Self-aligned, monolithic, solid microlaser with passive switching by a saturable absorber and a production process therefor

• US 5,495,494 A
• Filed: 11/14/1994
• Issued: 02/27/1996
• Est. Priority Date: 11/15/1993
• Status: Expired due to Term

• Current Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Original Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Inventors: Nunzi, Jean-Michel, Aubert, Jean-Jacques, Marty, Jean, Molva, Engin
• Primary Examiner(s): Bovernick, Rodney B.
• Assistant Examiner(s): Wise, Robert E.
• Application Number:
  US08/339,706
• Time in Patent Office: 470 Days
• Field of Search: 372/11, 372/98, 372/10, 372/12
• US Class Current: 372/98
• CPC Class Codes: G02F 1/3523 Non-linear absorption changing by light, e.g. bleaching
• CPC Class Codes: H01S 3/025 of solid state lasers, e.g. housings or mountings
• CPC Class Codes: H01S 3/0604 in the form of a plate or disc
• CPC Class Codes: H01S 3/0615 Shape of end-face
• CPC Class Codes: H01S 3/0627 the resonator being monolithic, e.g. microlaser
• CPC Class Codes: H01S 3/094053 Fibre coupled pump, e.g. delivering pump light using a fibre or a fibre bundle
• CPC Class Codes: H01S 3/094084 with pump light recycling, i.e. with reinjection of the unused pump light, e.g. by reflectors or circulators
• CPC Class Codes: H01S 3/0941 of a laser diode
• CPC Class Codes: H01S 3/113 using intracavity saturable absorbers
• CPC Class Codes: H01S 3/1608 erbium
• CPC Class Codes: H01S 3/161 holmium
• CPC Class Codes: H01S 3/1611 neodymium
• CPC Class Codes: H01S 3/1616 thulium
• CPC Class Codes: H01S 3/1618 ytterbium
• CPC Class Codes: H01S 3/1635 LaMgAl11O19 (LNA, Lanthanum Magnesium Hexaluminate)
• CPC Class Codes: H01S 3/1643 YAG
• CPC Class Codes: H01S 3/1653 YLiF4(YLF, LYF)
• CPC Class Codes: H01S 3/1661 Y2SiO5 [YSO]
• CPC Class Codes: H01S 3/1671 vanadate, niobate, tantalate
• CPC Class Codes: H01S 3/1673 YVO4 [YVO]

Abstract

A self-aligned, monolithic, solid microlaser with passive switching by a saturable absorber and a production process therefor. The cavity for the microlaser has a solid active medium, a saturable absorber, an entrance mirror and an exit mirror, wherein the saturable absorber is a thin film of saturable absorbent material directly deposited on the solid active medium.

Claims

1. A microlaser cavity which comprises:

a solid, active medium, a saturable absorber, an entrance mirror and an exit mirror, wherein the saturable absorber comprises a thin saturable absorber material film directly deposited on the solid, active medium.

2. A microlaser cavity according to claim 1, wherein the solid, active medium comprises a base material selected from the group consisting of Y₃ Al₅ O₁₂, LaMgA₁₁ O₁₉, YVO₄, Y₂ SiO₅, YLiF₄ or GdVO₄, doped with ions of neodymium (nd), erbium (Er), thulium (Tm), holmium (Ho), or a codoping of thulium and holmium (Tm+Ho).

3. A microlaser cavity according to claims 1 or 2, wherein the thin film is formed from an organic dye dissolved in a polymer solvent.

4. A microlaser cavity according to claim 3, wherein the organic dye is selected from the group consisting of bis(4-diethylaminodithiobenzyl)-nickel or bis(4-dimethylaminodithiobenzyl)-nickel and the solvent comprises a solution of polymethyl methacrylate (PMMA), polyvinyl alcohol, polyvinyl acetate or polystyrene.

5. A microlaser cavity according to claim 2, wherein the thin film is deposited by liquid phase epitaxy, and the film is formed from a base material identical to that of the solid, active medium and doped with Cr⁺⁴ or Er³⁺ ions.

6. A microlaser cavity according to one of claims 1 or 2, wherein the laser cavity comprises a second saturable absorber film.

7. A microlaser cavity according to claim 1, wherein the thin film is deposited by liquid phase epitaxy.

8. A microlaser cavity according to claim 1, which comprises a microlens array directly formed on the laser material.

9. A microlaser cavity according to claim 1, wherein the entrance mirror and the exit mirror comprise dichroic mirrors.

10. A microlaser, which comprises:

a microlaser cavity according to claim 1 and optical means for pumping the cavity.

11. Microlaser according to claim 10, wherein the pumping means comprises at least one laser diode.

12. Microlaser according to one of the claims 10 or 11, wherein the laser cavity and the optical pumping means are installed in a case.

13. Microlaser according to one claims 10 or 11, wherein the microlaser cavity and the optical pumping means are each installed in different cases, the cases being linked by an optical fiber.

14. A microlaser which comprises:

a microlaser cavity according to claim 1, and an optical pump, said optical pump pumping the cavity.

15. The microlaser according to claim 14, wherein the optical pump comprises at least one laser diode.

16. A microlaser according to one of claims 14 or 15, wherein the laser cavity and the optical pump are installed in a case.

17. A microlaser according to one of claims 14 or 15, wherein the microlaser cavity and the optical pump are each installed in difference cases, the cases being linked by an optical fiber.

18. A process for the production of a microlaser cavity having a solid, active medium, a saturable absorber, and entrance mirror and an exit mirror, wherein the saturable absorber includes a thin soluble absorber material film directly deposited on the solid, active medium, which comprises:

a conditioning stage, at a predetermined thickness, of the material forming the solid, active medium,

a stage of forming a saturable absorber film directly on one of the faces of the material prepared according to the preceding stage.

19. Process according to claim 18, wherein the thin film is deposited with a whirler.

20. Process according to one of claims 18 or 19, wherein the thin film is formed from an organic dye dissolved in a polymer solvent.

21. Process according to claim 20, wherein the organic dye is selected from a group consisting of bis(4-diethylaminodithiobenzyl)-nickel or bis(4-dimethylaminodithiobenzyl)-nickel and the solvent comprises a solution of polymethyl methacrylate (PMMA), polyvinyl alcohol, polyvinyl acetate or polystyrene.

22. Process according to claim 18, which comprises depositing the thin film by liquid phase epitaxy.

23. Process according to claim 22, wherein the solid, active medium comprises a base material selected from the group consisting of Y₃ Al₅ O₁₂, LaMgA₁₁ O₁₉, YVO₄, Y₂ SiO₅, YLiF₄ or GdVO₄, doped with ions of neodymium (Nd), erbium (Er), thulium (Tm), holmium (Ho), or with a codoping of erbium and ytterbium (Er+Yb) ions, or with a codoping of thulium and holmium (Tm+Ho).

24. Process according to claim 23, which comprises forming the thin film from a base material identical to that of the active laser material, and doping said base material with Cr⁺⁴ or Er³⁺ ions.

25. Process according to claim 18, which comprises depositing a second saturable absorber film on another face of the active laser material.

26. Process according to claim 18, which comprises forming in a supplementary stage a microlens array directly on the laser material.

27. Process according to claim 26, which comprises etching the microlens array directly on the active laser material.

28. Process according to claim 18, which comprises forming an entrance mirror and an exit mirror of the microlaser cavity by the deposition of dielectric multilayers.