Late programming mask ROM and process for producing the same
First Claim
1. A ROM integrated circuit comprising:
- a silicon substrate; and
a plurality of memory cells formed on said silicon substrate, each memory cell including a transistor element and a diode element electrically connected in series, each transistor element having a drain layer, a channel layer, a source layer all stacked on said silicon substrate in a substantially vertical direction to form an upright drain/channel/source structure region, and a gate electrode region formed on said silicon substrate;
said gate electrode regions and said upright drain/channel/source structure regions of said transistor elements being alternately arranged in an adjacent fashion along a substantially horizontal direction, and each upright drain/channel/source structure region providing, at two opposite sides, drain/channel/source structures for two transistor elements, which are respectively controlled by two adjacent gate electrodes.
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Accused Products
Abstract
A late programming mask ROM integrated circuit and a process for producing the same. The mask ROM integrated circuit has a silicon substrate, and a plurality of memory cells formed on the silicon substrate. Each memory cell consists of a transistor element and a diode element electrically connected in series. Each transistor element has a drain layer, a channel layer, a source layer all stacked on the silicon substrate in a substantially vertical direction to form an upright drain/channel/source structure region, and a gate electrode region formed on the silicon substrate. The gate electrode regions and the upright drain/channel/source structure regions of the transistor elements are alternately arranged in an adjacent fashion along a substantially horizontal direction. Each diode element is formed by one upright drain/channel/source structure and a diode layer formed on or under the upright drain/channel/source structure.
58 Citations
9 Claims
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1. A ROM integrated circuit comprising:
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a silicon substrate; and a plurality of memory cells formed on said silicon substrate, each memory cell including a transistor element and a diode element electrically connected in series, each transistor element having a drain layer, a channel layer, a source layer all stacked on said silicon substrate in a substantially vertical direction to form an upright drain/channel/source structure region, and a gate electrode region formed on said silicon substrate;
said gate electrode regions and said upright drain/channel/source structure regions of said transistor elements being alternately arranged in an adjacent fashion along a substantially horizontal direction, and each upright drain/channel/source structure region providing, at two opposite sides, drain/channel/source structures for two transistor elements, which are respectively controlled by two adjacent gate electrodes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification