Photosensitive mixture for producing relief and printing plates

• US 5,474,875 A
• Filed: 11/28/1994
• Issued: 12/12/1995
• Est. Priority Date: 01/29/1992
• Status: Expired due to Fees

• Current Assignee: Basf Lacke+Farben
• Original Assignee: Basf Lacke+Farben
• Inventors: Zwez, Thomas, Telser, Thomas, Loerzer, Thomas
• Primary Examiner(s): Bowers, Jr., Charles L.
• Assistant Examiner(s): VISCONTI, GERALDINA
• Application Number:
  US08/348,250
• Time in Patent Office: 379 Days
• Field of Search: 430/281, 430/286, 430/292, 430/293, 430/306
• US Class Current: 430/281.1
• CPC Class Codes: G03F 7/027 Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds G03F7/075 takes precedence
• CPC Class Codes: G03F 7/091 characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Abstract

A photosensitive mixture useful for producing relief and printing plates consists essentially of

(a) at least one block copolymer of styrene, butadiene and/or isoprene,

(b) at least one photopolymerizable olefinically at least monounsaturated organic compound,

(c) at least one photoinitiator, and

(d) at least one azo dye.

Claims

1. A photosensitive mixture consisting essentially of

(a) at least one block copolymer of styrene, butadiene and/or isoprene,

(b) at least one photopolymerizable olefinically at least monounsaturated organic compound,

(c) at least one photoinitiator, and

(d) at least one dye,

wherein said dye (d) comprises at least one azo dye of one of the general formulae (III ) to (V) ##STR5## where R⁷ =H, CH₃, COOH, COOR where R=C₁ to C₁₂ -alkyl, OCH₃ or NO₂,

R⁸ =R₈ =H, ##STR6## R⁹ =H, CH₃, NO₂ or SO₃ H, R¹⁰ =H or OH,

R¹¹ =H, OH, NH₂, NHR or NR₂ where R=C₁ - to C₁₂ -alkyl,

R¹² =H, C₁ - to C₁₂ -alkyl or SO₃ H.

2. A photosensitive mixture as defined in claim 1, containing

3. A photosensitive mixture as defined in claim 1, containing a plasticizer and/or a thermal polymerization inhibitor.

4. A process for producing relief and printing plates by subjecting a supported photosensitive layer to imagewise exposure under actinic light and developing the relief plate by washing out the nonirradiated parts of the layer, wherein the photosensitive layer consists essentially of the photosensitive mixture of claim 1.

5. A process for producing relief and printing plates by subjecting a supported photosensitive layer to imagewise exposure under actinic light and developing the relief plate by washing out the nonirradiated parts of the layer, wherein the photosensitive layer consists essentially of the photosensitive mixture of claim 2.

6. A process for producing relief and printing plates by subjecting a supported photosensitive layer to imagewise exposure under actinic light and developing the relief plate by washing out the nonirradiated parts of the layer, wherein the photosensitive layer consists essentially of the photosensitive mixture of claim 3.