Potentiated aqueous ozone cleaning composition for removal of a contaminating soil from a surface

• US 5,484,549 A
• Filed: 08/30/1993
• Issued: 01/16/1996
• Est. Priority Date: 08/30/1993
• Status: Expired due to Term

• Current Assignee: Ecolab USA Incorporated (Ecolab, Inc.)
• Original Assignee: Ecolab, Inc.
• Inventors: Hei, Robert D., Wei, Guang-jong J., Oakes, Thomas R.
• Primary Examiner(s): Dees, Jose G.
• Assistant Examiner(s): Frazier, Barbara S.
• Application Number:
  US08/114,193
• Time in Patent Office: 869 Days
• Field of Search: 252/103, 252/95, 252/135, 252/156, 252/173, 252/174.14, 252/174.15, 252/174.16
• US Class Current: 510/370
• CPC Class Codes: C11D 3/3942 Inorganic per-compounds C11D3/3902 takes precedence
• CPC Class Codes: C11D 3/3947 Liquid compositions

Abstract

A pH greater than 7 aqueous ozonized cleaning composition can be used for cleaning a tenacious residue or film from solid surfaces. The cleaning properties can be potentiated by additive materials. Ozone, generated by electrical discharge, can be blended into effective aqueous cleaning compositions that can efficiently clean proteinaceous, oily or carbohydrate soil from a variety of surfaces. Immediately after ozone generation, the ozone containing gas stream comprising ozone and the residual air is injected through a hose into an aqueous potentiating additive containing carrier solution, forming a cleaning solution which is applied immediately to a soiled solid surface to remove a contaminating residue or film.

Claims

1. A composition for cleaning inorganic or organic soil from a surface, the composition comprising:

(a) an aqueous medium;

(b) at least about 100 parts of a Lewis base per million parts by weight of the composition; and

(c) an effective concentration of ozone sufficient to produce an oxidation-reduction potential of at least +350 mV with respect to an Ag/AgCl reference electrode.

2. The composition for cleaning of claim 1, wherein the aqueous medium is an alkaline solution having a pH of about 7.0 or more and the oxidation-reduction potential is at least +600 mV.

3. The composition for cleaning of claim 2, wherein the alkaline solution comprises a compound selected from the group of alkali metal bases consisting of an hydroxide, a silicate, a polysilicate, a phosphate, a polyphosphate, a borate, a bicarbonate, a carbonate or mixtures thereof.

4. The composition for cleaning of claim 3, wherein the aqueous medium has a pH of about 7.5 or more and the oxidation-reduction potential is greater than +750 mV.

5. The composition for cleaning of claim 4, wherein the aqueous solution is an alkaline'"'"'solution having a pH of greater than 8.0.

6. The composition for cleaning of claim 1, wherein the cleaning composition comprises at least 0.1 ppm of dissolved ozone.

7. The composition for cleaning of claim 2, wherein the aqueous alkaline solution has a pH of 8.5 and comprises an alkali metal carbonate, an alkali metal bicarbonate or mixtures thereof.

8. The composition for cleaning of claim 7, wherein the aqueous alkaline solution comprises sodium or potassium carbonate and sodium or potassium bicarbonate.

9. The composition for cleaning of claim 1, wherein the Lewis base comprises a sequestrant composition.

10. The composition for cleaning of claim 9, wherein the sequestrant composition comprises:

an organic sequestrant selected from the group consisting of EDTA, NTA, a gluconic acid, a phosphonic acid, a phosphonate, a polyacrylic acid or a combination thereof.

11. The composition of claim 9 wherein the sequestrant composition comprises an inorganic sequestrant selected from the group consisting of an alkali metal pyrophosphate or an alkali metal tripolyphosphate.

12. The composition for cleaning of claim 2, wherein the cleaning composition further comprises an effective wetting amount of a surfactant.

13. The composition for cleaning of claim 12, wherein the surfactant is a nonionic surfactant.

14. A cleaning composition for cleaning solid surfaces, the cleaning composition comprises:

(a) an aqueous medium with a pH greater than 7.5;

(b) at least about 100 parts of an alkali metal carbonate or bicarbonate per each million parts by weight of the composition; and

(c) an effective concentration of ozone sufficient to produce an oxidation-reduction potential of at least +550 mV with respect to an Ag/AgCl reference electrode.

15. The cleaning composition of claim 14 wherein the alkali metal is sodium or potassium and the pH is 8-11.

16. A cleaning composition for cleaning solid surfaces, the cleaning composition comprises:

(a) an aqueous medium of pH between about 8-11;

(b) at least about 100 parts of an alkali metal phosphate, pyrophosphate or tripolyphosphate per each million parts by weight of the composition; and

(c) an effective concentration of an active ozone composition sufficient to produce an oxidation-reduction potential of at least +600 mV with respect to an Ag/AgCl reference electrode.

17. The cleaning composition of claim 16 wherein the alkali metal phosphate species comprises sodium orthophosphate.

18. The composition of claim 16 wherein the alkali metal tripolyphosphate comprises sodium tripolyphosphate.