High density plasma deposition and etching apparatus

• US 5,429,070 A
• Filed: 11/20/1992
• Issued: 07/04/1995
• Est. Priority Date: 06/13/1989
• Status: Expired due to Term

• Current Assignee: SPTS Technologies Limited (KLA Corporation)
• Original Assignee: Plasma & Materials Technologies, Inc.
• Inventors: de Chambrier, Alexis, Parker, N. William, Katz, Dan, Conn, Robert W., Campbell, Gregor A.
• Primary Examiner(s): Breneman, R. Bruce
• Assistant Examiner(s): BASKIN, JONATHAN
• Application Number:
  US07/979,574
• Time in Patent Office: 956 Days
• Field of Search: 118/723 MP, 118/723 MW, 118/723 ME, 118/723 MR, 118/723 MA, 118/723 AN, 118/723 E, 118/723 ER, 118/723 IR, 118/723 R, 156/345, 204/298.37, 204/298.38
• US Class Current: 118/723.00R
• CPC Class Codes: C23C 16/513 using plasma jets
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H01J 37/3211 Antennas, e.g. particular shapes of coils
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32688 Multi-cusp fields

Abstract

Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. The plasma source may include a sapphire or alumina source tube for use with plasmas containing fluorine. Surrounding the plasma source are an inner magnetic coil and an outer magnetic coil arranged in the same plane perpendicular to the axis of the plasma source and the substrate process chamber. Preferably a first current is provided through the inner coil and a second current in a direction opposite to the direction of the first current is provided through the outer coil. The inner and outer coils are wrapped with a thin sheet of conducting material to shield the coils from RF signal generated by the plasma source. The result is to advantageously shape the magnetic field in the process chamber to achieve extremely uniform processing, particularly when a unique diamond shaped pattern of gas feed lines is used wherein the diamond is arranged to be approximately tangent at four places to the outer circumference of the workpiece being processed in the apparatus.

Claims

1. Structure for use in generating a high density plasma for use in the processing of a substrate, said structure comprising:

a plasma generation chamber;

an inner magnet and an outer magnet surrounding said plasma generation chamber, said inner magnet having a smaller diameter than the diameter of said outer magnet such that said outer magnet is located around said inner magnet and in the same plane as said inner magnet, thereby to produce a magnetic field for use with said plasma generation chamber; and

means for shielding each of said inner and outer magnets such that radio frequency energy is not absorbed by said inner and outer magnets.

2. Structure as in claim 1, wherein:

the substrate comprises polysilicon, metal or metal compound; and

the plasma generation chamber is made of quartz.

3. Structure as in claim 1, wherein:

the plasma comprises gases containing fluorine; and

the plasma generation chamber is made of alumina.

4. Structure as in claim 1, wherein:

the plasma comprises gases containing fluorine; and

the plasma generation chamber is made of sapphire.

5. Structure as in claim 1, further comprising a process chamber for holding a substrate to be operated upon by the plasma, wherein:

said plasma generation chamber is located above said process chamber such that said inner magnet and outer magnet are located around said plasma generation chamber above said process chamber; and

a surface of said substrate to be operated upon by the plasma is located between 100 and 200 millimeters from an upper surface of said process chamber.

6. Structure as in claim 5, further comprising a magnetic bucket surrounding the process chamber.

7. Structure as in claim 6, wherein the magnetic bucket includes between 18 and 28 magnets inclusive.

8. Structure as in claim 7, wherein the magnetic bucket includes 24 magnets.

9. Structure as in claim 1, wherein said means for shielding comprises a sheet of conductive material wrapped around each of said inner and outer magnets.

10. Structure as in claim 9, wherein said sheet of conductive material is aluminum tape.

11. Structure for use in generating a high density plasma for use in the processing of a substrate, said structure comprising:

a plasma generation chamber;

a magnet surrounding said plasma generation chamber, thereby to produce a magnetic field for use with said plasma generation chamber; and

means for shielding said magnet such that radio frequency energy is not absorbed by said magnet.

12. Structure as in claim 11, wherein said means for shielding comprises a sheet of conductive material wrapped around said magnet.

13. Structure as in claim 12, wherein said sheet of conductive material is aluminum tape.