Semiconductor sensors and method for fabricating the same

• US 5,453,727 A
• Filed: 03/15/1993
• Issued: 09/26/1995
• Est. Priority Date: 07/16/1991
• Status: Expired due to Term

• Current Assignee: Asahi Kasei Kogyo Kabushiki Kaisha (Asahi Kasei Corporation)
• Original Assignee: Asahi Kasei Kogyo Kabushiki Kaisha (Asahi Kasei Corporation)
• Inventors: Iwabuchi, Tatsuro, Kuze, Naohiro, Nagase, Kazuhiro, Shibasaki, Ichiro
• Primary Examiner(s): Lateef, Marvin M.
• Application Number:
  US07/988,928
• Time in Patent Office: 925 Days
• Field of Search: 338/32 R, 338/32 H, 338/2, 324/207.21, 324/252, 29/620
• US Class Current: 338/32.00R
• CPC Class Codes: H01L 31/03046 including ternary or quaternary compounds, e.g. GaAlAs, InGaAs, InGaAsP
• CPC Class Codes: H10N 52/101 Semiconductor Hall-effect devices
• CPC Class Codes: Y02E 10/544 Solar cells from Group III-V materials

Abstract

The present invention is a method of fabrication of a thin film of In_x Ga_1-x As_y Sb_1-y (0<x≦1.0, 0≦y≦1.0) having no lattice disorder, and its use in a sensor layer to obtain a high sensitivity semiconductor sensor having excellent temperature characteristics. The semiconductor sensor has a high resistance first compound semiconductor layer, a layer of In_x Ga_1-x As_y Sb_1-y (0<x≦1.0, 0≦y≦1.0) grown on this first layer, and an electrode formed on this layer. The first compound semiconductor layer has a lattice constant the same as or nearly the same as that of the crystal of the sensor layer, and a band gap energy greater than that of the crystal. A second compound semiconductor layer similar to the first compound semiconductor layer may be formed on top of the sensor layer. A manufacturing method of such a semiconductor sensor is also included.

Claims

1. A magnetic sensor, comprising:

a first compound semiconductor layer having a high resistance;

an InAs thin film layer grown on said first compound semiconductor layer; and

an electrode formed on said InAs thin film layer, wherein said first compound semiconductor layer has a different composition from said InAs thin film layer, the composition of said first compound semiconductor layer being predetermined so as to match a lattice of said first compound semiconductor layer with that of said InAs thin film layer to thereby have a lattice constant the same as or nearly the same as that of said InAs thin film layer, and wherein said first compound semiconductor layer has a band gap energy greater than that of the InAs thin film layer.

4. A magnetic sensor as claimed in claim 1, wherein said InAs thin film layer has a film thickness of not more than 500Å

.

7. A magnetic sensor as claimed in claim 1 or 4, wherein an electron density of said InAs layer is within the range of from 5×

10¹⁶ to 8×

10¹⁸ /cm³.

8. A magnetic sensor as claimed in claim 7, wherein said first compound semiconductor layer is doped with a donor impurity.

13. A magnetic sensor as claimed in any one of claims 1 and 6, wherein said first compound semiconductor layer is doped with a donor impurity.

14. A magnetic sensor as claimed in claim 1, wherein a high resistance second compound semiconductor layer is formed on the InAs layer and said second compound semiconductor layer has a lattice constant the same as or nearly the same as that of InAs, and a band gap energy greater than that of InAs.

17. A magnetic sensor as claimed in claim 14, wherein said InAs thin film layer has a film thickness of not more than 500Å

.

20. A magnetic sensor as claimed in claim 14 or 17, wherein an electron density of said InAs layer is within the range of from 5×

10¹⁶ to 8×

10¹⁸ /cm³.

21. A magnetic sensor as claimed in claim 20, wherein either one or both of said first compound semiconductor layer and said second compound semiconductor layer is doped with a donor impurity.

26. A magnetic sensor as claimed in any one of claims 14 through 19, wherein either one or both of said first compound semiconductor layer and said second compound semiconductor layer is doped with a donor impurity.

