Methods and devices for using photorefractive materials at infrared wavelengths

• US 5,491,570 A
• Filed: 12/16/1992
• Issued: 02/13/1996
• Est. Priority Date: 07/26/1991
• Status: Expired due to Fees

• Current Assignee: Ondax Incorporated (Coherent Corp.)
• Original Assignee: Accuwave Corporation
• Inventors: Rakuljic, George A., Leyva, Victor
• Primary Examiner(s): Sikes, William L.
• Assistant Examiner(s): PARSONS, DAVID
• Application Number:
  US07/991,571
• Time in Patent Office: 1,154 Days
• Field of Search: 359/1, 359/3, 359/4, 359/6, 359/7, 359/9, 359/10, 359/15, 359/350, 359/355, 359/359, 359/361
• US Class Current: 359/7
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G02B 5/32 Holograms used as optical elements
• CPC Class Codes: G03H 1/02 Details of features involved during the holographic process; Replication of holograms without interference recording
• CPC Class Codes: G03H 1/04 Processes or apparatus for producing holograms G03H1/26 takes precedence
• CPC Class Codes: G03H 1/28 superimposed holograms only
• CPC Class Codes: G03H 2001/026 Recording materials or recording processes G03H2226/11 takes precedence; corresponding details, see subgroups of G03H2260/00
• CPC Class Codes: G03H 2001/0268 Inorganic recording material, e.g. photorefractive crystal [PRC]
• CPC Class Codes: G03H 2001/0413 for recording transmission holograms
• CPC Class Codes: G03H 2001/2231 Reflection reconstruction
• CPC Class Codes: G03H 2001/2289 when reconstruction wavelength differs form recording wavelength
• CPC Class Codes: G03H 2222/16 Infra Red [IR]
• CPC Class Codes: G03H 2250/32 Antireflective layer
• CPC Class Codes: G06V 10/88 Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters
• CPC Class Codes: G11B 7/0065 Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
• CPC Class Codes: G11C 13/044 using electro-optical elements
• CPC Class Codes: H01S 3/06 Construction or shape of active medium
• CPC Class Codes: H01S 3/08009 using a diffraction grating
• CPC Class Codes: H01S 3/109 Frequency multiplication, e.g. harmonic generation
• CPC Class Codes: H01S 3/16 Solid materials

Abstract

A method of writing plane holographic gratings Bragg-matched for reflection in the infrared in a photorefractive material using shorter wavelength light through a face perpendicular to the grating planes. The writing beam wavelength is selected to be within the photorefractive sensitivity range of the crystal and the angles are chosen relative to the wavelength to define a reflection grating with a period such that counter-propagating reflection occurs at the desired IR wavelength. For reflection gratings at different wavelengths, either the transmission or the reflection mode geometry may be used. In the transmission mode, the writing beams are incident on the same side face while in the reflection made the writing is on opposite faces in an off-axis (non-counter-propagating) configuration. Anti-reflection coatings of the appropriate wavelengths are used on the crystal surfaces to reduce reflection losses and improve the diffraction efficiency of the grating.

Claims

1. A method of writing holographic gratings in a photorefractive crystal to reflect in a wavelength band which is a longer wavelength than a photorefractive response band of the crystal, the crystal having a c-axis and sides orthogonal and parallel thereto, comprising the steps of:

directing a first coherent beam onto the crystal at an acute incidence angle to a first side thereof, the first side being substantially parallel to the c-axis of the crystal, the reference beam having a first wavelength within the photorefractive response band of the crystal;

directing a second coherent beam at the first wavelength onto the crystal on the first side thereof and at an acute incidence angle to define with the first beam an interference grating within the crystal, such that the grating is reflective to wave energy directed onto a side of the crystal substantially normal to the C-axis at a wavelength greater than a photorefractive response band of the crystal.

2. The method as set forth in claim 1 above, wherein the crystal is 0.05% Fe-doped LiNbO₃ and has a photorefractive response band of about 350 nm to 700 nm.

3. The method as set forth in claim 1 above, wherein the grating is reflective at a wavelength greater than 770 nm.

4. The method as set forth in claim 1 above, wherein the grating is reflective at an approximately 1310 nm wavelength.

5. The method of writing a reflective hologram in a photorefractive crystal, wherein the hologram is reflective to an incident beam at a reading side at a wavelength longer than a photorefractive sensitivity range of the crystal, comprising the steps of:

writing a plane holographic grating in the crystal, by illumination of the crystal with interfering beams at wavelengths lying in the photorefractive sensitivity range of the crystal, through at least one face substantially perpendicular to the holographic grating planes; and

rendering the holographic grating substantially permanent.

6. The method as set forth in claim 5 above, wherein the crystal is substantially rectangular and has a c-axis, the illumination is through one or more sides substantially parallel to the c-axis, and the grating planes are substantially normal to the c-axis, and wherein writing beams are directed onto the crystal at angles Θ

relative to the c-axis that vary in relation to the grating wavelength λ

_r, the index of refraction n_r of the crystal and the wavelength λ

_w of the incident beams.

7. The method as set forth in claim 6 above wherein the Bragg condition:

##EQU7## is satisfied by choice of illumination angle and writing wavelengths, wherein φ

is an angle of incidence of a reflected beam relative to the normal of holographic grating planes.

