Method for suppression of electrification

• US 5,437,893 A
• Filed: 04/26/1993
• Issued: 08/01/1995
• Est. Priority Date: 05/30/1990
• Status: Expired due to Term

• Current Assignee: Hitachi, Ltd., Showa Denko KK
• Original Assignee: Hitachi, Ltd., Showa Denko KK
• Inventors: Saida, Yoshihiro, Suzuki, Yasunori, Tomozawa, Hideki, Murai, Fumio, Ikenoue, Yoshiaki, Takashi, Ryuma
• Primary Examiner(s): PIANALTO, BERNARD D
• Application Number:
  US08/051,841
• Time in Patent Office: 827 Days
• Field of Search: 427/498, 427/504, 427/552, 427/526, 427/533, 427/551, 427/259, 427/77, 427/261, 427/264, 427/265, 427/407.1
• US Class Current: 427/498
• CPC Class Codes: G03F 7/093 characterised by antistatic means, e.g. for charge depletion
• CPC Class Codes: G03F 7/2059 using a scanning corpuscular radiation beam, e.g. an electron beam
• CPC Class Codes: Y10T 428/31504 Composite [nonstructural laminate]

Abstract

Electrification is suppressed with a water-soluble electrification-suppressing film having an electron conductivity and comprising a polymer resin. A high electrification-suppressing effect which is also high in vacuum can be easily obtained by using the electrification-suppressing film with less contamination.

Claims

1. A method for suppression of electrification which comprises a step of forming on a substrate a water-soluble electrification-suppressing film having an electron conductivity and comprising an electron conducting polymer having a π

-electron conjugated system, and a step of irradiating a charged particle beam onto the substrate;

said charged particle beam being an electron or ion beam.

2. A method for suppression of electrification which comprises a step of forming on a substrate a water-soluble electrification-suppressing film having an electron conductivity and comprising an electron conducting polymer having a unit structure in which anionic groups are covalently bonded to the main chain and having a π

-electron conjugated system, and a step of irradiating a charged particle beam onto the substrate;

said charged particle beam being an electron or ion beam.

3. A method for suppression of electrification which comprises a step of forming on a substrate a water-soluble electrification-suppressing film having an electron conductivity and comprising an electron conducting polymer having a π

-electron conjugated system, and a step of irradiating a charged particle beam onto the substrate, said charged particle beam being an electron or ion beam, and further comprises a step of forming a first layer on a substrate prior to or after the step of forming said water-soluble electrification-suppressing film.

4. A method according to claim 3, wherein the substrate is an insulating substrate.

6. A method according to claim 3, wherein the first layer is an insulating film.

5. A method for suppression of electrification which comprises a step of forming on a substrate a water-soluble electrification-suppressing film having an electron conductivity and comprising an electron conducting polymer having a π

-electron conjugated system, and a step of irradiating a charged particle beam onto the substrate, said charged particle beam being an electron or ion beam, and further comprises a step of forming a first layer on a substrate and a step of forming a resist layer wherein any of the latter two steps is carried out prior to or after the step of forming said water-soluble electrification-suppressing film.

7. A method for suppression of electrification which comprises a step of forming on a substrate a water-soluble electrification-suppressing film having an electron conductivity and comprising an electron conducting polymer having a π

-electron conjugated system, and a step of irradiating a charged particle beam onto the substrate, said charged particle beam being an electron or ion beam, and further comprises a step of forming a first layer on a substrate, a step of forming on the first layer a second layer different from the first layer in etching characteristics and a step of forming a resist layer wherein any of the latter three steps is carried out prior to or after the step of forming said water-soluble electrification-suppressing film.

8. A method according to claim 7, wherein the first layer is an insulating film.

9. A method according to claim 7, wherein the second layer is a phase shift layer.

10. A method according to claim 7, wherein the substrate is an insulating substrate and the second layer is a phase shift layer.