2. A magnetic sensor, comprising:

a first compound semiconductor layer having a high resistance;

a thin film layer of In_x Ga_1-x As (0<

x<

1.0) grown on said first compound semiconductor layer; and

an electrode formed on said In_x Ga_1-x As thin film layer, wherein said first compound semiconductor layer has a different composition from said In_x Ga_1-x As thin film layer the composition of said first compound semiconductor layer being predetermined so as to match a lattice of said first compound semiconductor layer with that of said In_x Ga_1-x As thin film layer to thereby have a lattice constant the same as or nearly the same as that of the In_x Ga_1-x As thin film layer and wherein said first compound semiconductor layer has a band gap energy greater than that of the In_x Ga_1-x As thin film layer

5. A magnetic sensor as claimed in claim 2, wherein said In_x Ga_1-x As thin film layer has a thickness of not more than 500Å

.

9. A magnetic sensor as clammed in claim 2 or 5, wherein an electron density of said In_x Ga_1-x As layer is within the range of from 5×

10¹⁶ to 8×

10¹⁸ /cm³.

10. A magnetic sensor as claimed in claim 9, wherein said first compound semiconductor layer is doped with a donor impurity.

15. A magnetic sensor as claimed in claim 2, wherein a high resistance second compound semiconductor layer is formed on the In_x Ga_1-x As layer and said second compound semiconductor layer has a lattice constant the same as or nearly the same as that of In_x Ga_1-x As, and a band gap energy greater than that of In_x Ga_1-x As.

18. A magnetic sensor as claimed in claim 15, wherein said In_x Ga_1-x As thin film layer has a thickness of not more than 500Å

.

22. A magnetic sensor as claimed in claim 15 or 18, wherein an electron density of said In_x Ga_1-x As layer is within the range of from 5×

10¹⁶ to 8×

10¹⁸ /cm³.

23. A magnetic sensor as claimed in claim 22, wherein either one or both of said first compound semiconductor layer and said second compound semiconductor layer is doped with a donor impurity.

3. A magnetic sensor, comprising a high resistance first compound semiconductor layer, a thin film layer of In_x Ga_1-x As_y Sb_1-y (0<

x≦

1.0, 0≦

y<

1.0) grown on said first compound semiconductor layer, and an electrode formed on said In_x Ga_1-x As_y Sb_1-y thin film layer, wherein said first compound semiconductor layer has a lattice constant the same as or nearly the same as that of the In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of the In_x Ga_1-x As_y Sb_1-y.

6. A magnetic sensor as claimed in claim 3, wherein said In_x Ga_1-x As_y Sb_1-y layer has a thickness of not more than 500Å

.

11. A magnetic sensor as claimed in claim 3 or 6, wherein an electron density of said In_x Ga_1-x As_y Sb_1-y layer is within the range of from 5×

10¹⁶ to 8×

10¹⁸ /cm³.

12. A magnetic sensor as claimed in claim 11, wherein said first compound semiconductor layer is doped with a donor impurity.

16. A magnetic sensor as claimed in claim 3, wherein a high resistance second compound semiconductor layer is formed on the In_x Ga_1-x As_y Sb_1-y layer and said second compound semiconductor layer has a lattice constant the same as or nearly the same as that of In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of In_x Ga_1-x As_y Sb_1-y.

19. A magnetic sensor as claimed in claim 16, wherein said In_x Ga_1-x As_y Sb_1-y layer has a thickness of not more than 500Å

.

24. A magnetic sensor as claimed in claim 16 or 19, wherein an electron density of said In_x Ga_1-x As_y Sb_1-y layer is within the range of from 5×

10¹⁶ to 8×

10¹⁸ /cm³.

25. A magnetic sensor as claimed in claim 24, wherein either one or both of said first compound semiconductor layer and said second compound semiconductor layer is doped with a donor impurity.

27. A method for producing a magnetic sensor comprising the steps of;

forming a high resistance first compound semiconductor layer having a lattice constant the same as or nearly the same as that of InAs, and a band gap energy greater than that of InAs,

forming a layer of InAs on said layer,

treating said InAs layer, and

forming a plurality of ohmic electrodes on said InAs layer.

30. A method of producing a magnetic sensor as claimed in claim 27, further comprising a step of forming a high resistance second compound semiconductor layer having a lattice constant the same as or nearly the same as that of InAs, and a band gap energy greater than that of InAs, on said InAs layer.

28. A method for producing a magnetic sensor comprising the steps of;

forming a high resistance first compound semiconductor layer having a lattice constant the same as or nearly the same as that of InAs, and a band gap energy greater than that of In_x Ga_1-x As,

forming a layer of In_x Ga_1-x As (0<

x<

1.0) on said layer,

treating said In_x Ga_1-x As layer, and

forming a plurality of ohmic electrodes on said In_x Ga_1-x As layer.

