed interferogram data, wherein said transformed interferogram data for each said pixel represents relative intensity and interferometric phase of the interferogram received at said each pixel as a function of spatial frequency;

(d) calculating, for each said pixel, a height of the respective object surface location using said transformed interferogram data by determining interferometric phase of the interferogram as a junction of wavenumber using said transformed interferogram data; and

(e) creating a topographical profile of the object surface using the heights calculated in said step (d).

2. The method of claim 1, wherein said step (d) further comprises, for each said pixel:

(i) approximating the interferometric phase as a function of angular wavenumber by a least-squares polynomial fit to said transformed interferogram data; and

(ii) calculating the height of the respective object surface location from coefficients of the polynomial.

3. The method of claim 2, wherein said step (i) further comprises:

(1) locating in said transformed interferogram data a region of high relative intensities as a function of angular wavenumber;

(2) collecting from said region a plurality of data pairs each comprising interferometric phase as a function of angular wavenumber; and

(3) utilizing said collected data pairs for determining the coefficients in said least-squares polynomial.

4. The method of claim 3, further comprising the step of determining mean wavelength and spectral distribution of an illumination source of the interferometer using said transformed interferogram data.

5. The method of claim 3, wherein said step (e) comprises:

(A) determining, for pairs of locations on the object surface, a relative height differential Δ

h between the locations in each said pair using the heights calculated in said step (d); and

(B) providing an improved resolution Δ

h'"'"' of said relative height differential determination Δ

h for each said pair by applying each said Δ

h value to the formula;

##EQU9## wherein n is an index of refraction, α

is a constant phase offset, and φ

₀ and k₀ are an interferometric phase and angular wavenumber, respectively, of a mean emission wavelength spectral peak of an illumination source of the interferometer.

6. The method of claim 1, wherein said step (d) further comprises, for each said pixel:

(i) approximating the interferometric phase as a function of angular wavenumber by a quadratic polynomial fit to said transformed interferogram data; and

(ii) calculating the height of the respective object surface location from coefficients of the polynomial.

7. The method of claim 6, wherein said step (i) further comprises:

(1) locating in said transformed interferogram data a region of high relative intensities as a function of angular wavenumber;

(2) collecting from said region a plurality of data pairs each comprising interferometric phase as a function of angular wavenumber; and

(3) utilizing said collected data pairs for determining the coefficients in said polynomial.

8. The method of claim 7, further comprising the step of determining mean wavelength and spectral distribution of an illumination source of the interferometer using said transformed interferogram data.

9. The method of claim 7, wherein said step (e) comprises:

(A) determining, for pairs of locations on the object surface, a relative height differential Δ

h between the locations in each said pair using the heights calculated in said step (d); and

(B) providing an improved resolution Δ

h'"'"' of said relative height differential determination Δ

h for each said pair by applying each said Δ

h value to the formula;

##EQU10## wherein n is an index of refraction, α

is a constant phase offset, and φ

₀ and k₀ are an interferometric phase and angular wavenumber, respectively, of a mean emission wavelength spectral peak of an illumination source of the interferometer.

10. The method of claim 1, wherein said step (d) further comprises:

(i) determining mean wavelength and spectral distribution of an illumination source of the interferometer using said transformed interferogram data;

(ii) approximating the interferometric phase as a function of angular wavenumber by a polynomial fit to said transformed interferogram data for each said pixel; and

(iii) calculating the height of the respective object surface location for each said pixel from coefficients of the polynomial.

11. The method of claim 10, wherein said step (e) comprises:

(A) determining, for pairs of locations on the object surface, a relative height differential Δ

h between the locations in each said pair using the heights calculated in said step (d); and

(B) providing an improved resolution Δ

h'"'"' of said relative height differential determination Δ

h for each said pair by applying each said Δ

h value to the formula;

##EQU11## wherein n is an index of refraction, α

is a constant phase offset, and φ

₀ and k₀ are an interferometric phase and angular wavenumber, respectively, of a mean emission wavelength spectral peak of an illumination source of the interferometer.

12. The method of claim 11, wherein said polynomial fit comprises a linear least-squares polynomial fit.

13. The method of claim 1, wherein said step (b) further comprises sampling said varying interference illumination intensity received at each said pixel at a rate providing less than two intensity data samples per fringe of the interferogram.

