Radio frequency monitor for semiconductor process control

• US 5,467,013 A
• Filed: 12/07/1993
• Issued: 11/14/1995
• Est. Priority Date: 12/07/1993
• Status: Expired due to Fees

• Current Assignee: Sematech, Inc.
• Original Assignee: Sematech, Inc.
• Inventors: Williams, Norman, Spain, James
• Primary Examiner(s): Karlsen, Ernest F.
• Application Number:
  US08/163,221
• Time in Patent Office: 707 Days
• Field of Search: 324/127, 324/117 R, 324/126, 324/95, 336/84 C, 156/626, 156/627, 156/643, 315/111.21
• US Class Current: 324/127
• CPC Class Codes: B24B 37/013 Devices or means for detecting lapping completion
• CPC Class Codes: H01J 2237/334 Etching
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32174 Circuits specially adapted for controlling the RF discharge
• CPC Class Codes: H01J 37/32183 Matching circuits
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32963 End-point detection
• CPC Class Codes: H01J 37/3299 Feedback systems
• CPC Class Codes: H01L 22/26 Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement endpoint detection arrangements in CMP apparatus B24B37/013, in discharge apparatus H01J37/32
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

A RF sensor for monitoring voltage, current and phase angle of a RF signal being coupled to a plasma reactor. Outputs from the sensor are used to calculate various properties of the plasma. These values are then utilized to characterize the process and/or used to provide feedback for in-situ control of an ongoing plasma process.

Claims

1. A radio frequency (RF) sensor, coupled to a transmission line disposed between a plasma reactor and an electrical source providing RF voltage and current to said plasma reactor, for monitoring said RE voltage and current on said transmission line comprising:

a first capacitance coupled between a first node and said transmission line;

a second capacitance coupled between said first node and a second node;

said first and second capacitances providing a capacitive voltage divider network wherein a first voltage output at said first node is a proportional representation of said RF voltage on said transmission line;

a wire loop disposed next to said transmission line at a point on said transmission line where said first capacitance is coupled but having an air gap between said loop and said transmission line, such that electromagnetic field lines generated by current flow in said transmission line is inductively coupled to said loop, wherein voltage induced in said loop by said current flow provides a second voltage output which is a proportional representation of said RF current on said transmission line;

an electromagnetic shielding, disposed around said first and second capacitances, inhibits electromagnetic interference from interacting with said first and second capacitances which interference can cause erroneous first voltage output at said first node;

said first and second voltage outputs providing for accurate measurement of said RF voltage and current and said measurement is also used to accurately determine a phase relationship between said RF voltage and current.

2. The RF sensor of claim 1 wherein said first and second capacitances are provided by capacitances of first and second capacitors, respectively.

3. The RF sensor of claim 1 wherein when a frequency of operation is above 10 MHz said first and second capacitances are provided by capacitances of first and second resistors, respectively.

4. The RF sensor of claim 1 wherein said first capacitance is provided by a capacitor and said second capacitance is provided by a capacitance of a twisted pair of wires.

5. A radio frequency (RF) sensor;

coupled to a transmission line disposed between a plasma reactor and an electrical source providing RF voltage and current to said plasma reactor, for monitoring said RF voltage and current on said transmission line in order to control operating parameters of said plasma reactor comprising;

a first capacitor coupled between a first node and said transmission line;

a second capacitor coupled between said first node and a common return;

said first and second capacitors providing a capacitive voltage divider network wherein a first voltage output at said first node is a proportional representation of said RF voltage on said transmission line;

a wire loop disposed next to said transmission line at a point on said transmission line where said first capacitor is coupled but having an air gap between said loop and said transmission line, such that electromagnetic field lines generated by current flow in said transmission line is inductively coupled to said loop, wherein voltage induced in said loop by said current flow provides a second voltage output which is a proportional representation of said RF current on said transmission line;

an electromagnetic shielding, disposed around said first and second capacitors, inhibits electromagnetic interference from interacting with said first and second capacitors which interference can cause erroneous first voltage output at said first node;

said first and second voltage outputs providing for accurate measurement of said RF voltage and current and said measurement is also used to accurately determine a phase difference between said RF voltage and RF current.

6. The RF sensor of claim 5 further including a first resistor coupled between a second node and said transmission line and a second resistor coupled between said first node and said common return to provide a resistive voltage divider network, wherein a third voltage output at said second node, when filtered for DC, provides a proportional representation of DC bias voltage on said transmission

7. The RF sensor of claim 6 wherein said first capacitor has an approximate value of 0.2 pF and said second capacitor has an approximate value of 50 pF.

8. The RF sensor of claim 7 wherein said wire loop has an approximate diameter of 1/2-11/2 cm., its nearest point being approximately 3-4 mm from said transmission line and said wire loop having sufficient length to have an inductive value of approximately 2-3 nH.

9. The RF sensor of claim 8 wherein said first capacitor is formed from an insulated twisted wire pair in order to obtain said 0.2 pF capacitance, but wherein insulation of said insulated twisted wire pair prevents breakdown of said first capacitor when said RF voltage exceeds 1 kilovolt.

10. The RF sensor of claim 9 further including a processor coupled to receive said voltage outputs for processing said voltage outputs to monitor a plasma parameter within said reactor, comparing said plasma parameter to a predetermined acceptable tolerance value for such parameter, and providing a feedback signal to adjust said electrical source when said plasma parameter is out of tolerance from said predetermined value.