Radiation-emitting diode with improved radiation output
First Claim
1. A method for manufacture of radiation-emitting diodes, comprising:
- manufacturing a layer sequence containing a radiation-generating pn-junction on a substrate wafer;
manufacturing contact layers for electrical connections on an upper face of said layer sequence and on an underside of said substrate wafer;
etching trenches defining the size and shape of the area of individual pn-junctions of individual diodes being manufactured;
providing protective layer extending over said upper face contact layers and said etched trenches;
subdividing said wafer having said layer sequence, said contact layers, and said protective layer thereon into individual diodes having lateral faces;
after said subdividing, etching only said lateral faces which are not provided with said protective layer to make said lateral faces into rough surfaces; and
removing said protective layer following etching of said lateral faces.
1 Assignment
0 Petitions
Accused Products
Abstract
A method for manufacture of radiation-emitting diodes includes manufacturing a layer sequence containing a radiation-generating pn-junction on a substrate wafer manufacturing contact layers for electrical connections on an upper face of the layer sequence and on an underside of the substrate wafer, etching trenches defining the size and shape of the area of individual pn-junctions of individual diodes being manufactured, providing a protective layer extending over the upper face contact layers and the etched trenches, subdividing the wafer having the layer sequence, the contact layers, and the protective layer thereon into individual diodes having lateral faces, after the subdividing, etching the lateral faces which are not provided with the protective layer to make the lateral faces into rough surfaces, and removing the protective layer following etching of the lateral faces.
-
Citations
16 Claims
-
1. A method for manufacture of radiation-emitting diodes, comprising:
-
manufacturing a layer sequence containing a radiation-generating pn-junction on a substrate wafer; manufacturing contact layers for electrical connections on an upper face of said layer sequence and on an underside of said substrate wafer; etching trenches defining the size and shape of the area of individual pn-junctions of individual diodes being manufactured; providing protective layer extending over said upper face contact layers and said etched trenches; subdividing said wafer having said layer sequence, said contact layers, and said protective layer thereon into individual diodes having lateral faces; after said subdividing, etching only said lateral faces which are not provided with said protective layer to make said lateral faces into rough surfaces; and removing said protective layer following etching of said lateral faces. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
Specification