14. The method of claim 1, wherein said illumination source comprises a spectrally-broadband source.

15. The method of claim 1, wherein said illumination source comprises a narrow-band source.

16. A method of determining a height of a location on a three-dimensional object surface, comprising the steps of:

(a) varying an optical path difference between a reference surface and the object surface in an interferometer so as to produce an interferogram on a detector optically aligned with the object surface location;

(b) transforming the interferogram received at the detector into the spatial frequency domain to define transformed interferogram data, wherein said transformed interferogram data represents relative intensity and interferometric phase of the interferogram as a function of spatial frequency; and

(c) calculating the height of the object surface location using said transformed interferogram data by determining the interferometric phase of the interferogram as a function of wavenumber using said transformed interferogram data.

17. The method of claim 16, wherein said interferogram is defined by a varying interference illumination intensity received by the detector as the optical path difference is varied, and wherein said step (a) further comprises sampling said varying interference illumination intensity received at the detector at a rate providing less than two intensity data samples per fringe of the interferogram.

18. The method of claim 16, wherein said step (c) further comprises:

(i) approximating the interferometric phase as a function of angular wavenumber by a polynomial fit to said transformed interferogram data; and

(ii) calculating the height of the object surface location from coefficients of the polynomial.

19. The method of claim 18, wherein said step (i) further comprises:

(1) locating in said transformed interferogram data a region of high relative intensities as a function of angular wavenumber;

(2) collecting from said region a plurality of data pairs each comprising interferometric phase as a function of angular wavenumber; and

(3) utilizing said collected data pairs for determining the coefficients in said polynomial.

20. The method of claim 18, wherein said step (i) comprises approximating the interferometric phase as a function of angular wavenumber by a linear least-squares polynomial fit to said transformed interferogram data.

21. The method of claim 16, wherein said step (c) further comprises:

(i) determining mean wavelength and spectral distribution of an illumination source of the interferometer using said transformed interferogram data;

(ii) approximating the interferometric phase as a function of angular wavenumber by a polynomial fit to said transformed interferogram data; and

(iii) calculating the height of the object surface location from coefficients of the polynomial.

22. A method of determining a height of a location on a three-dimensional object surface, comprising the steps of:

(a) varying an optical path difference between a reference surface and the object surface in an interferometer so as to produce, on a detector optically aligned with the object surface location, an interferogram comprising a plurality of intensity values produced at successive equally spaced apart intervals as the optical path difference is varied;

(b) transforming the interferogram received at the detector into the spatial frequency domain to define transformed interferogram data comprising, for each of a plurality of angular wavenumbers, a relative intensity and an interferometric phase;

(c) locating in said transformed interferogram data a region of high relative intensities as a function of angular wavenumber;

(d) collecting from said located region a plurality of data pairs each comprising an interferometric phase as a function of angular wavenumber;

(e) fitting a polynomial to said data pairs;

(f) determining coefficients of the polynomial; and

(g) calculating the height of the object surface location using said coefficients.

23. The method of claim 22, wherein said polynomial is a linear least-squares polynomial.

24. The method of claim 22, wherein said polynomial is a quadratic polynomial.

25. The method of claim 22, wherein said equally spaced apart intervals are selected so as to provide less than two intensity value samples per fringe of the interferogram.

26. A method of topographically profiling a surface of an object, comprising the steps of:

(a) illuminating the object surface and a reference surface in an interferometer with an illumination source so as produce an interference pattern on a two-dimensional detector optically aligned with the object surface and having a plurality of pixels each corresponding to a respective location on the object surface;

(b) varying an optical path difference between the reference surface and the object surface so as to produce at each detector pixel an interferogram for a respective object surface location, each said interferogram being defined by a pixel-received variation in interference illumination intensity for the respective object surface location as the optical path difference is varied;

(c) transforming each said interferogram into the spatial frequency domain to define, for each said pixel, transformed interferogram data;

(d) calculating, for each said pixel, a height of the respective object surface location using said transformed interferogram data;

(e) creating a topographical profile of the object surface using the heights calculated in said step (d); and

(f) determining mean wavelength and spectral distribution of an illumination source of the interferometer using said transformed interferogram data;

wherein said transformed interferogram data for each said pixel represents relative intensity and interferometric phase of the interferogram received at said each pixel as a function of spatial frequency, and wherein said step (d) comprises, for each said pixel;

(i) approximating the interferometric phase as a function of angular wavenumber by a least-squares polynomial fit to said transformed interferogram data; and

(ii) calculating the height of the respective object surface location from coefficients of the polynomial;

and wherein said step (i) further comprises;

(1) locating in said transformed interferogram data a region of high relative intensities as a function of angular wavenumber;

(2) collecting from said region a plurality of data pairs each comprising interferometric phase as a function of angular wavenumber; and

(3) utilizing said collected data pairs for determining the coefficients in said least-squares polynomial.

