Process for preparation of stabilized oxide thin layers
First Claim
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1. A process for preparing a stabilized layer-coated substrate, which comprises:
- a) depositing a metallic oxide surface layer onto a surface of a substrate by vacuum deposition; and
b) irradiating said metallic oxide surface layer with infrared radiation, wherein said irradiation is effected using a wavelength and for a duration sufficient to impart an intensity of 1 kW/m2 to 90 kW/m2 thereto, and wherein said substrate is maintained at a temperature which does not exceed about 100°
C.
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Abstract
A method for improving the quality of a system of layers deposited on a substrate such as glass is provided, in which, the system of layers have an oxide-based surface layer, in particular n-type semi-conductor oxides such as SnOx, in which the surface layer is subjected to IR irradiation to provide a stabilization of the layer equivalent to or better than with a 48-hour exposure to the air.
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Citations
10 Claims
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1. A process for preparing a stabilized layer-coated substrate, which comprises:
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a) depositing a metallic oxide surface layer onto a surface of a substrate by vacuum deposition; and b) irradiating said metallic oxide surface layer with infrared radiation, wherein said irradiation is effected using a wavelength and for a duration sufficient to impart an intensity of 1 kW/m2 to 90 kW/m2 thereto, and wherein said substrate is maintained at a temperature which does not exceed about 100°
C. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification