Method of making an electrostatic chuck with oxide insulator

• US 5,452,510 A
• Filed: 12/20/1993
• Issued: 09/26/1995
• Est. Priority Date: 12/20/1993
• Status: Expired due to Term

• Current Assignee: FM Industries Inc. (NGK Insulators Limited)
• Original Assignee: International Business Machines Corporation
• Inventors: Barnes, Michael S., Westerfield, Robert P. Jr.
• Primary Examiner(s): Bryant, David P.
• Application Number:
  US08/169,910
• Time in Patent Office: 645 Days
• Field of Search: 29/825, 29/527.1, 29/527.2, 29/527.4, 29/530, 29/874, 29/876, 29/877, 29/885, 29/557, 29/558, 29/458, 29/460, 156/292, 156/330, 361/234, 279/128, 269/8
• US Class Current: 29/825
• CPC Class Codes: H01L 21/6831 using electrostatic chucks
• CPC Class Codes: Y10T 29/49117 Conductor or circuit manufacturing
• CPC Class Codes: Y10T 29/49885 with coating before or during assembling
• CPC Class Codes: Y10T 29/49888 Subsequently coating
• CPC Class Codes: Y10T 29/49982 Coating
• CPC Class Codes: Y10T 29/49986 Subsequent to metal working
• CPC Class Codes: Y10T 29/49993 Filling of opening

Abstract

An electrostatic chuck and method of manufacture of the chuck in which the component parts are machined, then partially anodized to provide a hard insulating surface on surfaces that are not in contact with the wafer, and then assembled, after which the top surface abutting the workpiece is machined and a correction radius is cut to suppress discharges between the electrodes.

Claims

1. A method of manufacturing an electrostatic chuck for holding a workpiece by electrostatic attraction comprising the steps of:

machining a base electrode from an aluminum alloy, said base electrode having an electrode recess machined in a top surface thereof for receiving a second electrode, said recess having inner and outer recess side surfaces and a recess bottom surface at a recess depth below said top surface and connected to said recess side surfaces by second transition regions having a first radius of curvature, thereby defining a first recess transverse distance between said inner and outer recess side surfaces;

machining said second electrode to match said recess, said second electrode including a bottom surface with a second transverse distance less than said first recess transverse distance, a second inner side surface corresponding to said inner recess side surface and a second outer side surface corresponding to said outer recess side surface, and a second thickness at least as great as said recess depth;

oxidizing at least those portions of both said base electrode and said second electrode that are to be bonded together with an electrode thickness of aluminum oxide, so that said base electrode has an oxidized recess with an oxidized recess bottom surface and oxidized recess side surfaces, and said second electrode has an oxidized bottom surface and oxidized second side surfaces, said thickness of aluminum oxide, said first recess transverse distance and said second transverse distance being related such that inner and outer recess gaps are present between said base electrode and said second electrode when said base and second electrodes are assembled;

coating at least one of said recess bottom and side surfaces and said electrode bottom and side surfaces with a first layer of thermally conductive electrically insulating bonding agent;

assembling and bonding together said base and second electrodes with said first layer of thermally conductive electrically insulating bonding agent;

machining the top surfaces of both said base and second electrodes to form a common top surface;

simultaneously machining transition radii between said common top surface and between said inner recess side surface and said second inner side surface down to an inner groove depth;

simultaneously machining transition radii between said common top surface and between said outer recess side surface and said second outer side surface down to an outer groove depth;

anodizing said common top surface and said transition radii; and

filling grooves between the side surfaces of said base and second electrodes with a second layer of thermally conductive electrically insulating bonding agent.

2. The method according to claim 1, further including an additional step of removing aluminum particles from between said inner recess side surface and said second inner side surface and from between said outer recess side surface and said second outer side surface by machining said first layer of insulating bonding agent below said inner groove depth and below said outer groove depth, thereby forming a new top surface for said first layer of bonding agent below transition regions at the intersection of said transition radii and said recess side surfaces and said second side surfaces, so that said aluminum particles are removed and also an interface between said first and second layers of bonding agent is displaced from said transition regions.

3. The method according to claim 2, in which said step of machining said common top surface in said base and second electrodes includes machining at least one azimuthal gas distribution groove in a top surface of at least one of said base and second electrodes while ensuring that said azimuthal gas distribution groove does not connect with a radial gas distribution groove which in turn connects to a gas inlet, said azimuthal gas distribution groove having a radius less than an outer radius of said chuck by a radial impedance distance, whereby in operation cooling gas diffuses radially inward from said azimuthal gas distribution groove through interstices between said common top surface and said workpiece and said cooling gas maintains a cooling gas pressure by flowing radially outward from said azimuthal gas distribution groove through an impedance formed by interstices between said common top surface and said workpiece along said impedance distance.

4. The method according to claim 2, further including inserting a decoupling insulator between said second electrode and said base electrode, said decoupling insulator having a decoupling thickness sufficient to reduce RF power capacitively coupled between said base and second electrodes below a threshold amount and further including a step of forming terminals on said base and second electrodes for connecting said base and second electrodes to a source of RF power.

5. The method according to claim 1 in which said step of assembling said base and second electrodes includes a step of inserting a strip of organic insulating film between said base and second electrodes in said inner and outer recess gaps, and said coating step includes coating the bottom and side surfaces of both of said base and second electrodes with a first layer of bonding agent, so that said first layers of bonding agent bond said insulating film to both said base and second electrodes.

6. The method according to claim 5, further including inserting a decoupling insulator between said second electrode and said base electrode, said decoupling insulator having a decoupling thickness sufficient to reduce RF power capacitively coupled between said base and second electrodes below a threshold amount and further including a step of forming terminals on said base and second electrodes for connecting said base and second electrodes to a source of RF power.

7. The method according to claim 1, in which said step of machining said common top surface in said base and second electrodes includes machining at least one azimuthal gas distribution groove in a top surface of at least one of said base and second electrodes while ensuring that said azimuthal gas distribution groove does not connect with a radial gas distribution groove which in turn connects to a gas inlet, said azimuthal gas distribution groove having a radius less than an outer radius of said chuck by a radial impedance distance, whereby in operation cooling gas diffuses radially inward from said azimuthal gas distribution groove through interstices between said common top surface and said workpiece and said cooling gas maintains a cooling gas pressure by flowing radially outward from said azimuthal gas distribution groove through an impedance formed by interstices between said common top surface and said workpiece along said impedance distance.

8. The method according to claim 1, further including a step of machining the bottom of said second electrode to accommodate a decoupling insulator having a decoupling thickness sufficient to reduce RF power capacitively coupled between said base and second electrodes below a threshold amount and further including a step of forming terminals on said base and second electrodes for connecting said base and second electrodes to a source of RF power.