27. A method of topographically profiling a surface of an object, comprising the steps of:

(a) illuminating the object surface and a reference surface in an interferometer with an illumination source so as produce an interference pattern on a two-dimensional detector optically aligned with the object surface and having a plurality of pixels each corresponding to a respective location on the object surface;

(b) varying an optical path difference between the reference surface and the object surface so as to produce at each detector pixel an interferogram for a respective object surface location, each said interferogram being defined by a pixel-received variation in interference illumination intensity for the respective object surface location as the optical path difference is varied;

(c) transforming each said interferogram into the spatial frequency domain to define, for each said pixel, transformed interferogram data;

(d) calculating, for each said pixel, a height of the respective object surface location using said transformed interferogram data; and

(e) creating a topographical profile of the object surface using the heights calculated in said step (d);

wherein said transformed interferogram data for each said pixel represents relative intensity and interferometric phase of the interferogram received at said each pixel as a function of spatial frequency, and wherein said step (d) comprises, for each said pixel;

(i) approximating the interferometric phase as a function of angular wavenumber by a least-squares polynomial fit to said transformed interferogram data; and

(ii) calculating the height of the respective object surface location from coefficients of the polynomial;

wherein said step (i) further comprises;

(1) locating in said transformed interferogram data a region of high relative intensities as a function of angular wavenumber;

(2) collecting from said region a plurality of data pairs each comprising interferometric phase as a function of angular wavenumber; and

(3) utilizing said collected data pairs for determining the coefficients in said least-squares polynomial;

and wherein said step (e) comprises;

(A) determining, for pairs of locations on the object surface, a relative height differential Δ

h between the locations in each said pair using the heights calculated in said step (d); and

(B) providing an improved resolution Δ

h'"'"' of said relative height differential determination Δ

h for each said pair by applying each said Δ

h value to the formula;

##EQU12## wherein n is an index of refraction, α

is a constant phase offset, and φ

₀ and k₀ are an interferometric phase and angular wavenumber, respectively, of a mean emission wavelength spectral peak of an illumination source of the interferometer.

28. A method of topographically profiling a surface of an object, comprising the steps of:

(a) illuminating the object surface and a reference surface in an interferometer with an illumination source so as produce an interference pattern on a two-dimensional detector optically aligned with the object surface and having a plurality of pixels each corresponding to a respective location on the object surface;

(b) varying an optical path difference between the reference surface and the object surface so as to produce at each detector pixel an interferogram for a respective object surface location, each said interferogram being defined by a pixel-received variation in interference illumination intensity for the respective object surface location as the optical path difference is varied;

(c) transforming each said interferogram into the spatial frequency domain to define, for each said pixel, transformed interferogram data;

(d) calculating, for each said pixel, a height of the respective object surface location using said transformed interferogram data;

(e) creating a topographical profile of the object surface using the heights calculated in said step (d); and

(f) determining mean wavelength and spectral distribution of an illumination source of the interferometer using said transformed interferogram data;

wherein said transformed interferogram data for each said pixel represents relative intensity and interferometric phase of the interferogram received at said each pixel as a function of spatial frequency, and wherein said step (d) comprises, for each said pixel;

(i) approximating the interferometric phase as a function of angular wavenumber by a quadratic polynomial fit to said transformed interferogram data; and

(ii) calculating the height of the respective object surface location from coefficients of the polynomial;

and wherein said step (i) further comprises;

(1) locating in said transformed interferogram data a region of high relative intensities as a function of angular wavenumber;

(2) collecting from said region a plurality of data pairs each comprising interferometric phase as a function of angular wavenumber; and

(3) utilizing said collected data pairs for determining the coefficients in said polynomial.

