Time-based attenuation compensation

• US 5,400,384 A
• Filed: 01/25/1994
• Issued: 03/21/1995
• Est. Priority Date: 01/29/1993
• Status: Expired due to Fees

• Current Assignee: GE Medical Systems Global Technology Company LLC (GE Healthcare Technologies, Inc.)
• Original Assignee: OEC Medical Systems Incorporated (GE Healthcare Technologies, Inc.)
• Inventors: Fernandes, Mark, Bush, Donley L., Soderstrom, Chris R., Dorman, DeeAnn
• Primary Examiner(s): Porta, David P.
• Application Number:
  US08/187,106
• Time in Patent Office: 420 Days
• Field of Search: 378/91, 378/95, 378/96, 378/97, 378/101, 378/108, 378/109, 378/110, 378/111, 378/114, 378/112, 378/117
• US Class Current: 378/108
• CPC Class Codes: G21K 5/00 Irradiation devices discharge tubes for irradiating H01J37/00
• CPC Class Codes: H05G 1/26 Measuring, controlling or protecting measuring X-ray radiation G01T
• CPC Class Codes: H05G 1/46 Combined control of different quantities, e.g. exposure time as well as voltage or current

Abstract

A method and apparatus employed in an X-ray apparatus for compensating for attenuation caused by a subject to perform an improved X-ray exposure. A table is created comprising entries accessible via power and attenuation values. Each of the entries includes a first value T representing a time for radiation in the system to reach a base ion count, and a second value C representing an offset ion count from the base ion count. A first set of entries in the table are referenced using a first power setting, and a first base ion count is determined based upon the first power setting, and a maximum radiation exposure is determined for the first power setting and a subject'"'"'s mass. Then, an X-ray emitter is activated until a current ion count from a radiation sampling means has exceeded the base ion count or total radiation emitted has exceeded the maximum radiation allowed for the given mass of a subject. If the current radiation has exceeded the maximum radiation, then the X-ray emitter is deactivated and the process terminates. If the current ion count from the radiation sampling means has exceeded the base ion count, then it is determined whether the base ion count has been offset. If so, then the X-ray emitter is deactivated and the process terminates. If the base ion count has not been offset, then a matching entry is determined from the first set of entries which has the first value T less than or equal to the current exposure. Then, the second value C of the matching entry is added to the base ion count, and the process is repeated until the above conditions are matched.

Claims

1. An exposure control method for controlling an x-ray assembly which generates radiation, comprising the steps of:

(a) determining a first amount of radiation to be generated by the x-ray assembly and attenuated by a subject;

(b) sampling radiation generated by the x-ray assembly after attenuation of the radiation by the subject;

(c) determining a second amount of radiation from the attenuated radiation sampled in step (b);

(d) determining a first exposure time for the second amount of radiation;

(e) determining whether a condition based on the first amount of radiation, the second amount of radiation, and the first exposure time has been satisfied, wherein the determining step (e) includes the step of using a look-up table to determine a second exposure time for the first amount of radiation based on the first exposure time;

(f) if the condition has not been satisfied, repeating steps (b) through (e) until the condition has been satisfied; and

(g) controlling the generation of radiation by the x-ray assembly based on whether the condition has been satisfied.

2. The method of claim 1, wherein the determining step (a) includes the step of determining a base ion count of radiation to be generated by the x-ray assembly and attenuated by the subject;

and

wherein the determining step (c) includes the step of determining an ion count of the attenuated radiation sampled in step (b).

3. The method of claim 1, wherein the determining step (e) comprises the step of determining whether the second amount of radiation exceeds the first amount of radiation.

4. The method of claim 1, further including the steps of:

(h) determining whether the second amount of radiation exceeds a predetermined amount; and

(i) controlling the generation of radiation by the x-ray assembly based on whether the second amount of radiation exceeds the predetermined amount.

5. The method of claim 1, wherein the step of using the look-up table to determine the second exposure time comprises the steps of:

(i) determining a set of time values using the look-up table, and

(ii) selecting one of the time values in the set based on the first exposure time.

6. The method of claim 5, wherein the step of determining the set of time values comprises the step of using the look-up table with a power setting of the x-ray assembly to determine the set of time values.

