Coil configurations for improved uniformity in inductively coupled plasma systems

• US 5,401,350 A
• Filed: 03/08/1993
• Issued: 03/28/1995
• Est. Priority Date: 03/08/1993
• Status: Expired due to Term

• Current Assignee: Lam Research Corporation
• Original Assignee: LSI Logic Corporation (Broadcom, Inc.)
• Inventors: Patrick, Roger, Schoenborn, Philippe, Bose, Frank, Toda, Harry
• Primary Examiner(s): DANG, THI D
• Application Number:
  US08/027,995
• Time in Patent Office: 750 Days
• Field of Search: 156/345, 156/643, 118/723 I, 118/723 IR, 204/298.34, 204/298.06, 315/111.41, 315/111.21
• US Class Current: 156/345.48
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

The present invention relates to an apparatus for generating a low pressure plasma circulating in a planar direction within a process enclosure. The invention generates plasma having substantially uniform density characteristics across a planar axis. The invention achieves improved uniformity of the plasma density by delivering more radio frequency power toward the periphery of the circulating plasma than toward the center of the plasma. Increasing the periphery power to the circulating plasma compensates for increased plasma losses due to interaction with the side walls of the process containment enclosure.

Claims

1. An apparatus for producing a uniformly planar plasma in an inductively coupled plasma system comprised of an enclosure having side walls and a radio frequency transparent face substantially perpendicular to the side walls, means for supplying process gas to be ionized into plasma in the interior of the enclosure, and an interior surface of the enclosure adapted to hold a work piece substantially parallel to the ion plasma flow, said apparatus comprising:

a coil having a variable pitch spiral winding wherein the spacing between the turns of the winding is widest near the center of said coil and the spacing between the turns of the winding progressively decrease away from the center of said coil such that the spacing between the turns of the variable pitch spiral winding is narrower toward the outside radius of said coil than toward its center;

said coil being proximate to the transparent face of the enclosure; and

said coil arranged for connection to a radio frequency power source.

2. The apparatus of claim 1, wherein said coil winding is predominately toward the outside radius of the coil.

3. The apparatus of claim 1, further comprising a means for impedance matching between said coil and the radio frequency power source.

4. An apparatus for producing a uniformly planar plasma in an inductively coupled plasma system comprised of an enclosure having side walls and a radio frequency transparent face substantially perpendicular to the side walls, means for supplying process gas to be ionized into plasma in the interior of the enclosure, and an interior surface of the enclosure adapted to hold a work piece substantially parallel to the ion plasma flow, said apparatus comprising:

a first coil arranged for connection to a first radio frequency power source; and

a second coil arranged for connection to a second radio frequency power source.

5. The apparatus of claim 4, wherein said first and second coils being proximate to the transparent face of the enclosure, said second coil concentrically positioned within said first coil.

6. The apparatus of claim 4, wherein said first coil being proximate to the transparent face of the enclosure, said second coil being proximate to the side walls of the enclosure and positionally biased toward said first coil.

7. The apparatus of claim 4, wherein the first and second radio frequency power sources have the same frequency, but each having independently adjustable power output and phase.

8. An apparatus for producing a uniformly planar plasma in an inductively coupled plasma system comprised of an enclosure having side walls and a radio frequency transparent face substantially perpendicular to the side walls, means for supplying process gas to be ionized into plasma in the interior of the enclosure, and an interior surface of the enclosure adapted to hold a work piece substantially parallel to the ion plasma flow, said apparatus comprising:

an S shaped coil radiating greater radio frequency energy toward the enclosure side walls than toward the enclosure center, wherein a substantially uniform plasma in the enclosure is thereby generated;

said S shaped coil being proximate to the transparent face of the enclosure; and

said S shaped coil arranged for connection to a radio frequency power source.