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Method and apparatus for CVD using liquid delivery system with an ultrasonic nozzle

  • US 5,451,260 A
  • Filed: 04/15/1994
  • Issued: 09/19/1995
  • Est. Priority Date: 04/15/1994
  • Status: Expired due to Term
First Claim
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1. A liquid delivery system for a chemical vapor deposition apparatus comprising:

  • at least one ultrasonic atomizing nozzle disposed in a reactor chamber of said chemical vapor deposition apparatus for supplying vaporized liquid organic precursor solution to said reactor chamber for depositing a film on at least one substrate contained therein;

    at least one source of liquid organic precursor solution;

    a storage line for storing a measured amount of liquid precursor solution to be supplied to said ultrasonic atomizing nozzle;

    a first valve for selectively connecting said source to a first end of said storage line;

    a second valve for selectively connecting a second end of said storage line to an inlet end of said ultrasonic nozzle; and

    means for sequentially actuating said first and second valves so that a measured pulse of liquid precursor solution is admitted to said storage line through said first valve, and is then supplied to said inlet end of said ultrasonic nozzle by said second valve.

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