7. The method of claim 1, wherein the step of using the look-up table to determine the second exposure time comprises the steps of:

(i) determining a set of time values and a set of offset values using the look-up table, and

(ii) selecting one of the time values in the set of time values based on the first exposure time; and

wherein the determining step (e) comprises the steps of;

(i) determining whether the second amount of radiation exceeds the first amount of radiation;

(ii) if the second amount of radiation exceeds the first amount of radiation, determining whether the first amount of radiation has been offset; and

(iii) if the first amount of radiation has not been offset, then

(1) selecting one of the offset values in the set of offset values based on the second exposure time, and

(2) adding the selected offset value to the first amount of radiation to update the first amount of radiation.

8. The method of claim 7, wherein the step of determining the set of time values and the set of offset values comprises the step of using the look-up table with a power setting of the x-ray assembly to determine the set of time values and the set of offset values.

9. An exposure control system for controlling an x-ray assembly which generates radiation, comprising:

(a) means for determining a first amount of radiation to be generated by the x-ray assembly and attenuated by a subject;

(b) means for sampling radiation generated by the x-ray assembly after attenuation of the radiation by the subject;

(c) means for determining a second amount of radiation from the attenuated radiation sampled by the sampling means;

(d) means for determining a first exposure time for the second amount of radiation;

(e) means for determining whether a condition based on the first amount of radiation, the second amount of radiation, and the first exposure time has been satisfied, wherein the condition determining means includes means for using a look-up table to determine a second exposure time for the first amount of radiation based on the first exposure time;

(g) means for activating the sampling means, the second radiation amount determining means, the first exposure time determining means, and the condition determining means until the condition determining means has determined that the condition has been satisfied; and

(h) means for controlling the generation of radiation by the x-ray assembly based on whether the condition has been satisfied.

10. The system of claim 9, wherein the first radiation amount determining means includes means for determining a base ion count of radiation to be generated by the x-ray assembly and attenuated by the subject;

and

wherein the second radiation amount determining means includes means for determining an ion count of the attenuated radiation sampled by the sampling means.

11. The system of claim 9, wherein the condition determining means comprises means for determining whether the second amount of radiation exceeds the first mount of radiation.

12. The system of claim 9, further comprising:

(h) means for determining whether the second amount of radiation exceeds a predetermined amount; and

(i) means for controlling the generation of radiation by the x-ray assembly based on whether the second amount of radiation exceeds the predetermined amount.

13. The system of claim 9, wherein the means for using the look-up table to determine the second exposure time comprises:

(i) means for determining a set of time values using the look-up table, and

(ii) means for selecting one of the time values in the set based on the first exposure time.

14. The system of claim 13, wherein the means for determining the set of time values comprises means for using the look-up table with a power setting of the x-ray assembly to determine the set of time values.

15. The system of claim 9, wherein the means for using the look-up table to determine the second exposure time comprises:

(i) means for determining a set of time values and a set of offset values using the look-up table, and

(ii) means for selecting one of the time values in the set of time values based on the first exposure time; and

wherein the condition determining means comprises;

(i) means for determining whether the second amount of radiation exceeds the first amount of radiation,

(ii) means for determining whether the first amount of radiation has been offset if the second amount of radiation exceeds the first amount of radiation, and

(iii) means for selecting one of the offset values in the set of offset values based on the second exposure time and for adding the selected offset value to the first amount of radiation to update the first amount of radiation if the first amount of radiation has not been offset.

16. The system of claim 15, wherein the means for determining the set of time values and the set of offset values comprises means for using the lookup table with a power setting of the x-ray assembly to determine the set of time values and the set of offset values.

17. A system for controlling radiation exposure, comprising:

(a) an x-ray assembly for generating radiation;

(b) means for determining a first amount of radiation to be generated by the x-ray assembly and attenuated by a subject;

(c) means for sampling radiation generated by the x-ray assembly after attenuation of the radiation by the subject;

(d) means for determining a second amount of radiation from the attenuated radiation sampled by the sampling means;

(e) means for determining a first exposure time for the second amount of radiation;

(f) means for determining whether a condition based on the first amount of radiation, the second amount of radiation, and the first exposure time has been satisfied, wherein the condition determining means includes means for using a look-up table to determine a second exposure time for the first amount of radiation based on the first exposure time;

(g) means for activating the sampling means, the second radiation amount determining means, the first exposure time determining means, and the condition determining means until the condition determining means has determined that the condition has been satisfied; and

(h) means for controlling the generation of radiation by the x-ray assembly based on whether the condition has been satisfied.

18. The system of claim 17, wherein the first radiation amount determining means includes means for determining a base ion count of radiation to be generated by the x-ray assembly and attenuated by the subject;

and

wherein the second radiation amount determining means includes means for determining an ion count of the attenuated radiation sampled by the sampling means.

19. The system of claim 17, wherein the condition determining means comprises means for determining whether the second amount of radiation exceeds the first amount of radiation.

20. The system of claim 17, further comprising:

(i) means for determining whether the second amount of radiation exceeds a predetermined amount; and

(j) means for controlling the generation of radiation by the x-ray assembly based on whether the second amount of radiation exceeds the predetermined amount.

21. The system of claim 17, wherein the means for using the look-up table to determine the second exposure time comprises:

(i) means for determining a set of time values, and

(ii) means for selecting one of the time values in the set based on the first exposure time.

22. The system of claim 21;

wherein the means for determining the set of time values comprises means for using the look-up table with a power setting of the x-ray assembly to determine the set of time values.

23. The system of claim 17, wherein the means for using the look-up table to determine the second exposure time comprises:

(i) means for determining a set of time values and a set of offset values using the look-up table, and

(ii) means for selecting one of the time values in the set of time values based on the first exposure time; and

wherein the condition determining means comprises;

(i) means for determining whether the second amount of radiation exceeds the first amount of radiation,

(ii) means for determining whether the first amount of radiation has been offset if the second amount of radiation exceeds the first amount of radiation, and

(iii) means for selecting one of the offset values in the set of offset values based on the second exposure time and for adding the selected offset value to the first amount of radiation to update the first amount of radiation if the first amount of radiation has not been offset.

24. The system of claim 23, wherein the means for determining the set of time values and the set of offset values comprises means for using the look-up table with a power setting of the x-ray assembly to determine the set of time values and the set of offset values.

25. An exposure control system for controlling an x-ray assembly which generates radiation, comprising:

(a) first circuitry for determining a first amount of radiation to be generated by the x-ray assembly and attenuated by a subject;

(b) a sampler for sampling radiation generated by the x-ray assembly after attenuation of the radiation by the subject;

(c) second circuitry for determining a second amount of radiation from the attenuated radiation sampled by the sampler;

(d) third circuitry for determining a first exposure time for the second amount of radiation;

(e) fourth circuitry for determining whether a condition based on the first amount of radiation, the second amount of radiation, and the first exposure time has been satisfied, wherein the fourth circuitry includes circuitry for using a look-up table to determine a second exposure time for the first amount of radiation based on the first exposure time;

(f) fifth circuitry for activating the sampler, the second circuitry, the third circuitry, and the fourth circuitry until the fourth circuitry has determined that the condition has been satisfied; and

(g) sixth circuitry for controlling the generation of radiation by the x-ray assembly based on whether the condition has been satisfied.

26. The system of claim 25, wherein the first circuitry includes circuitry for determining a base ion count of radiation to be generated by the x-ray assembly and attenuated by the subject;

and

wherein the second circuitry includes circuitry for determining an ion count of the attenuated radiation sampled by the sampler.

27. The system of claim 25, wherein the fourth circuitry comprises circuitry for determining whether the second amount of radiation exceeds the first amount of radiation.

28. The system of claim 25, further comprising:

(h) circuitry for determining whether the second amount of radiation exceeds a predetermined amount; and

(i) circuitry for controlling the generation of radiation by the x-ray assembly based on whether the second amount of radiation exceeds the predetermined amount.

29. The system of claim 25, wherein the circuitry for using the look-up table to determine the second exposure time comprises:

(i) circuitry for determining a set of time values using the look-up table, and

(ii) circuitry for selecting one of the time values in the set based on the first exposure time.

