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Fixture for in-situ noncontact monitoring of wet chemical etching with passive wafer restraint

  • US 5,451,289 A
  • Filed: 06/30/1994
  • Issued: 09/19/1995
  • Est. Priority Date: 06/30/1994
  • Status: Expired due to Fees
First Claim
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1. A fixture for in-situ chemical etch monitoring of an etching process during etching of at least one wafer contained in a wafer carrier, one of the at least one wafers being positioned in a first slot of the wafer carrier, said fixture comprising:

  • a) a set of primary guide members for engaging and guiding a front portion of the wafer carrier;

    b) a set of rear guide members for engaging and guiding a rear portion of the wafer carrier;

    c) a set of electrode arms for receiving a respective electrode and corresponding electrode wire thereon;

    d) a mounting plate for establishing spacing of said set of primary guide members with respect to said set of electrode arms;

    e) a means for self-locking the first wafer contained in the wafer carrier, said self-locking means connected to said mounting plate and further positioned in a manner with respect to said set of primary guide members and said set of electrode arms; and

    f) means for connecting said mounting plate, said set of primary guide members, said set of electrode arms to said set of rear guide members, whereby insertion of the wafer carrier into the fixture establishes a distance between the set of electrode arms and the first wafer, and further wherein the first wafer is passively fixed by said self-locking means.

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