Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces

• US 5,482,602 A
• Filed: 11/04/1993
• Issued: 01/09/1996
• Est. Priority Date: 11/04/1993
• Status: Expired due to Term

• Current Assignee: United Technologies Corporation (Raytheon Technologies Corporation d/b/a RTX)
• Original Assignee: United Technologies Corporation (Raytheon Technologies Corporation d/b/a RTX)
• Inventors: Cooper, Clark V., Isabelle, Charles J.
• Primary Examiner(s): NGUYEN, NAM X
• Application Number:
  US08/148,043
• Time in Patent Office: 796 Days
• Field of Search: 204/192.11, 204/192.15, 204/192.16, 204/192.29, 204/192.3, 204/192.32, 204/192.34, 204/298.04, 204/298.36, 427/523, 427/577
• US Class Current: 204/192.11
• CPC Class Codes: C23C 14/0605 Carbon
• CPC Class Codes: C23C 14/221 Ion beam deposition C23C14/46, C23C14/48 take precedence
• CPC Class Codes: F16C 33/00 Parts of bearings; Special methods for making bearings or parts thereof

Abstract

One broad-beam ion deposition coating method (10) for depositing diamond-like-carbon (DLC) coatings (124) on the dynamic surfaces (120S) of articles (120) subject to adherence difficulties includes the steps of: (12) preliminarily conditioning the dynamic surface (120S) for broad-beam ion deposition; (14)inserting the article (120) in a deposition chamber (102); (16) evacuating the deposition chamber (102) to a predetermined base pressure; (18) ion sputtering conditioning of the dynamic surface (120) by ionizing an inert gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy and directing the ion beam (104B) onto the dynamic surface; (20) depositing an interface layer (122) on the dynamic surface (120S) by ionizing a first gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy, and directing the ion beam (104B) onto a target (118) to dislodge atoms therefrom, the dislodged atoms depositing on the dynamic surface (120S) to form the interface layer (122); and (22) depositing a DLC coating (124) on the interface layer (122) by ionizing a carbon-based gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy and directing the ion beam (104B) for deposition of carbon ions (C+) onto the interface layer (122) to form the DLC coating (124) thereon.

Claims

1. A broad-beam ion deposition coating method for depositing a diamond-like-carbon coating indirectly to a dynamic surface of an article subject to adherence difficulties utilizing a broad-beam ion deposition apparatus, the broad-beam ion deposition apparatus including a deposition chamber, a broad-beam ion gun operative to generate an ion beam having a trajectory, vacuum means for evacuating the deposition chamber, gas supply means for supplying gas to the broad-beam ion gun and the deposition chamber, and a target interposable between the broad-beam ion gun and the dynamic surface, comprising the steps of:

(A) preliminarily conditioning the-dynamic surface of the article for broad-beam ion deposition;

(B) inserting the conditioned article within the deposition chamber wherein the dynamic surface is spatially orientated at a predetermined trajectory angle with respect to the ion beam trajectory;

(C) evacuating the;

deposition chamber to a predetermined base pressure utilizing the vacuum means;

(D) ion sputtering conditioning the dynamic surface of the article for broad-beam ion deposition by

(D1) providing a sputtering gas to the broad-beam ion gun utilizing the gas supply means,

(D2) operating the broad-beam ion gun to ionize the sputtering gas to generate a sputtering ion beam having a predetermined beam current density, and

(D3) accelerating the sputtering ion beam at a predetermined accelerating energy towards the dynamic surface wherein impact of the accelerated sputtering ion beam with the dynamic surface effectuates sputter cleaning thereof.

(E) depositing an interface layer having a predetermined thickness on the dynamic surface by

(E1) providing a first gas to the broad-beam ion gun utilizing the gas supply means,

(E2) operating the broad-beam ion gun to ionize the first gas to generate a first ion beam having a predetermined beam current density, and

(E3) accelerating the first ion beam towards the target at a predetermined accelerating energy to dislodge atoms therefrom, the dislodged atoms being deposited on the dynamic surface to form the interface layer on the dynamic surface; and

(F) depositing a diamond-like-carbon coating having a predetermined thickness on the interface layer deposited on the dynamic surface by

(F1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means,

(F2) operating the broad-beam ion gun to ionize the carbon-based gas to generate a second ion beam that includes carbon ions, the second ion beam having a predetermined beam current density, and

(F3) accelerating the second ion beam towards the dynamic surface at a predetermined accelerating energy wherein the carbon ions of the second ion beam are deposited on the interface layer to form the diamond-like-carbon coating for the dynamic surface of the article.

