Process for making an array of tapered photopolymerized waveguides

• US 5,462,700 A
• Filed: 11/08/1993
• Issued: 10/31/1995
• Est. Priority Date: 11/08/1993
• Status: Expired due to Term

• Current Assignee: Alliedsignal Inc.
• Original Assignee: Alliedsignal Inc.
• Inventors: McFarland, Michael J., Beeson, Karl W., Zimmerman, Scott M., Ferm, Paul M.
• Primary Examiner(s): Vargot, Mathieu D.
• Application Number:
  US08/148,794
• Time in Patent Office: 722 Days
• Field of Search: 264/22, 264/1.27, 264/1.38, 264/2.6, 385/129, 385/132, 385/146, 362/32
• US Class Current: 264/1.27
• CPC Class Codes: B29D 11/00663 Production of light guides
• CPC Class Codes: G02B 2006/12195 Tapering
• CPC Class Codes: G02B 5/045 Prism arrays
• CPC Class Codes: G02B 6/10 of the optical waveguide type G02B6/02, G02B6/24 take precedence; devices or arrangements for the control of light by electric, magnetic, electro-magnetic or acoustic means G02F1/00; transferring the modulation of modulated light G02F2/00; optical logic elements G02F3/00; optical analogue/digital converters G02F7/00
• CPC Class Codes: G02B 6/1221 made from organic materials
• CPC Class Codes: G03B 21/625 Lenticular translucent screens
• CPC Class Codes: G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K

Abstract

The present invention is directed to a process for making an array of tapered photopolymerized waveguides. A photomask having opaque and transparent regions is placed in substantial contact with a substrate having a substantially uniform thickness of photopolymerizable mixture thereon. The photopolymerizable mixture is then exposed through the transparent regions of the photomask to substantially collimated actinic radiation for a time sufficient to form an array of tapered photopolymerized waveguides. The photomask and photopolymerizable mixture which was not substantially polymerized by the substantially collimated actinic radiation are then removed from the substrate. The tapered waveguides are useful as a display means in direct view devices and projection display devices.

Claims

1. A process comprising the steps of:

(a) placing a photomask in substantial contact with a substrate wherein said photomask has opaque and transparent regions;

(b) placing a substantially uniform thickness of photopolymerizable mixture on said substrate so that said substrate is positioned between said photopolymerizable mixture and said photomask wherein;

(i) said photopolymerizable mixture comprises at least one reactive monomer and photoinitiator, and

(ii) said photoinitiator is present in an amount sufficient to form a gradient of substantially collimated actinic radiation across the thickness of said photopolymerizable mixture during subsequent step (c);

(c) while maintaining said photopolymerizable mixture and substrate in a substantially fixed plane relative to said substantially collimated actinic radiation, exposing through said transparent regions of said photomask said photopolymerizable mixture to said substantially collimated actinic radiation for a time sufficient to form an array of tapered photopolymerized waveguides wherein;

(i) the tapered end of each of said waveguides extends outward from said substrate,

(ii) each of said waveguides has a light input surface adjacent said substrate and a light output surface distal from said light input surface, and

(iii) the area of the light input surface of each of said waveguides is greater than the area of its light output surface; and

(d) removing said photomask and photopolymerizable mixture which was not substantially polymerized by said substantially collimated actinic radiation during step (c) from said substrate.

2. The process of claim 1 wherein after step (b), a cover plate is placed on said substantially uniform thickness of photopolymerizable mixture.

3. The process of claim 1 which additionally comprises:

(e) applying light absorptive material to said array of tapered photopolymerized waveguides.

4. The process of claim 1 wherein said actinic radiation is ultraviolet light.

5. The process of claim 1 wherein said monomer is selected from the group consisting of methyl methacrylate, n-butyl acrylate, 2-ethylhexyl acrylate, isodecyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, cyclohexyl acrylate, 1,4-butanediol diacrylate, ethoxylated bisphenol A diacrylate, neopentylglycol diacrylate, diethyleneglycol diacrylate, diethylene glycol dimethacrylate, 1,6-hexanediol diacrylate, trimethylol propane triacrylate, pentaerythritol triacrylate, pentaerythritol tetra-acrylate, and mixtures thereof.

6. The process of claim 1 wherein said monomer is a mixture of ethoxylated bisphenol A diacrylate and trimethylol propane triacrylate.

