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Block copolymer, method of making the same, diamine precursors of the same, method of making such diamines and end products comprising the block copolymer

  • US 5,512,650 A
  • Filed: 07/21/1993
  • Issued: 04/30/1996
  • Est. Priority Date: 06/20/1986
  • Status: Expired due to Term
First Claim
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1. A method of making an organopolysiloxane diamine having a number average molecular weight greater than 2000 and having less than or equal to about 0.010 weight % silanol impurities, comprising the steps of:

  • (a) forming a mixture consisting essentially of(i) an amine functional endblocker represented by the formula IX ##STR11## wherein;

    Y is selected from the group consisting of alkylene radicals comprising about 1 to about 10 carbon atoms, aralkyl radicals, and aryl radicals;

    D is selected from the group consisting of hydrogen, an alkyl radical of about 1 to about 10 carbon atoms, and phenyl;

    R is at least 50% methyl with a balance of the 100% of all R radicals being selected from the group consisting of a monovalent alkyl radical having 2 to 12 carbon atoms, substituted alkyl radical having from 1 to 12 carbon atoms, a vinyl radical, a phenyl radical, and a substituted phenyl radical; and

    x represents an integer of about 1 to about 150; and

    (ii) sufficient cyclic siloxane to obtain said organopolysiloxane diamine having a number average molecular weight greater than about 2000;

    (b) removing any volatile contaminants from the mixture;

    (c) heating the mixture to about 100°

    to about 160°

    C. under an inert atmosphere;

    (d) adding a catalytic amount of a compound selected from the group consisting of cesium hydroxide, rubidium hydroxide, cesium silanolates, rubidium silanolates, cesium polysiloxanolates, rubidium polysiloxanolates, and mixtures thereof, to the mixture which has been heated;

    (e) continuing the reaction until substantially all of said amine functional endblocker is consumed;

    (f) terminating the reaction by the addition of a volatile organic acid to form a mixture of an organopolysiloxane diamine having greater than about 0.010 weight % silanol impurities and one or more of the following;

    a cesium salt of the organic acid, a rubidium salt of the organic acid, both a cesium salt of the organic acid and a rubidium salt of the organic acid;

    wherein a molar excess of organic acid is added in relation to the compound of element (d);

    (g) condensing under reaction conditions a sufficient amount of said silanol impurities to form an organopolysiloxane diamine having less than or equal to about 0.010 weight % of silanol impurities; and

    (h) optionally removing said salt.

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