Antistatic film and method of manufacturing the same

• US 5,449,554 A
• Filed: 08/20/1993
• Issued: 09/12/1995
• Est. Priority Date: 08/31/1992
• Status: Expired due to Fees

• Current Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: Ogawa, Kazufumi
• Primary Examiner(s): NAKARANI, DHIRAJLAL S
• Application Number:
  US08/110,704
• Time in Patent Office: 753 Days
• Field of Search: 427/399, 427/402, 428/245, 428/288, 428/289, 428/429, 428/450, 428/451, 428/452, 428/333, 428/688, 428/922
• US Class Current: 428/333
• CPC Class Codes: B05D 1/185 applying monomolecular layers B05D1/204 takes precedence
• CPC Class Codes: B05D 5/12 to obtain a coating with specific electrical properties
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C08G 77/04 Polysiloxanes
• CPC Class Codes: C08G 77/30 phosphorus-containing groups
• CPC Class Codes: C09D 4/00 Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
• CPC Class Codes: C09K 3/16 Anti-static materials
• CPC Class Codes: Y10S 428/922 Static electricity metal bleed-off metallic stock
• CPC Class Codes: Y10T 428/261 In terms of molecular thickness or light wave length
• CPC Class Codes: Y10T 428/31612 As silicone, silane or siloxane
• CPC Class Codes: Y10T 428/31667 Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
• CPC Class Codes: Y10T 442/2098 At least two coatings or impregnations of different chemical composition
• CPC Class Codes: Y10T 442/2443 Nitrogen and phosphorus containing

Abstract

In a molecule of a monomolecular film, a metal complex is introduced to form an antistatic film. This film is desirably transparent, durable, extremely thin and weakly conductive.

The method of manufacturing an antistatic film involves (i) exposing a substrate with an active hydrogen atom thereon to a chemical adsorbent containing a straight carbon-chain group with a silyl group at one end and a phosphonate or carboxyl group at the other end to form a chemically adsorbed monomolecular film, and (ii) soaking the monomolecular film in a solution of a metal salt to form a film containing a complex of the metal element. An antistatic multi-monomolecular film can also be formed by laminating the monomolecular films using hydroxyl groups each bonding to the metal element in each monomolecular film.

Claims

1. An antistatic film comprising a molecule with a straight carbon-chain group chemically adsorbed and bonded to a substrate via a covalent bond, the film being a monomolecular film or a multi-monomolecular film, wherein said molecule with a straight carbon-chain group comprises at least one metal complex selected from the group consisting of a metal-phosphonate complex and a metal-carboxy complex.

2. An antistatic multi-monomolecular film according to claim 1, wherein the molecule with a straight carbon-chain group has at both ends a group selected from the group consisting of a phosphonate group and a carboxyl group, and a metal molecule is present between the phosphonate group or carboxyl group and the straight-chain carbon group at both ends.

3. An antistatic film according to claim 1, wherein the metal in said metal complex is a transition metal element.

4. An antistatic film according to claim 1, wherein said metal complex comprises at least one metal element selected from the group consisting of Zr, Hf, Cr, Zn and Al.

5. An antistatic film according to claim 1, wherein said substrate comprises at least one material selected from the group consisting of plastic, ceramics, glass, metal, semiconductors, resins, rubber, fibers, paper and fabrics.

6. A method of manufacturing an antistatic film comprising the steps of:

subjecting a substrate having an active hydrogen-containing group on its surface to a condensation reaction with a chemical adsorbent containing a straight carbon-chain group with a silyl group at a first end and one group selected from the group consisting of a phosphonate group and a carboxyl group at a second end to form a monomolecular film; and

soaking said monomolecular film in a solution of a metal salt to react said one group selected from the group consisting of a phosphonate group and a carboxyl group on said monomolecular film with said metal salt to form a metal complex.

7. A method according to claim 6, further comprising the step of repeatedly laminating each monomolecular film of the molecule having one group selected from the group consisting of a phosphonate group and a carboxyl group at the ends a plurality of times to form a multi-monomolecular film, wherein said metal complex is made of a metal salt and a phosphonate group or a carboxyl group.

8. A method according to claim 6, wherein said straight carbon-chain group in the chemical adsorbent is derived from at least one compound selected from the group consisting of:

(A) a compound represented by the following Formula (1), comprising a straight carbon chain group with a phosphonate group at one end and a silylmethoxy group at the other end;

space="preserve" listing-type="equation">H.sub.2 O.sub.3 P--(CH.sub.2).sub.m --Si(OCH.sub.3).sub.3 Formula (

     1)

wherein m denotes an integer of 1 to 30;

(B) a compound represented by the following Formula (2), comprising a straight carbon-chain group with a phosphonate group at one end and a thiol group at the other end;

space="preserve" listing-type="equation">H.sub.2 O.sub.3 P--(CH.sub.2).sub.n --SH Formula (2)

wherein n denotes an integer of 1 to 30;

(C) a compound represented by the following Formula (3), comprising a straight carbon-chain group with a phosphonate group at both ends;

space="preserve" listing-type="equation">H.sub.2 O.sub.3 P--(CH.sub.2).sub.u --PO.sub.3 H.sub.2 Formula (

     3)

wherein u denotes an integer of 1 to 30;

(D) a compound represented by the following Formula (4), comprising a straight carbon-chain group with an ester bond at one end and a chlorosilyl group at the other end;

space="preserve" listing-type="equation">R--OOC(CH.sub.2).sub.v SiCl.sub.3 Formula (

     4)

(E) a compound represented by the following Formula, comprising a straight carbon-chain group with a carboxyl group at both ends;

space="preserve" listing-type="equation">HOOC--(CH.sub.2).sub.w --COOH Formula (5)

wherein w denotes and integer of 1 to 30.

9. A method according to claim 6, wherein said chemical adsorbent comprises a compound represented by Formula (4), which comprises a straight carbon-chain group with an ester bond at one end and a chlorosilyl group at the other end:

space="preserve" listing-type="equation">R--OOC(CH.sub.2).sub.v SiCl.sub.3 Formula (

     4)

wherein R represents a C_1-6 lower alkyl group, and v denotes an integer of 1 to 25, further comprising the steps of bonding said compound to a surface of the substrate via a covalent bond and changing a carboxylate of said compound to a carboxyl group by an acid treatment.

10. A method according to claim 6, wherein said metal salt is at least one compound selected from the group consisting of:

(a) ZrOCl₂, (b) HfOCl₂, (c) CrOCl₂, (d) ZnOCl₂, (e) AlOCl₂, (f) CrCl₃, (g) AlCl₃ and (h) ZnCl₂.

11. A method according to claim 6, wherein said active hydrogen containing group is at least one group selected from the group consisting of a hydroxyl group, a carboxyl group, an amino group and an imino group.

12. A method according to claim 6, wherein said step of subjecting said substrate further comprises a step of carrying out one treatment selected from the group consisting of oxidation, alkalization and electron beam irradiation before preparing the chemically adsorbed film.