Ion beam process for deposition of highly abrasion-resistant coatings

• US 5,508,368 A
• Filed: 03/03/1994
• Issued: 04/16/1996
• Est. Priority Date: 03/03/1994
• Status: Expired

• Current Assignee: Morgan Chemical Products, Inc.
• Original Assignee: Diamonex, Inc. (Morgan Advanced Materials PLC)
• Inventors: Galvin, Norman D., Kimock, Fred M., Petrmichl, Rudolph H., Knapp, Bradley J.
• Primary Examiner(s): PADGETT, MARIANNE L
• Application Number:
  US08/205,898
• Time in Patent Office: 775 Days
• Field of Search: 427/524, 427/525, 427/527, 427/529, 427/530, 427/562, 427/563, 427/574, 427/579, 427/577, 427/534
• US Class Current: 427/534
• CPC Class Codes: C23C 16/0245 by etching with a plasma
• CPC Class Codes: C23C 16/30 Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
• CPC Class Codes: C23C 16/308 Oxynitrides
• CPC Class Codes: C23C 16/325 Silicon carbide
• CPC Class Codes: C23C 16/345 Silicon nitride
• CPC Class Codes: C23C 16/513 using plasma jets

Abstract

An ion beam deposition method is provided for manufacturing a coated substrate with improved abrasion resistance, and improved lifetime. According to the method, the substrate is first chemically cleaned to remove contaminants. In the second step, the substrate is inserted into a vacuum chamber, and the air in said chamber is evacuated. In the third step, the substrate surface is bombarded with energetic ions to assist in the removal of residual hydrocarbons and surface oxides, and to activate the surface. Alter the substrate surface has been sputter-etched, a protective, abrasion-resistant coating is deposited by ion beam deposition. The ion beam-deposited coating may contain one or more layers. Once the chosen thickness of the coating has been achieved, the deposition process on the substrates is terminated, the vacuum chamber pressure is increased to atmospheric pressure, and the coated substrate products having improved abrasion-resistance are removed from the vacuum chamber. The coated products of this invention have utility as plastic sunglass lenses, ophthalmic lenses, bar codes scanner windows, and industrial wear parts that must be protected from scratches and abrasion.

Claims

1. A method for producing an optically transparent coating on the surface of a substrate comprising:

(a) chemically cleaning the surface of said substrate to remove residual hydrocarbons and other contaminants;

(b) mounting said substrate in a deposition vacuum chamber and evacuating the air from said chamber,

(c) sputter-etching the surface of said substrate with a beam of ions to further remove residual hydrocarbons and other surface contaminants, and to activate the surface;

(d) plasma ion beam depositing using precursor gases at least one layer of a material selected from the group consisting of an amorphous silicon carbide, silicon nitride, silicon oxide, silicon oxy nitride, silicon oxy carbide, silicon carbonitride, and silicon oxy-carbonitride and using a gridless ion source having a plasma chamber therein, wherein a plasma is generated in the plasma chamber and a gas stream containing at least a portion of said precursor gases is introduced outside of the ion source and into the plasma ion beam;

(e) increasing the vacuum chamber pressure to atmospheric pressure; and

(f) recovering a coated substrate product with an abrasion resistance greater than or about equal to the abrasion resistance of glass lenses.

2. The method of claim 1 wherein said gridless ion source is selected from the group consisting of an End Hall ion source and a Hall accelerator ion source.

3. The method of claim 1 wherein said substrate comprises a material selected from the group consisting of a plastic, a metal, a glass and a ceramic.

4. The method of claim 2 wherein said substrate comprises a material selected from the group consisting of a plastic, a metal, a glass and a ceramic.

5. The method of claim 1 wherein said substrate is an optically transparent material.

6. The method of claim 2 wherein said substrate is an optically transparent material.

7. The method of claim 1 wherein said substrate is an optically transparent lens.

8. The method of claim 2 wherein said substrate is an optically transparent lens.

9. The method of claim 5 wherein said substrate is a bar code scanner window.

10. The method of claim 6 wherein said substrate is a bar code scanner window.

11. The method of claim 1 wherein said substrate material is silicon or germanium.

12. The method of claim 1 wherein said abrasion-resistant coating includes multiple layers of at least two different refractive indices to reduce reflection.

13. The method of claim 1 wherein said abrasion-resistant coating includes multiple layers of at least two different refractive indices to reduce reflection.

14. The method of claim 7 wherein said abrasion-resistant coating includes multiple layers of at least two different refractive indices to reduce reflection.

15. The method of claim 8 wherein said abrasion-resistant coating includes multiple layers of at least two different refractive indices to reduce reflection.

