Method of producing micromechanical devices
First Claim
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1. A method for producing a low surface energy wear resistant thin film on the surface of a micromechanical device comprising the steps of:
- a) cleaning said device;
b) activating the surface of said cleaned device;
c) heating said activated surface;
d) heating a source material to produce a vapor, wherein said source material is a long-chain aliphatic halogenated polar compound; and
e) exposing said activated surface to said source material vapor to deposit a passivating layer on said surface.
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Abstract
It is possible to use an oriented monolayer to limit the Van der Waals forces between two elements by passivation. The invention disclosed here details how to do so by building the device to be passivated, cleaning the surface to be passivated, activating the surface, heating it along with the material to be used as the monolayer, exposing a vapor of the material to the surface and evacuating the excess material, leaving only the monolayer.
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Citations
19 Claims
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1. A method for producing a low surface energy wear resistant thin film on the surface of a micromechanical device comprising the steps of:
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a) cleaning said device; b) activating the surface of said cleaned device; c) heating said activated surface; d) heating a source material to produce a vapor, wherein said source material is a long-chain aliphatic halogenated polar compound; and e) exposing said activated surface to said source material vapor to deposit a passivating layer on said surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for producing a low surface energy wear resistant thin film on the surface of a micromechanical device comprising the steps of:
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a) cleaning said device; b) activating the surface of said cleaned device; c) heating said activated surface; d) heating a source material to produce a vapor; and e) exposing said activated surface to said vapor to deposit a passivating layer on said activated surface. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A method for producing a low surface energy wear resistant oriented monolayer on the surface of a deformable micromirror device comprising the steps of:
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a) cleaning said device; b) placing said cleaned device in an oxygen plasma to activate the surface of said cleaned device; c) placing said device and a long-chain aliphatic halogenated polar compound in a covered container; d) heating said covered container in a vacuum oven to produce a vapor of said long-chain aliphatic halogenated polar compound; e) exposing said activated surface to said long-chain aliphatic halogenated polar compound vapor to deposit a passivating layer on said surface. - View Dependent Claims (17, 18, 19)
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Specification