Novolak containing photoresist stripper composition

• US 5,507,978 A
• Filed: 05/08/1995
• Issued: 04/16/1996
• Est. Priority Date: 05/08/1995
• Status: Expired due to Fees

• Current Assignee: OLIN Microelectronic Chemicals Incorporated
• Original Assignee: OCG Microelectronic Materials Incorporated
• Inventors: Honda, Kenji
• Primary Examiner(s): Therkorn, Linda Skaling
• Assistant Examiner(s): Delcotto, Gregory R.
• Application Number:
  US08/436,549
• Time in Patent Office: 344 Days
• Field of Search: 252/153, 252/162, 252/171, 252/544, 252/DIG. 8, 252/174.23, 134/38, 134/2, 430/260, 430/329, 430/331
• US Class Current: 510/176
• CPC Class Codes: G03F 7/425 containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Abstract

A noncorrosive photoresist composition containing:

(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;

(b) 70-20% by weight of selected amine compounds;

(c) about 0.01% to about 1% by weight of novolak resin having a weight-average molecular weight (M_w) from about 200 to about 5,000;

(d) optionally 0-10% by weight of selected amino acid having a hydroxyl group; and

(e) optionally 0-10% by weight of water.

Claims

1. A resist stripper composition comprising:

(a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5;

(b) from about 70 to about 20% by weight of an amine compound selected from the group consisting of compounds having the formula (I);

##STR5## wherein n and m are each independently an integer ranging from 0-5, inclusive;

X is hydrogen, alkyl, or alkoxy group;

Y is either --O-- or --NH--; and

Z is hydrogen, --OH, or --NH₂ ;

(c) about 0.01% to about 1% by weight of novolak resin having a weight average molecular weight (M_w) from about 200 to about 5,000;

(d) optionally from about 0 to about 10% by weight of an amino acid selected from the group consisting of compounds having the formula (II);

##STR6## wherein n is an integer ranging from 1-3;

R¹ and R² are each independently selected from the group consisting of hydrogen and compounds having the formula ##STR7## wherein R⁵, R⁶, and R⁷ are each independently selected from hydrogen, --OH, --CH₂ OH, alkyl, alkoxy, phenyl, and mono-, di- or tri-hydroxy-substituted phenyl groups; and

R³ and R⁴ are each independently selected from the group consisting of hydroxy and compounds having the formula (IV);

##STR8## wherein X'"'"', Y'"'"', and Z'"'"' are each independently selected from hydrogen, --OH, --CH₂ OH, --CH₂ CH₂ OH, --CH₂ COOH, alkyl, or alkoxy group, and at least one of them is --OH, --CH₂ CH₂ OH, or --CH₂ OH; and

(e) optionally from about 0 to about 10% by weight of water.

2. The stripper composition of claim 1 wherein said solvent (a) is a cyclic amide.

3. The stripper composition of claim 2 wherein said cyclic amide is selected from the group consisting of N-alkyl-2-pyrrolidone, N-hydroxyalkyl-2-pyrrolidone, and 1,3-dialkyl-2-imidazolidinone.

4. The stripper composition of claim 1 wherein said amine (b) is an alkanolamine.

5. The stripper composition of claim 4 wherein said alkanolamine is selected from the group consisting of monoethanolamine, 2-(2-aminoethoxy)ethanol, 2-(2-aminoethylamino)ethanol, diethanolamine, and triethanolamine.

6. The stripper composition of claim 1 wherein said novolak resin is an addition-condensation products of a monomeric phenolic compound selected from the group consisting of phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,5-xylenol, 3,5-xylenol, 2,3,5-trimethylphenol, and admixtures thereof with an aldehyde source selected from the group consisting of formaldehyde, paraformaldehyde, benzeldehyde, acetaldehyde, and admixtures thereof.

7. The stripper composition of claim 6 wherein said novolak resin is present in an amount of 0.03-0.7% by weight in said stripper composition.

8. The stripper composition of claim 1 wherein said amino acid is selected from the group consisting of:

tricine, bicine, DL-homoserine, D-homoserine, L-homoserine, DL-threonine, D-allo-threonine, L-allothreonine, D-threonine, L-threonine, DL-3-hydroxynorvaline, DL-metathroxine, DL-tyrosine, D-tyrosine, L-tyrosine, 3-(3,4-dihydroxyphenyl)-DL-alanine, 3-(3,4-dihydroxyphenyl)-L-amine, 3-(2,4,5-trihydroxyphenyl)-DL-alanine, DL-alpha-methyltyrosine, L-alphamethytyrosine, (-)-3-(3,4-dihydroxyphenyl)-2-methyl-L-alanine DL-threo-3-phenylserine, and DL-threo-3,4-dihydroxyphenylserine.

9. The stripper composition of claim 8 wherein said amino acid is selected from the group consisting of tricine, bicine, 3-(2,4,5-trihydroxyphenyl)-DL-alanine, and DL-threo-3,4-dihydroxyphenylserine.