16. A method for depositing onto a parent substrate an optically transparent coating material consisting of C, H, Si and O which comprises:

(a) chemically cleaning the surface of said substrate to remove residual hydrocarbons and other contaminants;

(b) mounting said substrate in a deposition vacuum chamber and evacuating the air from said chamber;

(c) sputter-etching the surface of said substrate with a beam of ions to further remove residual hydrocarbons and other surface contaminants, and to activate the surface;

(d) plasma ion beam depositing onto the surface of said substrate a layer of said optically transparent coating material by exposing said substrate to precursor bases containing carbon, hydrogen, silicon and oxygen, whereby said precursor gases are activated by said plasma ion beam and said substrate is bombarded by ions during the deposition, using a gridless ion source having a plasma chamber therein, wherein a plasma is generated in the plasma chamber and a gas stream containing at least a portion of said precursor gases is introduced outside of the ion source and into the plasma ion beam;

(e) increasing the vacuum chamber pressure to atmospheric pressure; and

(f) recovering a product having an abrasion resistance greater than or about equal to the abrasion resistance of glass lenses and coated with said optically transparent coating material having the properties of a Nanoindentation hardness in the range of about 2 to about 5 Giga Pascals and a tensile strain required to produce microcracking in said material of greater than about 1%,.

17. The method of claim 16 wherein said precursor gases also contain nitrogen and said optically transparent coating material also contains nitrogen and has an abrasion resistance greater than or about equal to the abrasion resistance of glass lenses.

18. The method of claim 16 wherein a portion of said precursor gases are introduced into the plasma chamber or the ion source, and the remaining portion of said precursor gases are introduced outside of the ion source plasma chamber and into the ion beam.

19. The method of claim 16 wherein said precursor gases contain oxygen.

20. The method of claim 16 wherein said precursor gases comprise materials selected from the group consisting of siloxanes, silanes, silazanes, and mixtures thereof.

21. The method of claim 16 wherein said precursor gases comprise materials selected from the group consisting of hexamethyldisiloxane, tetramethylcyclotetrasiloxane, octamethylcyclotetrasiloxane and mixtures thereof.

22. A method for depositing onto a parent substrate an optically transparent coating material consisting of C, H, Si and O which comprise:

(a) chemically cleaning the surface of said substrate to remove residual hydrocarbons and other contaminants;

(b) mounting said substrate in a deposition vacuum chamber and evacuating the air from said chamber;

(c) sputter-etching the surface of said substrate with a beam of ions to further remove residual hydrocarbons and other surface contaminants, and to activate the surface;

(d) plasma ion beam depositing onto the surface of said substrate an interlayer of said optically transparent coating material having the properties of a Nanoindentation hardness in the range of about 2 to about 5 Giga Pascals and a tensile strain required to produce microcracking in said material of greater than about 1% by exposing said substrate to precursor gases containing carbon, hydrogen, silicon and oxygen, whereby said precursor gases are activated by said plasma ion beam and said substrate is bombarded by ions during the deposition, using a gridless ion source having a plasma chamber therein, wherein a plasma is generated in the plasma chamber and a gas stream containing at least a portion of said precursor gases is introduced outside of the ion source and into the plasma ion beam;

(e) depositing onto said interlayer a layer of abrasion-resistance diamond-like carbon coating material;

(f) increasing the vacuum chamber pressure to atmospheric pressure; and

(g) recovering a coated substrate product having an abrasion resistance greater than or about equal to the abrasion resistance of glass lenses.

23. The method of claim 22 wherein said precursor gases also contain nitrogen and said optically transparent coating material also contains nitrogen.

24. The method of claim 22 wherein a portion of said precursor gases are introduced into the plasma chamber of the ion source, and the remaining portion of said precursor gases are introduced outside of the ion source plasma chamber and into the ion beam.

25. The method of claim 22 wherein said substrate comprises a material selected from the group consisting of a plastic, a metal, a glass and a ceramic.

26. The method of claim 22 wherein said precursor gases for said interlayer comprise materials selected from the group consisting of siloxanes, silanes, silazanes, and mixtures thereof.

27. The method of claim 22 wherein said precursor gases for said interlayer comprise materials selected from the group consisting of hexamethyldisiloxane, tetramethylcyclotetrasiloxane, octamethylcyclotetrasiloxane and mixtures thereof.

28. A method for producing an optically transparent coating on the surface of a substrate comprising:

(a) chemically cleaning the surface of said substrate to remove residual hydrocarbons and other contaminants;

(b) mounting said substrate in a deposition vacuum chamber and evacuating the air from said chamber,

(c) sputter-etching the surface of said substrate with a beam of gas ions to further remove residual hydrocarbons and other surface contaminants, and to activate the surface;

(d) plasma ion beam depositing using a precursor gas a layer of coating material using an ion beam generated in a gridless ion source having a hollow cathode electron source wherein oxygen is introduced into a plasma chamber of said plasma ion source and octamethylcyclotetrasiloxane is injected outside the ion source and directly into the plasma ion beam;

(e) increasing the vacuum chamber pressure to atmospheric pressure; and

(f) recovering a coated substrate product with an abrasion resistance greater than or about equal to the abrasion resistance of glass lenses.