Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method
First Claim
1. An electromagnetic wave reflection-preventing material having a structure which has been formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern and having a volume resistivity of 103 Ω
- . cm or less, (B) a supporting layer, (C) a resin layer, and (D) a supporting layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
m so that the layer (D) of the multiple laminate unit structure may face on the layer (E).
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Accused Products
Abstract
An electromagnetic wave reflection-preventing material having a structure formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern having a volume resistivity of 103 Ω . cm or less, if needed, (B) a supporting layer, (C) a resin layer, and, if needed, (D) a supporting layer, to form a laminate unit, laminating a pluralitry of the laminate unit so that the layer (A) may face on the layer (C) or (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer so that the layer (C) or (D) of the multiple laminate unit structure may face on the layer (E), preferably further laminating a clear or colored coating layer onto the uppermost metallic pattern layer of the electromagnetic wave, reflection-preventing material; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying the multiple laminate unit structure obtained by removing the electromagnetic wave reflecting material layer (E) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.
21 Citations
13 Claims
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1. An electromagnetic wave reflection-preventing material having a structure which has been formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern and having a volume resistivity of 103 Ω
- . cm or less, (B) a supporting layer, (C) a resin layer, and (D) a supporting layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
m so that the layer (D) of the multiple laminate unit structure may face on the layer (E). - View Dependent Claims (5, 6, 7, 10, 11, 13)
- . cm or less, (B) a supporting layer, (C) a resin layer, and (D) a supporting layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
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2. An electromagnetic wave reflection-preventing material having a structure which has been formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern and having a volume resistivity of 103 Ω
- . cm or less, (B) a supporting layer, and (C) a resin layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (C) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
m so that the layer (C) of the multiple laminate unit structure may face on the layer (E). - View Dependent Claims (8, 9, 12)
- . cm or less, (B) a supporting layer, and (C) a resin layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (C) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
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3. An electromagnetic wave reflection-preventing material having a structure which has been formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern and having a volume resistivity of 103 Ω
- . cm or less, (C) a resin layer, and (D) a supporting layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
m so that the layer (D) of the multiple laminate unit structure may face on the layer (E).
- . cm or less, (C) a resin layer, and (D) a supporting layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
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4. An electromagnetic wave reflection-preventing material having a structure which has been formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern and having a volume resistivity of 103 Ω
- . cm or less, and (C) a resin layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (C) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
m so that the layer (C) of the multiple laminate unit structure may face on the layer (E).
- . cm or less, and (C) a resin layer, to form a laminate unit, laminating a plurality of the laminate unit so that the layer (A) may face on the layer (C) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer having a thickness of 5 to 500 μ
Specification