7. The process of claim 1 wherein said photoinitiator is selected from the group consisting of benzidimethyl ketal;

α

,α

-diethyloxy acetophenone;

α

,α

-dimethyloxy-α

-hydroxy acetophenone;

50% 1-hydroxycyclohexyl phenyl ketone and 50% benzophenone;

1-hydroxycyclohexyl-phenyl ketone;

1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy -2-methyl-propan-1-one;

2-methyl-1-4-(methylthio)phenyl]-2-morpholino-propan-1-one; and

2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one.

8. The process of claim 1 wherein said photoinitiator is selected from the group consisting of benzidimethyl ketal;

α

,α

-dimethyloxy-α

-hydroxy acetophenone;

50% 1-hydroxycyclohexyl phenyl ketone and 50% benzophenone;

1-hydroxy-cyclohexyl-phenyl ketone; and

1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-propan-1-one.

9. The process of claim 1 wherein said photoinitiator is present in an amount from about 0.5 to about 12 percent by weight based on the total weight of said photopolymerizable mixture.

10. The process of claim 1 wherein said photoinitiator is present in an amount from about 0.5 to about 8 percent by weight based on the total weight of said photopolymerizable mixture.

11. A process comprising the steps of:

(a) placing a substantially uniform thickness of photopolymerizable mixture on a photomask wherein;

(i) said photomask has opaque and transparent regions,

(ii) said photopolymerizable mixture comprises at least one reactive monomer and photoinitiator, and

(iii) said photoinitiator is present in an amount sufficient to form a gradient of substantially collimated actinic radiation across the thickness of said photopolymerizable mixture during subsequent step (b);

(b) while maintaining said photopolymerizable mixture and photomask in a substantially fixed plane relative to said substantially collimated actinic radiation, exposing through said transparent regions of said photomask said photopolymerizable mixture to said substantially collimated actinic radiation for a time sufficient to form an array of tapered photopolymerized waveguides wherein;

(i) the tapered end of each of said waveguides extends outward from said photomask,

(ii) each of said waveguides has a light input surface adjacent said photomask and a light output surface distal from said light input surface, and

(iii) the area of the light input surface of each of said waveguides is greater than the area of its light output surface; and

(c) removing photopolymerizable mixture which was not substantially polymerized by said substantially collimated actinic radiation during step (b) from said photomask.

12. The process of claim 11 wherein after step (a), a cover plate is placed on said substantially uniform thickness of photopolymerizable mixture.

13. The process of claim 11 which additionally comprises:

(d) applying light absorptive material to said array of tapered photopolymerized waveguides.

14. The process of claim 11 wherein said actinic radiation is ultraviolet light.

15. The process of claim 11 wherein said monomer is selected from the group consisting of methyl methacrylate, n-butyl acrylate, 2-ethylhexyl acrylate, isodecyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, cyclohexyl acrylate, 1,4-butanediol diacrylate, ethoxylated bisphenol A diacrylate, neopentylglycol diacrylate, diethyleneglycol diacrylate, diethylene glycol dimethacrylate, 1,6-hexanediol diacrylate, trimethylol propane triacrylate, pentaerythritol triacrylate, pentaerythritol tetra-acrylate, and mixtures thereof.

16. The process of claim 11 wherein said monomer is a mixture of ethoxylated bisphenol A diacrylate and trimethylol propane triacrylate.

17. The process of claim 11 wherein said photoinitiator is selected from the group consisting of benzidimethyl ketal;

α

,α

-diethyloxy acetophenone;

α

,α

-dimethyloxy-α

-hydroxy acetophenone;

50% 1-hydroxycyclohexyl phenyl ketone and 50% benzophenone;

1-hydroxy-cyclohexyl-phenyl ketone;

1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-propan-1-one;

2-methyl-1-4-(methylthio)phenyl]-2-morpholino-propan-1-one; and

2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one.

18. The process of claim 11 wherein said photoinitiator is selected from the group consisting of benzidimethyl ketal;

α

,α

-dimethyloxy-α

-hydroxy acetophenone;

50% 1-hydroxycyclohexyl phenyl ketone and 50% benzophenone;

1-hydroxy-cyclohexyl-phenyl ketone; and

1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl -propan-1-one.

19. The process of claim 11 wherein said photoinitiator is present in an amount from about 0.5 to about 12 percent by weight based on the total weight of said photopolymerizable mixture.

20. The process of claim 11 wherein said photoinitiator is present in an amount from about 0.5 to about 8 percent by weight based on the total weight of said photopolymerizable mixture.