30. The system of claim 29, wherein the circuitry for determining the set of time values comprises circuitry for using the look-up table with a power setting of the x-ray assembly to determine the set of time values.

31. The system of claim 25, wherein the circuitry for using the look-up table to determine the second exposure time comprises:

(i) circuitry for determining a set of time values and a set of offset values using the look-up table, and

(ii) circuitry for selecting one of the time values in the set of time values based on the first exposure time; and

wherein the fourth circuitry comprises;

(i) circuitry for determining whether the second amount of radiation exceeds the first amount of radiation,

(ii) circuitry for determining whether the first amount of radiation has been offset if the second amount of radiation exceeds the first amount of radiation, and

(iii) circuitry for selecting one of the offset values in the set of offset values based on the second exposure time and for adding the selected offset value to the first amount of radiation to update the first amount of radiation if the first amount of radiation has not been offset.

32. The system of claim 31, wherein the circuitry for determining the set of time values and the set of offset values comprises circuitry for using the look-up table with a power setting of the x-ray assembly to determine the set of time values and the set of offset values.

33. A system for controlling radiation exposure, comprising:

(a) an x-ray assembly for generating radiation;

(b) first circuitry for determining a first amount of radiation to be generated by the x-ray assembly and attenuated by a subject;

(c) a sampler for sampling radiation generated by the x-ray assembly after attenuation of the radiation by the subject;

(d) second circuitry for determining a second amount of radiation from the attenuated radiation sampled by the sampler;

(e) third circuitry for determining a first exposure time for the second amount of radiation;

(f) fourth circuitry for determining whether a condition based on the first amount of radiation, the second amount of radiation, and the first exposure time has been satisfied, wherein the fourth circuitry includes circuitry for using a look-up table to determine a second exposure time for the first amount of radiation based on the first exposure time;

(g) fifth circuitry for activating the sampler, the second circuitry, the third circuitry, and the fourth circuitry until the fourth circuitry has determined that the condition has been satisfied; and

(h) sixth circuitry for controlling the generation of radiation by the x-ray assembly based on whether the condition has been satisfied.

34. The system of claim 33, wherein the first circuitry includes circuitry for determining a base ion count of radiation to be generated by the x-ray assembly and attenuated by the subject;

and

wherein the second circuitry includes circuitry for determining an ion count of the attenuated radiation sampled by the sampler.

35. The system of claim 33, wherein the fourth circuitry comprises circuitry for determining whether the second amount of radiation exceeds the first amount of radiation.

36. The system of claim 33, further comprising:

(i) circuitry for determining whether the second amount of radiation exceeds a predetermined amount; and

(j) circuitry for controlling the generation of radiation by the x-ray assembly based on whether the second amount of radiation exceeds the predetermined amount.

37. The system of claim 33, wherein the circuitry for using the look-up table to determine the second exposure time comprises:

(i) circuitry for determining a set of time values using the look-up table, and

(ii) circuitry for selecting one of the time values in the set based on the first exposure time.

38. The system of claim 37, wherein the circuitry for determining the set of time values comprises circuitry for using the look-up table with a power setting of the x-ray assembly to determine the set of time values.

39. The system of claim 33, wherein the circuitry for using the look-up table to determine the second exposure time comprises:

(i) circuitry for determining a set of time values and a set of offset values using the look-up table, and

(ii) circuitry for selecting one of the time values in the set of time values based on the first exposure time; and

wherein the fourth circuitry comprises;

(i) circuitry for determining whether the second amount of radiation exceeds the first amount of radiation,

(ii) circuitry for determining whether the first amount of radiation has been offset if the second amount of radiation exceeds the first amount of radiation, and

(iii) circuitry for selecting one of the offset values in the set of offset values based on the second exposure time and for adding the selected offset value to the first amount of radiation to update the first amount of radiation if the first amount of radiation has not been offset.

40. The system of claim 39, wherein the circuitry for determining the set of time values and the set of offset values comprises circuitry for using the look-up table with a power setting of the x-ray assembly to determine the set of time values and the set of offset values.

