Black matrix substrate, and color filter and liquid crystal display device using the same

• US 5,501,900 A
• Filed: 03/01/1994
• Issued: 03/26/1996
• Est. Priority Date: 03/03/1993
• Status: Expired due to Term

• Current Assignee: Dai Nippon Printing Company Limited
• Original Assignee: Dai Nippon Printing Company Limited
• Inventors: Harada, Ryutaro, Mitamura, Satoshi
• Primary Examiner(s): Ryan, Patrick J.
• Assistant Examiner(s): Krynski, William A.
• Application Number:
  US08/203,569
• Time in Patent Office: 756 Days
• Field of Search: 430/7, 430/56, 430/76, 430/82, 204/181.1, 204/181.5, 204/181.6, 354/1, 350/311, 350/314, 428/1, 428/195, 428/913, 428/914, 428/206, 428/323, 428/328, 428/520
• US Class Current: 428/323
• CPC Class Codes: C09K 2323/06 Substrate layer characterised by chemical composition
• CPC Class Codes: G02B 5/201 in the form of arrays
• CPC Class Codes: G02F 1/133512 Light shielding layers, e.g. black matrix G02F1/136209 takes precedence
• CPC Class Codes: Y10S 428/913 Material designed to be responsive to temperature, light, moisture
• CPC Class Codes: Y10T 428/24802 Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
• CPC Class Codes: Y10T 428/24893 including particulate material
• CPC Class Codes: Y10T 428/25 Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
• CPC Class Codes: Y10T 428/256 Heavy metal or aluminum or compound thereof
• CPC Class Codes: Y10T 428/31928 Ester, halide or nitrile of addition polymer

Abstract

A black matrix substrate is provided with a substrate, and a black pattern formed on the substrate. The black pattern includes at least metal particles in a resin pattern, which comprises resin formed in a pattern shape. The metal particles have such a particle diameter distribution that particles having particle diameters in a range of 5 nm to 50 nm are not less than 80% of the total particles. A projected area density at a conversion of 600 Å thickness of the metal particles in the black pattern, is not less than 60%. An optical density of the black matrix substrate is not less than 1.5. A color filter, which has a high contrast ratio, can be constructed by use of this black matrix substrate. Further, a liquid crystal display device, which has a good image quality, can be constructed by use of this color filter.

Claims

1. A black matrix substrate comprising:

a substrate; and

a black pattern formed on said substrate, said black pattern comprising a hydrophilic resin and metal particles precipitated therein;

wherein (i) said metal particles have such a particle diameter distribution that particles having particle diameter in a range of 10 nm to 20 nm are not less than 40% of the total particles, in a range of 10 nm to 30 nm are not less than 80% of the total particles and in a range of 5 nm to 50 nm are not less than 90% of the total particles, (ii) a projected area density at a conversion of 600 Å

thickness of said metal particles in said black pattern is not less than 60%, and (iii) an optical density of said black matrix substrate is not less than 1.5;

said black pattern being formed by depositing said hydrophilic resin on said substrate in the form of said black pattern, and subjecting the resin pattern to an electroless plating process to precipitate said metal particles in said black pattern.

2. The black matrix substrate of claim 1, wherein said metal particles comprise at least one metal selected from the group consisting of Ni, Co, Fe, Cr, Cu, Pd, Au, Pt, Sn and Zn.

3. The black matrix substrate of claim 1, wherein the resin pattern comprises a catalytic component for the electroless plating process.

4. The black matrix substrate of claim 1, wherein the resin pattern includes a catalytic component for the electroless plating process, and said metal particles are precipitated in said black pattern via a reducing agent which reduces said catalytic component in the resin pattern and metal ions in the electroless plating solution used in the electroless plating process.

5. The black matrix substrate of claim 4, wherein said reducing agent comprises one of a boron compound and a phosphoric compound.

6. The black matrix substrate of claim 1, wherein the resin pattern comprises polyvinyl alcohol, the X-ray scattering intensity value of which is 200 to 580 cps/μ

m before formation of the black pattern.

7. The black matrix substrate of claim 1, wherein a reflection coefficient of the black matrix substrate is less than 30% on both the substrate side and the black pattern surface side.

8. The black matrix substrate of claim 1, wherein said hydrophilic resin is a hydrophilic polyvinyl alcohol resin having a saponification value of 86 to 99.

9. The black matrix substrate of claim 1, wherein said hydrophilic resin is a hydrophilic polyvinyl alcohol resin having an average degree of polymerization of 500 to 1700.

10. The black matrix substrate of claim 1, wherein said hydrophilic resin is a hydrophilic polyvinyl alcohol resin having a saponification value of 86 to 99 and an average degree of polymerization of 500 to 1700.