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Thin film resistor and method of fabrication

  • US 5,468,672 A
  • Filed: 06/29/1993
  • Issued: 11/21/1995
  • Est. Priority Date: 06/29/1993
  • Status: Expired due to Fees
First Claim
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1. A method of fabricating a thin film resistor, comprising the steps of:

  • sputter depositing a thin film of a resistive material having a thickness and a temperature coefficient of resistance on an insulative substrate in a reactive medium to increase, for a given sheet resistance, the thickness of the thin film while also increasing the temperature coefficient of resistance of the resistive material; and

    depositing on the thin film a cap layer comprising chromium silicon monoxide and heat treating the thin film and the cap layer wherein free chromium from the cap layer diffuses into the resistive material of the thin film to reduce the increased temperature coefficient of resistance of the resistive material resulting from the sputter depositing in the reactive medium.

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