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Uniform and repeatable plasma processing

  • US 5,474,648 A
  • Filed: 07/29/1994
  • Issued: 12/12/1995
  • Est. Priority Date: 07/29/1994
  • Status: Expired due to Term
First Claim
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1. A plasma processing system, comprising:

  • a radio frequency power generator having a radio frequency power output;

    a plasma chamber having a radio frequency electrode;

    a radio frequency parameter sensor having a radio frequency input connected to said radio frequency power generator and a radio frequency output connected to said plasma chamber electrode, said parameter sensor having a signal output representative of the radio frequency power at said plasma chamber electrode; and

    a controller connected to said sensor signal output, wherein said controller controls said radio frequency power generator output so that an initial first desired power value is applied to said electrode for a first amount of time and a second desired power value is applied to said electrode for a second amount of time after the first amount of time has elapsed.

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