Method of forming vias through two-sided substrate
First Claim
1. A method of forming through-substrate vias in a substrate, comprising the steps of:
- forming a first hollow region through a first substrate;
depositing a first dielectric layer on a first surface of said first substrate and on inner surfaces of said first hollow region;
depositing a first conductive layer through said first hollow region to form a first through-substrate via;
removing said first conductive layer and said first dielectric layer from said first surface of said first substrate to leave said first through-substrate via isolated from said first substrate by said first dielectric layer;
forming a first IC device layer on said first surface of said first substrate with circuit nodes electrically coupled to the through-substrate vias;
forming a first interconnect layer on said first IC device layer;
forming first inter-chip interconnects on said first interconnect layer;
patterning a second dielectric layer on a second surface of said first substrate to provide access to said first through-substrate via; and
forming a first bump making contact to said first through-substrate via.
18 Assignments
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Accused Products
Abstract
An integrated circuit substrate (26) is formed with active circuit elements (24, 32) on first and second surfaces of the substrate. The active circuit elements are interconnected with though-substrate vias (28) to minimize signal routing and reduce propagation delay. The through-substrate vias may be formed with a plurality of holes (52) through the IC substrate. A dielectric layer (54) is deposited on the surface of the IC substrate and through the holes. A conductive layer (56) is deposited through the holes to form the through-substrate vias. The dielectric layer is removed from the surface of the IC substrate to leave the through-substrate vias isolated from the IC substrate by the dielectric layer. A second substrate (26) is formed as described and the two substrates are joined as a two-sided chip (21) with active circuit elements on both sides interconnected by through-substrate vias.
299 Citations
5 Claims
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1. A method of forming through-substrate vias in a substrate, comprising the steps of:
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forming a first hollow region through a first substrate; depositing a first dielectric layer on a first surface of said first substrate and on inner surfaces of said first hollow region; depositing a first conductive layer through said first hollow region to form a first through-substrate via; removing said first conductive layer and said first dielectric layer from said first surface of said first substrate to leave said first through-substrate via isolated from said first substrate by said first dielectric layer; forming a first IC device layer on said first surface of said first substrate with circuit nodes electrically coupled to the through-substrate vias; forming a first interconnect layer on said first IC device layer; forming first inter-chip interconnects on said first interconnect layer; patterning a second dielectric layer on a second surface of said first substrate to provide access to said first through-substrate via; and forming a first bump making contact to said first through-substrate via. - View Dependent Claims (2)
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3. A method of forming through-substrate vias in a substrate, comprising the steps of:
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forming a first IC device layer on a first surface of a first substrate; forming a first dielectric layer within said first IC device layer; forming a first pad within said first IC device layer isolated from said first substrate by said first dielectric layer; depositing a second dielectric layer on a second surface of said first substrate; etching a first region through said first substrate; depositing a third dielectric layer on said second dielectric layer and on inner surfaces of said first region for isolation; selectively removing portions of said first, second and third dielectric layers to expose said first pad; depositing a first conductive layer through said first region and contacting said first pad to form a first through-substrate via; and selectively removing said first conductive layer from said second surface of said first substrate to provide electrical isolation for said first through-substrate via. - View Dependent Claims (4, 5)
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Specification