Uniform and repeatable plasma processing
First Claim
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1. A plasma processing system, comprising:
- a radio frequency power generator having a radio frequency power output;
a plasma chamber having a radio frequency electrode;
a radio frequency parameter sensor having a radio frequency input connected to said radio frequency power generator and a radio frequency output connected to said plasma chamber electrode, said parameter sensor having a signal output representative of the radio frequency power at said plasma chamber electrode; and
a controller connected to said sensor signal output, wherein said controller controls said radio frequency power generator output so that an initial first desired power value is applied to said electrode for a first amount of time and a second desired power value is applied to said electrode for a second amount of time after the first amount of time has elapsed.
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Abstract
Dynamic control and delivery of radio frequency power in plasma process systems is utilized to enhance the repeatability and uniformity of the process plasma. Power, voltage, current, phase, impedance, harmonic content and direct current bias of the radio frequency energy being delivered to the plasma chamber may be monitored at the plasma chamber and used to control or characterize the plasma load. Dynamic pro-active control of the characteristics of the radio frequency power to the plasma chamber electrode during the formation of the plasma enhances the uniformity of the plasma for more exact and controllable processing of the work pieces.
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Citations
30 Claims
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1. A plasma processing system, comprising:
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a radio frequency power generator having a radio frequency power output; a plasma chamber having a radio frequency electrode; a radio frequency parameter sensor having a radio frequency input connected to said radio frequency power generator and a radio frequency output connected to said plasma chamber electrode, said parameter sensor having a signal output representative of the radio frequency power at said plasma chamber electrode; and a controller connected to said sensor signal output, wherein said controller controls said radio frequency power generator output so that an initial first desired power value is applied to said electrode for a first amount of time and a second desired power value is applied to said electrode for a second amount of time after the first amount of time has elapsed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A method for measuring and controlling process parameters in a plasma processing system, said method comprising the steps of:
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monitoring a plurality of radio frequency parameters of a plasma chamber electrode with a parameter sensor connected at the electrode; dynamically controlling a radio frequency power generator so as to maintain desired parameter values at the plasma chamber electrode during a plasma process. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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Specification