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Real time measurement of etch rate during a chemical etching process

  • US 5,500,073 A
  • Filed: 05/08/1995
  • Issued: 03/19/1996
  • Est. Priority Date: 06/30/1994
  • Status: Expired due to Fees
First Claim
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1. A contactless real-time in-situ chemical etch monitor for providing an indication of a condition of an etching process during etching of at least one wafer in a wet chemical etchant bath, said monitor comprising:

  • a) two conductive electrodes;

    b) a means for positioning said two conductive electrodes inside the wet chemical etchant bath proximate to but not in contact with the at least one wafer;

    c) a means for monitoring an electrical characteristic between the two electrodes as a function of time in the etchant bath of the at least one wafer, wherein a change in the electrical characteristic is indicative of a state of the etching process; and

    d) a means for recording a plurality of values of said electrical characteristic as a function of time during etching.

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