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Method and system for generating a bit pattern

  • US 5,404,410 A
  • Filed: 01/10/1994
  • Issued: 04/04/1995
  • Est. Priority Date: 05/31/1990
  • Status: Expired due to Fees
First Claim
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1. A system for checking a defect in a figure pattern which is formed on a photomask used for manufacturing a semiconductor integrated circuit element, said figure pattern being defined by predetermined parameters and having predetermined bit dimensions, said system comprising:

  • memory means for storing design data which indicates a figure pattern defined by predetermined parameters and having predetermined bit dimensions;

    a table on which the photomask is placed;

    a driving mechanism for moving the table in X- and Y-directions;

    control means for controlling the driving mechanism;

    a light source for emitting light to the photomask;

    an optical system for optically processing light which has been transmitted through the photomask;

    photodetector means for detecting light output from the optical system so as to obtain bit patterns representing the figure pattern formed on the photomask;

    conditioning means for conditioning parameters of the design data on the basis of a predetermined inspection magnification β

    , a magnification difference Δ

    β

    between the figure pattern indicated by the design data and the figure pattern formed on the photomask, and a scaling factor K;

    developing means for developing the design data into elemental figure data on the basis of the parameters conditioned by the conditioning means;

    a bit pattern generator for generating bit patterns which define the elemental figure data, on the basis of the elemental figure data obtained by the developing means;

    comparison means for comparing, in units of one bit, the bit patterns generated by the generating means and the bit patterns obtained by the photodetector means;

    determination means for determining whether or not the figure pattern formed on the photomask is defective on the basis of comparison results obtained by the comparison means; and

    output means for outputting data representing the presence of a defective bit pattern when the determination means determines that the figure pattern on the photomask is defective.

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