Conveyor apparatus

• US 5,404,894 A
• Filed: 05/18/1993
• Issued: 04/11/1995
• Est. Priority Date: 05/20/1992
• Status: Expired due to Fees

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Kabushiki Kaisha, Tokyo Electron Tohoku Kabushiki Kaisha
• Inventors: Shiraiwa, Hirotsugu
• Primary Examiner(s): Werner, Frank E.
• Application Number:
  US08/062,611
• Time in Patent Office: 693 Days
• Field of Search: 414/217, 414/222, 414/225, 414/331, 414/754, 414/751, 414/752, 414/287, 414/277, 414/273, 414/941, 414/939, 414/937, 414/936, 414/935, 414/416, 414/403, 204/298, 204/25, 118/500, 118/719, 432/239, 432/241, 432/242, 432/244, 134/66
• US Class Current: 134/66
• CPC Class Codes: H01L 21/67167 surrounding a central transfer chamber
• CPC Class Codes: H01L 21/6719 characterized by the construction of the processing chambers, e.g. modular processing chambers
• CPC Class Codes: H01L 21/67745 characterized by movements or sequence of movements of transfer devices
• CPC Class Codes: H01L 21/67781 Batch transfer of wafers
• CPC Class Codes: Y10S 414/136 including wafer orienting means
• CPC Class Codes: Y10S 414/137 including means for charging or discharging wafer cassette
• CPC Class Codes: Y10S 414/141 includes means for gripping wafer

Abstract

A thermal processing station is provided with a first conveyor that conveys a wafer from a first conveyor access portion and a second conveyor that conveys another wafer from a second conveyor access opening portion. The wafer conveyed from the first conveyor is conveyed along a route consisting of the second conveyor, a washing portion, the second conveyor again, the first conveyor, and a thermal processing portion. On the other hand, the wafer conveyed from the second conveyor is conveyed along a route consisting of the washing portion, the second conveyor again, the first conveyor, and the thermal processing portion. An intermediate transfer portion that is free to rotate and rise and lower is provided between the first and second conveyor. A control section does not rotate the intermediate transfer portion while the wafer is being transferred along the former route, but it does rotate the intermediate transfer portion through 180° for the latter route, to keep the orientation of wafers constant during the thermal processing. In this manner, the orientation of objects to be processed, such as semiconductor wafers, can be easily managed during thermal processing.

Claims

1. A conveyor apparatus comprising:

a first conveyor access structure defining a first temporary storage location for an object to be processed;

a first mounting chamber connected to said first conveyor access structure;

a thermal processing structure defining a thermal processing storage location for the object to be processed, said thermal processing structure being connected to said first mounting chamber;

a second conveyor access structure defining a second temporary storage location for the object to be processed;

a second mounting chamber connected to said second conveyor access structure;

a first conveyor means provided in said first mounting chamber for transferring the object to be processed between said first mounting chamber and said first conveyor access structure and between said first mounting chamber and said thermal processing unit;

a second conveyor means provided in said second mounting chamber for transferring the object to be processed;

a freely rotatable intermediate transfer means for transferring the object to be processed, said intermediate transfer means being positioned between said first conveyor means and second conveyor means, and said second conveyor means being dimensioned and arranged for conveying the object to be processed between said intermediate transfer means and said second mounting chamber and between said second conveyor access structure and said second mounting chamber;

a first conveyor moving means for moving said first conveyor means;

a second conveyor moving means for moving said second conveyor means;

an intermediate moving means for moving said intermediate transfer means; and

a control member that controls an orientation of the intermediate transfer means so as to correspondingly control an orientation of the object to be processed which has been transferred to said intermediate transfer means, said control member controlling the orientation of said intermediate transfer means based on a route along which said object to be processed is conveyed to said thermal processing structure, the control being in such a manner that said object to be processed is loaded into said thermal processing structure in a prescribed orientation.

2. The conveyor apparatus according to claim 1, wherein said intermediate transfer portion comprises:

a first transfer opening through which said object to be processed is transferred from said first conveyor means;

a second transfer opening through which said object to be processed is transferred from said second conveyor means;

a rotational means for rotating said intermediate transfer means in such a manner that said first transfer opening and said second transfer opening are at opposite rotational positions; and

elevator means for relatively raising and lowering said intermediate transfer means with respect to said first transfer opening and said second transfer opening;

the conveyor apparatus being further characterized in that a plurality of said objects to be processed are held in a vertical stack.

3. The conveyor apparatus according to claim 1, wherein each of said first conveyor access structure and said second conveyor access structure comprises a cassette chamber, and in that each of said first mounting chamber and said second mounting chamber comprises a loadlock chamber that is designed for evacuation and for being maintained continuously with a N₂ gas atmosphere after evacuation.

4. The conveyor apparatus according to claim 1, wherein said intermediate transfer means includes a batch processing support body.

5. The conveyor apparatus according to claim 1, wherein each of said first conveyor access structure, said first mounting chamber, said thermal processing structure, said second conveyor access structure, said second mounting chamber, and said intermediate transfer means is provided with a gate valve.

6. The conveyor apparatus according to claim 1, wherein said first conveyor means is configured such that the object to be processed is removed from or returned into said first conveyor access structure.

7. The conveyor apparatus according to claim 1, wherein said second conveyor means is configured such that the object to be processed is removed from or returned into said second conveyor access structure.

8. A conveyor apparatus as recited in claim 1, wherein said first conveyor access structure has a first opening at the connection between said first mounting chamber and said first conveyor access structure and a second opening at a second location on said first conveyor access structure for receiving the object to be processed externally, and said second conveyor access structure having a first opening between said second mounting chamber and said second conveyor access structure and a second opening at a second location of said second conveyor access structure for receiving the object to be processed externally;

and said conveyor apparatus further comprising a second treatment processing structure in connection with said second mounting chamber, and said second conveyor means being positioned for conveying the object between said second mounting chamber and said second treatment processing structure, and said second treatment processing structure and said thermal processing structure being positioned such that the object to be processed, originating at said first conveyor access portion and to be treated in said second treatment processing structure prior to thermal treatment, passes along a first route past said intermediate transfer means twice prior to being inserted into said thermal processing structure, and such that the object to be processed, which originates at said second conveyor access structure and is to be treated in said second treatment processing structure prior to thermal treatment, passes along a second route through said intermediate transfer means once prior to entry into said thermal processing structure, and said control member including means for rotating said intermediate transfer means 180°

when the object to be processed travels along said second route and 0°

when the objected to be processed travels along said first route.

9. A conveyor apparatus as recited in claim 8, wherein said second treatment processing structure is a washing structure for washing the object to be processed prior to thermal treatment.

10. A conveyor apparatus as recited in claim 1 further comprising a washing structure connected to said second mounting chamber, and said conveyor apparatus being dimensioned and arranged such that the object to be processed is transferred therethrough along one of a first and a second route, and said control member including means for rotating the object when received in said intermediate transfer means, 180°

when the object is traveling along said first route and 0°

when the object is travelling along said second route.

11. A conveyor apparatus as recited in claim 1 wherein said intermediate transfer means includes means for supporting a semi-conductor wafer with an orientation flat.

12. A conveyor apparatus as recited in claim 1 wherein said intermediate transfer means includes means for supporting multiple objects to be transferred in a horizontal orientation and means to vertically adjust the supported objects.

13. A conveyor apparatus as recited in claim 1 wherein said control member has a first and second setting with the first being one wherein said intermediate transfer means is not rotated and the second setting being one wherein said intermediate transfer means is rotated.