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Ammonia-free deposition of copper by disproportionation

  • US 5,419,926 A
  • Filed: 11/22/1993
  • Issued: 05/30/1995
  • Est. Priority Date: 11/22/1993
  • Status: Expired due to Term
First Claim
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1. A process for the deposition of metallic copper on a catalytically activated surface comprising providing cupric ions in aqueous solution, adding to said cupric ions an ammonia-free reducer to rapidly reduce said cupric ions to cuprous hydroxide, and thereafter effecting disproportionation of the resultant cuprous hydroxide to bring about the deposition of metallic copper principally on said surface.

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