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Contactless real-time in-situ monitoring of a chemical etching

  • US 5,516,399 A
  • Filed: 06/30/1994
  • Issued: 05/14/1996
  • Est. Priority Date: 06/30/1994
  • Status: Expired due to Term
First Claim
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1. A contactless method for real-time in-situ monitoring of a chemical etching process during etching of at least one wafer in a wet chemical etchant bath, said method comprising the steps of:

  • a) providing two conductive electrodes in the wet chemical bath, wherein said two electrodes are proximate to but not in contact with the at least one wafer, and further wherein said two electrodes are positioned on the same side of the wafer; and

    b) monitoring an electrical characteristic between the two electrodes, wherein a change in the electrical characteristic is indicative of a state of the etching process.

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