31. A method of producing a magnetic sensor as claimed in claim 28, further comprising a step of forming a high resistance second compound semiconductor layer having a lattice constant the same as or nearly the same as that of In_x Ga_1-x As, and a band gap energy greater than that of In_x Ga_1-x As, on said In_x Ga_1-x As layer.

29. A method for producing a magnetic sensor comprising the steps of;

forming a high resistance first compound semiconductor layer having a lattice constant the same as or nearly the same as that of In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of In_x Ga_1-x As_y Sb_1-y,

forming a layer of In_x Ga_1-x As_y Sb_1-y (0<

x≦

1.0, 0≦

y<

1.0) on said layer,

treating said In_x Ga_1-x As_y Sb_1-y layer, and

forming a plurality of ohmic electrodes on said In_x Ga_1-x As_y Sb_1-y layer.

32. A method of producing a magnetic sensor as claimed in claim 29, further comprising a step of forming a high resistance second compound semiconductor layer having a lattice constant the same as or nearly the same as that of In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of In_x Ga_1-x As_y Sb_1-y, on said In_x Ga_1-x As_y Sb_1-y layer.

33. A hybrid magnetic sensor wherein a magnetic sensor comprising a high resistance first compound semiconductor layer in that, a thin film layer of In_x Ga_1-x As_y Sb_1-y (0<

x≦

1.0, 0≦

y≦

1.0) grown on said first compound semiconductor layer, and an electrode formed on said In_x Ga_1-x As_y Sb_1-y thin film layer, wherein said first compound semiconductor layer has a lattice constant the same as or nearly the same as that of the In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of the In_x Ga_1-x As_y Sb_1-y, and a silicon monolithic integrated circuit chip are molded together in the same package.

34. A magnetic sensor as claimed in claim 33, wherein a second compound semiconductor layer is formed on the In_x Ga_1-x As_y Sb_1-y layer, and said second compound semiconductor layer has a lattice constant the same as or nearly the same as that of In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of In_x Ga_1-x As_y Sb_1-y.

35. A semiconductor optical sensor comprising a high resistance first compound semiconductor layer, a thin film layer of In_x Ga_1-x As_y Sb_1-y (0<

x≦

1.0, 0≦

y≦

1.0) grown on said first compound semiconductor layer, and an electrode for detecting light formed on said In_x Ga_1-x As_y Sb_1-y thin film layer, wherein said first compound semiconductor layer has a lattice constant the same as or nearly the same as that of the In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of the In_x Ga_1-x As_y Sb_1-y.

36. A semiconductor optical sensor as claimed in claim 35, wherein a high resistance second compound semiconductor layer is formed on the In_x Ga_1-x As_y Sb_1-y layer, and said second compound semiconductor layer has a lattice constant the same as or nearly the same as that of In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of In_x Ga_1-x As_y Sb_1-y.

37. A semiconductor pressure sensor comprising a high resistance first compound semiconductor layer, a thin film layer of In_x Ga_1-x As_y Sb_1-y (0<

x≦

1.0, 0≦

y≦

1.0) grown on said first compound semiconductor layer, and an electrode for detecting pressure formed on said In_x Ga_1-x As_y Sb_1-y thin film layer, wherein said first compound semiconductor layer has a lattice constant the same as or nearly the same as that of the In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of the In_x Ga_1-x As_y Sb_1-y.

38. A semiconductor pressure sensor as claimed in claim 37, wherein a high resistance second compound semiconductor layer is formed on the In_x Ga_1-x As_y Sb_1-y layer, and said second compound semiconductor layer has a lattice constant the same as or nearly the same as that of In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of In_x Ga_1-x As_y Sb_1-y.

39. A semiconductor strain sensor comprising a high resistance first compound semiconductor layer, a thin film layer of In_x Ga_1-x As_y Sb_1-y (0<

x≦

1.0, 0≦

y≦

1.0) grown on said first compound semiconductor layer, and an electrode for detecting strain formed on said In_x Ga_1-x As_y Sb_1-y thin film layer, wherein said first compound semiconductor layer has a lattice constant the same as or nearly the same as that of the In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of the In_x Ga_1-x As_y Sb_1-y.

40. A semiconductor strain sensor as claimed in claim 39, wherein a high resistance second compound semiconductor layer is formed on the In_x Ga_1-x As_y Sb_1-y layer, and said second compound semiconductor layer has a lattice constant the same as or nearly the same as that of In_x Ga_1-x As_y Sb_1-y, and a band gap energy greater than that of In_x Ga_1-x As_y Sb_1-y.