2. The method of claim 1 wherein the predetermined beam current density of the first ion beam of step (F2) is within the range of about 1.5 mA/cm² to about 3.5 mA/cm².

3. The method of claim 1 wherein the predetermined beam current density of the first ion beam of step (E2) is about 2.5 mA/cm².

4. The method of claim 1 where the predetermined accelerating energy for the first ion beam of step (E3) is within the range of about 1.00 keV to about 1.20 keV.

5. The method of claim 1 where the predetermined accelerating energy for the first ion beam of step (E3) is about 1.05 keV.

6. The method of claim 1 wherein the predetermined beam current density of the second ion beam of step (F2) is within the range of about 1.5 mA/cm² to about 3.5 mA/cm².

7. The method of claim 1 wherein the predetermined beam current density of the second ion beam of step (F2) is about 2.5 mA/cm².

8. The method of claim 1 where the predetermined accelerating energy for the second ion beam of step (F3) is within the range of about 200 eV to about 1000 eV.

9. The method of claim 1 where the predetermined accelerating energy for the second ion beam of step (F3) is within the range of about 450 eV to about 700 eV.

10. The method of claim 1 where the predetermined accelerating energy for the second ion beam of step (F3) is about 450 eV.

11. The method of claim 1 wherein the first gas supplied in step (E1) is argon gas and wherein the target is formed of silicon such that the interface layer deposited on the dynamic surface is a silicon interface layer.

12. The method of claim 1 wherein step (E1) further includes providing methane gas at a predetermined partial pressure to the deposition chamber, and further wherein the target is formed from silicon such that the interface layer deposited on the dynamic surface is an amorphous silicon:

carbon;

hydrogen interface layer.

13. The method of claim 1 wherein the predetermined partial pressure of the methane gas provided in step (E1) is about 1.5×

10^-4 torr.

14. The method of claim 1 wherein the predetermined thickness of the interface layer deposited on the dynamic surface in step (E3) is within the range of about 0.10 μ

m to about 0.15 μ

m.

15. The method of claim 1 wherein the predetermined thickness of the diamond-like-carbon coating deposited to the interface layer in step (F3) is within the range of about 0.50 μ

m to about 2.0 μ

m.

16. The method of claim 1 wherein the predetermined thickness of the diamond-like-carbon coating deposited to the interface layer in step (F3) is within the range of about 0.70 μ

m to about 1.5 μ

m.

17. The method of claim 1 wherein the predetermined beam current density of the sputtering ion beam of step (D2) is within the range of about 1.5 mA/cm² to about 3.5 mA/cm².

18. The method of claim 1 wherein the predetermined beam current density of the sputtering ion beam of step (D2) is about 2.5 mA/cm².

19. The method of claim 1 wherein the predetermined accelerating energy of the sputtering ion beam of step (D3) is within the range of about 1.00 keV to about 1.20 keV.

20. The method of claim 1 wherein the predetermined accelerating energy of the sputtering ion beam of step (D3) is about 1.05 keV.

21. The method of claim 1 wherein the predetermined base pressure of the evacuated deposition chamber in step (C) is not greater than 3×

10^-5 torr.

22. The method of claim 1 wherein the predetermined base pressure of the evacuated deposition chamber in step (C) is about 2.5×

10^-5 torr.

23. The method of claim 1 wherein the preliminary conditioning step (A) comprises mechanically preparing the dynamic surface for broad-beam ion deposition.

24. The method of claim 1 wherein the preliminary conditioning step (A) comprises chemical cleaning of the dynamic surface for broad-beam ion deposition.

25. The method of claim 1 wherein the preliminary conditioning step (A) comprises the substeps of:

(A1) mechanically conditioning of the dynamic surface for broad-beam ion deposition; and

(A2) chemically cleaning the dynamic surface for broad-beam ion deposition.

