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Particle detection system

  • US 5,467,188 A
  • Filed: 08/19/1994
  • Issued: 11/14/1995
  • Est. Priority Date: 08/20/1993
  • Status: Expired due to Fees
First Claim
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1. A particle detection system for detecting the number and size of microscopic particles generated in a process vacuum chamber in which a semiconductor manufacturing process is performed, the process vacuum chamber being formed by an enclosure, the particle detection system comprising:

  • a detection chamber defining an internal space and being mounted outside the enclosure forming the process vacuum chamber so as to communicate with the process vacuum chamber, and a laser beam transmitting window means and a scattered light extracting window; and

    a particle detector means arranged in an external atmospheric environment outside the detection chamber and including a light-emission means for emitting a laser beam into the detection chamber through the laser beam transmitting window means and a light-detection means for detecting scattered light generated within the detection chamber through the scattered light extracting window.

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