29. A method of topographically profiling a surface of an object, comprising the steps of:

(a) illuminating the object surface and a reference surface in an interferometer with an illumination source so as produce an interference pattern on a two-dimensional detector optically aligned with the object surface and having a plurality of pixels each corresponding to a respective location on the object surface;

(b) varying art optical path difference between the reference surface and the object surface so as to produce at each detector pixel an interferogram for a respective object surface location, each said interferogram being defined by a pixel-received variation in interference illumination intensity for the respective object surface location as the optical path difference is varied;

(c) transforming each said interferogram into the spatial frequency domain to define, for each said pixel, transformed interferogram data;

(d) calculating, for each said pixel, a height of the respective object surface location using said transformed interferogram data; and

(e) creating a topographical profile of the object surface using the heights calculated in said step (d);

wherein said transformed interferogram data for each said pixel represents relative intensity and interferometric phase of the interferogram received at said each pixel as a function of spatial frequency, and wherein said step (d) comprises, for each said pixel;

(i) approximating the interferometric phase as a function of angular wavenumber by a quadratic polynomial fit to said transformed interferogram data; and

(ii) calculating the height of the respective object surface location from coefficients of the polynomial;

wherein said step (i) further comprises;

(1) locating in said transformed interferogram data a region of high relative intensities as a function of angular wavenumber;

(2) collecting from said region a plurality of data pairs each comprising interferometric phase as a function of angular wavenumber; and

(3) utilizing said collected data pairs for determining the coefficients in said polynomial;

and wherein said step (e) comprises;

(A) determining, for pairs of locations on the object surface, a relative height differential Δ

h between the locations in each said pair using the heights calculated in said step (d); and

(B) providing an improved resolution Δ

h'"'"' of said relative height differential determination Δ

h for each said pair by applying each said Δ

h value to the formula;

##EQU13## wherein n is an index of refraction, α

is a constant phase offset, and φ

₀ and k₀ are an interferometric phase and angular wavenumber, respectively, of a mean emission wavelength spectral peak of an illumination source of the interferometer.

30. A method of topographically profiling a surface of an object, comprising the steps of:

(a) illuminating the object surface and a reference surface in an interferometer with an illumination source so as produce an interference pattern on a two-dimensional detector optically aligned with the object surface and having a plurality of pixels each corresponding to a respective location on the object surface;

(b) varying an optical path difference between the reference surface and the object surface so as to produce at each detector pixel an interferogram for a respective object surface location, each said interferogram being defined by a pixel-received variation in interference illumination intensity for the respective object surface location as the optical path difference is varied;

(c) transforming each said interferogram into the spatial frequency domain to define, for each said pixel, transformed interferogram data;

(d) calculating, for each said pixel, a height of the respective object surface location using said transformed interferogram data; and

(e) creating a topographical profile of the object surface using the heights calculated in said step (d);

wherein said transformed interferogram data for each said pixel represents relative intensity and interferometric phase of the interferogram received at said each pixel as a function of spatial frequency, and wherein said step (d) comprises;

(i) determining mean wavelength and spectral distribution of an illumination source of the interferometer using said transformed interferogram data;

(ii) approximating the interferometric phase as a function of angular wavenumber by a polynomial fit to said transformed interferogram data for each said pixel; and

(iii) calculating the height of the respective object surface location for each said pixel from coefficients of the polynomial.

31. The method of claim 30, wherein said step (e) comprises:

(A) determining, for pairs of locations on the object surface, a relative height differential Δ

h between the locations in each said pair using the heights calculated in said step (d); and

(B) providing an improved resolution Δ

h'"'"' of said relative height differential determination ah for each said pair by applying each said φ

h value to the formula;

##EQU14## wherein n is an index of refraction, α

is a constant phase offset, and φ

₀ and k₀ are an interferometric phase and angular wavenumber, respectively, of a mean emission wavelength spectral peak of an illumination source of the interferometer.

32. The method of claim 31, wherein said polynomial fit comprises a linear least-squares polynomial fit.

33. A method of determining a height of a location on a three-dimensional object surface, comprising the steps of:

(a) varying an optical path difference between a reference surface and the object surface in an interferometer so as to produce an interferogram on a detector optically aligned with the object surface location;

(b) transforming the interferogram received at the detector into the spatial frequency domain to define transformed interferogram data;

(c) calculating the height of the object surface location using said transformed interferogram data;

wherein said transformed interferogram data represents relative intensity and interferometric phase of the interferogram as a function of spatial frequency, and wherein said step (c) comprises;

(i) determining mean wavelength and spectral distribution of an illumination source of the interferometer using said transformed interferogram data;

(ii) approximating the interferometric phase as a function of angular wavenumber by a polynomial fit to said transformed interferogram data; and

(iii) calculating the height of the object surface location from coefficients of the polynomial.