8. The method as set forth in claim 7 above, wherein the step of writing comprises directing the writing beams into the crystal at the same side, with the angle Θ

being the angle between the incident beam and the plane of the gratings being formed, and the side being adjacent the reading side of the crystal.

9. The method as set forth in claim 6 above, wherein the step of writing comprises directing the writing beams into the crystal at opposite sides, one of which is the reading side of the crystal, and with the angle Θ

is the angle between the beams and an axis orthogonal to the plane of the gratings.

10. The method as set forth in claim 9 above, wherein the Bragg condition is satisfied by:

##EQU8## by choice of illumination angle and writing wavelength, wherein φ

is an angle of incidence of a reflected beam relative to the normal of the holographic grating planes and n_w is an index of refraction at the wavelength λ

_w of the writing beams.

11. An electromagnetic wave reflector device comprising a photorefractive crystal having a photorefractive sensitivity range of about 350 nm to 700 nm and a c-axis, the crystal having a holographic grating therein with planes substantially normal to the c-axis of the crystal, the grating being reflective to an incident beam through a face substantially normal to the c-axis of the crystal at a wavelength greater than 770 nm.

12. A device as set forth in claim 11 above, wherein the crystal is 0.05% Fe-doped LiNbO₃ and has anti-reflection coating thereon, and wherein the grating is reflective to approximately 1310 nm wavelength incident beams.

13. A device as set forth in claim 12 above, wherein the grating is the product of Bragg condition matched interfering beams in the photorefractive sensitivity range of the crystal and has a bandwidth less than about 1 Å

, and a reflectivity of greater than about 5%.

14. A device as set forth in claim 13 above, wherein the grating is permanently fixed in the crystal.

15. An electromagnetic wave reflector device comprising a photorefractive crystal having a photorefractive sensitivity in a first wavelength range, the crystal having a holographic grating therein which is reflective in a selected direction to incident beams in a wavelength range longer than the first range.

16. A method of writing reflection mode holographic gratings in a photorefractive material, comprising the steps of:

writing plane holographic gratings in the material Bragg-matched for reflection at a desired infrared wavelength at a specific incidence angle, using shorter wavelength writing beams through a face of the material perpendicular to the grating planes, wherein the writing beams'"'"' wavelength is selected to be within the photorefractive sensitivity range of the material and to obtain a Bragg condition solution for the desired infrared wavelength; and

controlling the angle and wavelength of the writing beams to obtain a desired grating spacing inside the material for substantially normal incidence reflection at the desired infrared wavelength.

17. The method as set forth in claim 16 above, wherein the gratings are written for retro-reflection, at the desired infrared wavelength.

18. A method of writing reflection mode holographic gratings in a photorefractive material, comprising the steps of:

writing plane holographic gratings Bragg-matched for retro-reflection at a desired infrared wavelength in the material using shorter wavelength writing beams in reflection mode, wherein the writing beams'"'"' wavelength is selected to be within the photorefractive sensitivity range of the material and to obtain a Bragg condition solution for the desired infrared wavelength; and

controlling the angle and wavelength of the writing beams to obtain a desired grating spacing inside the material for normal incidence reflection at the desired infrared wavelength.

19. The method as set forth in claim 18 above, wherein the gratings are written for retro-reflection at the desired infrared wavelength.

20. A method for writing volume holographic gratings Bragg-matched for reflection at infrared wavelengths outside the photorefractive sensitivity range of a host material, comprising the steps of:

illuminating the material using one or more visible wavelength plane writing beams incident upon side faces of the material parallel to the material'"'"'s c-axis, so that a resulting grating period inside the material is matched for reflection at a desired infrared wavelength and incidence angle; and

coating the material with an anti-reflection layer for the infrared wavelength on a c-axis face of the material and for the visible writing beam wavelength on the side faces of the material.

21. The invention as set forth in claim 20, wherein the writing beams are incident through the side faces of the material, and further, wherein the wavelength and incidence angle solution for the desired infrared wavelength is given by the Bragg condition:

##EQU9## where Θ

is an angle of the writing beams measured outside the material relative to the normal of illuminated surface of the material, n_r is an index of refraction of the material, λ

_w is the writing beams'"'"' wavelength, and λ

_r is the desired infrared wavelength.

22. The invention as set forth in claim 20, wherein the illuminating step further comprises monitoring a reflection'"'"'s wavelength using a variable wavelength laser, and adjusting the writing beams until a desired infrared wavelength is obtained.

23. The invention as set forth in claim 20, wherein the laser is a temperature-tuned distributed feedback (DFB) laser.

24. The invention as set forth in claim 20, further comprising the step of fixing the grating to render it insensitive to illumination.

25. The invention as set forth in claim 20, wherein the wavelength of normal incidence reflection is specified by varying the angle of incidence of the writing beams.

26. The invention as set forth in claim 20, wherein the wavelength of normal incidence reflection is specified by varying the wavelength of the writing beams.

27. The invention as set forth in claim 20, wherein the wavelength of normal incidence reflection is specified by varying both the angle of incidence of the writing beam and the wavelength of the writing beam.