26. A broad-beam ion deposition coating method for depositing a diamond-like-carbon coating directly to a dynamic surface of an article not subject to adherence difficulties utilizing a broad-beam ion deposition apparatus, the broad-beam ion deposition apparatus including a deposition chamber, a broad-beam ion gun operative to generate an ion beam having a trajectory, vacuum means for evacuating the deposition chamber, and gas supply means for supplying gas to the broad-beam ion gun and the deposition chamber, comprising the steps of:

(A) preliminarily conditioning the dynamic surface of the article for broad-beam ion deposition;

(B) inserting the conditioned article within the deposition chamber wherein the dynamic surface is spatially orientated at a predetermined trajectory angle with respect to the ion beam trajectory;

(C) evacuating the deposition chamber to a predetermined base pressure utilizing the vacuum means;

(D) ion sputtering conditioning the dynamic surface of the article for broad-beam ion deposition by

(D1) providing a sputtering gas to the broad-beam ion gun utilizing the gas supply means,

(D2) operating the broad-beam ion gun to ionize the sputtering gas to generate a sputtering ion beam having a predetermined beam current density, and

(D3) accelerating the sputtering ion beam at a predetermined accelerating energy towards the dynamic surface wherein impact of the accelerated sputtering ion beam with the dynamic surface effectuates sputter cleaning thereof; and

(E) depositing a diamond-like-carbon coating having a predetermined thickness to the dynamic surface by

(E1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means,

(E1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means,

(E2) operating the broad-beam ion gun to ionize the carbon-based gas to generate an ion beam that includes carbon ions, the ion beam having a predetermined beam current density, and

(E3) accelerating the ion beam towards the dynamic surface at a predetermined accelerating energy wherein the carbon ions of the ion beam are deposited on the dynamic surface to form the diamond-like-carbon coating for the dynamic surface of the article.

27. The method of claim 26 wherein the predetermined beam current density of the ion beam of step (E2) is within the range of about 1.5 mA/cm² to about 3.5 mA/cm².

28. The method of claim 26 wherein the predetermined beam current density of the ion beam of step (E2) is about 2.5 mA/cm².

29. The method of claim 26 wherein the predetermined accelerating energy for the ion beam of step (E3) is within the range of about 200 eV to about 1000 eV.

30. The method of claim 26 wherein the predetermined accelerating energy for the ion beam of step (E3) is within the range of about 450 eV to about 700 eV.

31. The method of claim 26 wherein the predetermined accelerating energy for the ion beam of step (E3) is about 450 eV.

32. The method of claim 26 wherein the predetermined thickness of the diamond-like-carbon coating deposited on the dynamic surface in step (E3) is within the range of about 0.50 μ

m to about 2.0 μ

m.

33. The method of claim 26 wherein the predetermined thickness of the diamond-like-carbon coating deposited on the dynamic surface in step (E3) is within the range of about 0.70 μ

m to about 1.5 μ

m.

34. The method of claim 26 wherein the predetermined beam current density of the sputtering ion beam of step (D2) is within the range of about 1.5 mA/cm² to about 3.5 mA/cm².

35. The method of claim 26 wherein the predetermined beam current density of the sputtering ion beam of step (D2) is about 2.5 mA/cm².

36. The method of claim 26 wherein the predetermined accelerating energy of the sputtering ion beam of step (D3) is within the range of about 1.00 keV to about 1.20 keV.

37. The method of claim 26 wherein the predetermined accelerating energy of the sputtering ion beam of step (D3) is about 1.05 keV.

38. The method of claim 26 wherein the predetermined base pressure of the evacuated deposition chamber in step (C) is not greater than 3×

10^-5 torr.

39. The method of claim 26 wherein the predetermined base pressure of the evacuated deposition chamber in step (C) is about 2.5×

10^-5 torr.

40. The method of claim 26 wherein the preliminary conditioning step (A) comprises mechanically conditioning the dynamic surface for broad-beam ion deposition.

41. The method of claim 26 wherein the preliminary conditioning step (A) comprises chemical cleaning of the dynamic surface for broad-beam ion deposition.

42. The method of claim 26 wherein the preliminary conditioning step (A) comprises the substeps of:

(A1) mechanically conditioning the dynamic surface for broad-beam ion deposition; and

(A2) chemically cleaning the dynamic surface for broad-beam ion deposition.