41. An exposure control method for controlling an x-ray assembly which generates radiation, comprising the steps of:

(a) determining a first amount of radiation to be generated by the x-ray assembly and attenuated by a subject;

(b) sampling radiation generated by the x-ray assembly after attenuation of the radiation by the subject;

(c) determining a second amount of radiation from the attenuated radiation sampled in step (b);

(d) determining whether a condition has been satisfied based on the first amount of radiation and the second amount of radiation;

(e) if the condition has been satisfied, then

(i) determining an offset value, and

(ii) offsetting the first amount of radiation by the offset value to update the first amount of radiation;

(f) repeating steps (b) through (e) until the first amount of radiation has been updated and the condition has been satisfied based on the updated first amount of radiation and the second amount of radiation; and

(g) controlling the generation of radiation by the x-ray assembly based on whether the condition has been satisfied based on the updated first amount of radiation and the second amount of radiation.

42. The method of claim 41, wherein the determining step (a) includes the step of determining a base ion count of radiation to be generated by the x-ray assembly and attenuated by the subject;

and

wherein the determining step (c) includes the step of determining an ion count of the attenuated radiation sampled in step (b).

43. The method of claim 41, wherein the determining step (d) comprises the step of determining whether the second amount of radiation exceeds the first amount of radiation.

44. The method of claim 41, wherein the offset value determining step (e)(i) includes the steps of:

(A) determining a set of offset values, and

(B) selecting one of the offset values in the set of offset values.

45. The method of claim 44, wherein the step of determining the set of offset values comprises the step of using a look-up table with power setting of the x-ray assembly to determine the set of offset values.

46. The method of claim 44, further comprising the step of:

(h) determining a first exposure time for the second amount of radiation;

wherein the offset value selecting step (e)(i)(B) includes the step of selecting one of the offset values in the set of offset values based on the first exposure time.

47. The method of claim 46, wherein the offset value selecting step (e)(i)(B) includes the steps of:

determining a set of time values,

selecting one of the time values in the set of time values based on the first exposure time, and

selecting one of the offset values in the set of offset values based on the selected time value.

48. An exposure control system for controlling an x-ray assembly which generates radiation, comprising:

(a) first circuitry for determining a first amount of radiation to be generated by the x-ray assembly and attenuated by a subject;

(b) a sampler for sampling radiation generated by the x-ray assembly after attenuation of the radiation by the subject;

(c) second circuitry for determining a second amount of radiation from the attenuated radiation sampled by the sampler;

(d) third circuitry for determining whether a condition has been satisfied based on the first amount of radiation and the second amount of radiation;

(e) fourth circuitry for determining an offset value and for offsetting the first amount of radiation by the offset value to update the first amount of radiation if the condition has been satisfied;

(f) fifth circuitry for activating the sampler, the second circuitry, the third circuitry, and the fourth circuitry until the first amount of radiation has been updated and the condition has been satisfied based on the updated first amount of radiation and the second amount of radiation; and

(g) sixth circuitry for controlling the generation of radiation by the x-ray assembly based on whether the condition has been satisfied based on the updated first amount of radiation and the second amount of radiation.

49. The system of claim 48, wherein the first circuitry includes circuitry for determining a base ion count of radiation to be generated by the x-ray assembly and attenuated by the subject;

and

wherein the second circuitry includes circuitry for determining an ion count of the attenuated radiation sampled by the sampler.

50. The system of claim 48, wherein the third circuitry comprises circuitry for determining whether the second amount of radiation exceeds the first amount of radiation.

51. The system of claim 48, wherein the fourth circuitry includes:

(i) circuitry for determining a set of offset values, and

(ii) circuitry for selecting one of the offset values in the set of offset values.

52. The system of claim 51, wherein the circuitry for determining the set of offset values comprises circuitry for using a look-up table with a power setting of the x-ray assembly to determine the set of offset values.

53. The system of claim 51 further comprising:

(h) circuitry for determining a first exposure time for the second amount of radiation;

wherein the offset value selecting circuitry includes circuitry for selecting one of the offset values in the set of offset values based on the first exposure time.

54. The system of claim 53, wherein the circuitry for selecting one of the offset values includes:

circuitry for determining a set of time values,

circuitry for selecting one of the time values in the set of time values based on the first exposure time, and

circuitry for selecting one of the offset values in the set of offset values based on the selected time value.