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Apparatus for low pressure chemical vapor deposition

  • US 5,441,570 A
  • Filed: 06/21/1994
  • Issued: 08/15/1995
  • Est. Priority Date: 06/22/1993
  • Status: Expired due to Term
First Claim
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1. Apparatus for low pressure chemical vapor deposition comprising:

  • a deposition base having a compound source gas inlet and a reaction product outlet at opposed sides thereof;

    a reactor airtightly coupled to a top end of said deposition base at its bottom end;

    a closing plate provided on the bottom of said deposition base for selectively closing a bottom opening of said deposition base;

    a boat lifting ram movably penetrating a center opening of said closing plate, said ram being provided with a boat support on its top end;

    a boat seated on said boat support of the ram and supporting a plurality of wafers thereon;

    means for introducing a compound source gas to a top section of said reactor and ejecting said source gas at that top section of the reactor, said gas introducing means being connected to said compound source gas inlet of the base at its bottom end and positioned about a top section of said boat at its top end; and

    heating means for heating said reactor, said heating means surrounding said reactor.

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