Method and apparatus for controlling the feed of water treatment chemicals using a voltammetric sensor

• US 5,470,484 A
• Filed: 01/13/1994
• Issued: 11/28/1995
• Est. Priority Date: 01/13/1994
• Status: Expired due to Term

• Current Assignee: Buckman Laboratories International, Inc (Bulab Holdings Incorporated)
• Original Assignee: Buckman Laboratories International, Inc (Bulab Holdings Incorporated)
• Inventors: McNeel, Thomas E.
• Primary Examiner(s): Drodge, Joseph W.
• Application Number:
  US08/181,254
• Time in Patent Office: 684 Days
• Field of Search: 210/85, 210/96.1, 210/143, 210/198.1, 210/709, 210/746, 210/912, 422/82.01, 436/150, 324/439, 324/444, 204/153.1, 204/406, 204/407
• US Class Current: 210/746
• CPC Class Codes: G01N 27/49 Systems involving the determination of the current at a single specific value, or small range of values, of applied voltage for producing selective measurement of one or more particular ionic species
• CPC Class Codes: G01N 33/18 Water

Abstract

A method for controlling the chemical treatment of a solution comprises the steps of feeding a treatment chemical into the solution, applying an external voltage across a reference electrode and a working electrode of a voltammetric sensor while the electrodes are immersed in the solution, measuring a current that flows through the working electrode, converting the measured current into a feedback signal indicative of the concentration of treatment chemical in the solution, and using the feedback signal to control the rate of feeding the treatment chemical.

Claims

1. A method for controlling the chemical treatment of a solution comprising the steps of:

(a) feeding a treatment chemical into the solution to obtain a mixture of the treatment chemical and the solution;

(b) applying an external voltage across a reference electrode and a working electrode of a voltammetric sensor while the electrodes are immersed in and contact the mixture;

(c) measuring a current that flows through the working electrode;

(d) converting the measured current into a feedback signal which is indicative of a concentration of a substance in the mixture; and

(e) using the feedback signal to control a rate of feeding the treatment chemical in step (a).

2. The method according to claim 1, wherein using the feedback signal in step (e) comprises comparing the feedback signal and a reference signal to generate a control signal for controlling the rate of feeding the treatment chemical in step (a).

3. The method according to claim 1, wherein applying an external voltage step (b) comprises applying a d.c. voltage.

4. The method according to claim 1, wherein applying an external voltage step (b) comprises applying a voltage pulse train.

5. The method according to claim 4, wherein measuring a current in step (c) comprises measuring the current after the application of a voltage pulse of the pulse train to permit non-faradaic charging.

6. The method according to claim 1, further comprising the step of:

(f) applying a current to the working electrode sufficient to remove deposits from the working electrode.

7. The method according to claim 1, further comprising the steps of:

measuring a background signal before the treatment chemical is introduced into the solution; and

subtracting the background signal from the feedback signal after the treatment chemical has been introduced into the solution.

8. An apparatus for controlling the amount of treatment chemicals to be added to a solution, comprising:

means for feeding a treatment chemical into the solution to obtain a mixture of the treatment chemical and the solution;

a voltammetric sensor including;

a reference electrode,

a working electrode,

means for applying a voltage across the reference electrode and working electrode while the electrodes are immersed in and contact the mixture,

means for measuring a current that flows through the working electrode, and

means for converting the measured current into a feedback signal which is indicative of a concentration of a substance in the mixture; and

means for applying the feedback signal to the feeding means so as to control a rate of feeding the treatment chemical.

9. The apparatus according to claim 8, further comprising means for comparing the feedback signal with a reference signal to generate a control signal to the feeding means for controlling the rate of feeding the treatment chemical into the solution.

10. The apparatus according to claim 8, further comprising:

means for applying a current to the working electrode sufficient to remove deposits from the working electrode.

11. The apparatus according to claim 8, further comprising:

means for measuring a background signal before the treatment chemical is introduced into the solution; and

means for subtracting the background signal from the feedback signal after the treatment chemical has been introduced into the solution.

12. A method for controlling the chemical treatment of a solution comprising the steps of:

(a) feeding a treatment chemical into the solution to obtain a mixture of the treatment chemical and the solution;

(b) applying an external voltage across a counter electrode and a working electrode of a voltammetric sensor while the electrodes are immersed in and contact the mixture;

(c) maintaining a voltage between a reference electrode of the voltammetric sensor and the working electrode at a desired voltage level;

(d) measuring a current that flows through the working electrode;

(e) converting the measured current into a feedback signal which is indicative of a concentration of a substance in the mixture; and

(f) using the feedback signal to control a rate of feeding the treatment chemical in step (a).

13. The method according to claim 12, wherein applying an external voltage step (b) comprises applying a d.c. voltage.

14. The method according to claim 12, wherein applying an external voltage step (b) comprises applying a voltage pulse train.

15. The method according to claim 14, wherein measuring a current in step (b) comprises measuring the current after the application of a voltage pulse of the pulse train to permit a non-faradaic charging current to decay.

16. The method according to claim 12, further comprising the step of:

(g) applying a current to the working electrode sufficient to remove deposits from the working electrode.

17. The method according to claim 12, further comprising the steps of:

measuring a background signal before the treatment chemical is introduced into the solution; and

subtracting the background signal from the feedback signal after the treatment chemical has been introduced into the solution.

18. An apparatus for producing a feedback signal in a system for controlling the amount of treatment chemicals to be added to a solution, comprising:

means for feeding treatment chemicals into the solution to obtain a mixture of the treatment chemicals and the solution;

a voltammetric sensor including;

a reference electrode,

a working electrode,

a counter electrode,

means for applying an external voltage across the counter electrode and working electrode while the electrodes are immersed in and contact the mixture,

means for maintaining a voltage between the reference electrode and working electrode at a desired voltage,

means for measuring a current that flows through the working electrode, and

means for converting the measured current into a feedback signal which is indicative of the concentration of a substance in the mixture; and

means for using the feedback signal to control a rate of feeding the treatment chemicals in the solution.

19. The apparatus according to claim 18, further comprising means for applying a current to the working electrode sufficient to remove deposits from the working electrode.

20. The apparatus according to claim 18, further comprising:

means for measuring a background signal before the treatment chemicals are introduced into the solution; and

means for subtracting the background signal from the feedback signal after the treatment chemical have been introduced into the solution.