Optical waveguide

• US 5,519,803 A
• Filed: 09/09/1994
• Issued: 05/21/1996
• Est. Priority Date: 09/22/1993
• Status: Expired due to Fees

• Current Assignee: Shin-Etsu Chemical Company Limited
• Original Assignee: Shin-Etsu Chemical Company Limited
• Inventors: Tanno, Masayuki, Kozakai, Shohei, Shiono, Yoshiyuki, Ryuo, Toshihiko
• Primary Examiner(s): Bovernick, Rodney B.
• Assistant Examiner(s): Wise, Robert E.
• Application Number:
  US08/302,182
• Time in Patent Office: 620 Days
• Field of Search: 385/14, 385/129, 385/130, 385/132
• US Class Current: 385/132
• CPC Class Codes: G02B 6/132 by deposition of thin films

Abstract

Proposed is an improved optical waveguide consisting of a substrate plate such as a silicon wafer, an undercladding layer of silica glass thereon, a core line of silica glass extending on the undercladding layer and having a larger refractive index than the undercladding layer and an overcladding layer of silica glass having a smaller refractive index than the core line to cover the undercladding layer and the core line thereon altogether. Different from conventional optical waveguides of this type, of which each of the undercladding layer, core line and overcladding layer is formed by the flame deposition method of silica or electron-beam vapor deposition method followed by vitrification taking a relatively long time, the overcladding layer in the inventive optical waveguide is formed by forming a layer of an organopolysiloxane resin on the undercladding layer and core line followed by the oxidative thermal decomposition of the resin into silica and vitrification of the same. Alternatively, an optical waveguide, which is conventional as mentioned above but of which the thickness of the overcladding layer is greatly decreased, is provided with a top coating layer from the organopolysiloxane resin as above. The inventive optical waveguides can be manufactured with greatly increased productivity.

Claims

1. An optical waveguide precursor which is an integral body comprising:

a1) a substrate plate;

b1) a transparent undercladding layer of silica glass formed on the surface of the substrate plate;

c1) a transparent elongated core line of silica glass having a square or rectangular cross section formed on the undercladding layer by the deposition of silica from the vapor phase to form a porous layer, vitrification of the porous layer and patterning of the vitrified layer into an elongated line; and

d1) a silica glass overcladding layer precursor comprising a coating of an organopolysiloxane resin on the core line and undercladding layer, the resin being capable of forming a transparent overcladding layer of silica glass having a refractive index less than the refractive index of the core line upon being subjected to an oxidizing atmosphere followed by vitrification;

the refractive index of the core line being larger than the refractive index of the undercladding layer.

2. The optical waveguide as claimed in claim 1 in which the undercladding layer of silica glass has a thickness in the range from 10 to 1000 μ

m.

3. The optical waveguide as claimed in claim 1 in which the cross section of the core line of silica glass has a width and height each in the range from 4 to 10 μ

m.

4. The optical waveguide of claim 1 in which the resin coating is capable of forming an overcladding layer of silica glass having a thickness in the range from 3 to 300 μ

m.

5. An optical waveguide precursor which is an integral body comprising:

a2) a substrate plate;

b2) a transparent undercladding layer of silica glass formed on the surface of the substrate plate;

c2) a transparent elongated core line of silica glass having a square or rectangular cross section formed on the undercladding layer by the deposition of silica from the vapor phase to form a porous layer, vitrification of the porous layer and patterning of the vitrified layer into an elongated line; and

d2) a transparent overcladding layer of silica glass formed on the surface of the core line and the undercladding layer altogether by the deposition of silica from the vapor phase to form a porous layer and vitrification of the porous layer; and

e2) a transparent top coating silica glass layer precursor comprising a coating of an organopolysiloxane resin on the core line and undercladding layer, the resin being capable of forming a transparent overcladding layer of silica glass having a refractive index less than the refractive index of the core line upon being subjected to an oxidizing atmosphere followed by vitrification;

the refractive index of the core line being larger than the refractive index of the undercladding layer.

6. The optical waveguide as claimed in claim 5 in which the undercladding layer of silica glass has a thickness in the range from 10 to 1000 μ

m.

7. The optical waveguide as claimed in claim 5 in which the cross section of the core line of silica glass has a width and height each in the range from 4 to 10 μ

m.

8. The optical waveguide as claimed in claim 5 in which the overcladding layer of silica glass has a thickness in the range from 3 to 10 μ

m.

9. The optical waveguide of claim 5 in which the resin coating is capable of forming an overcladding layer of silica glass having a thickness in the range from 3 to 300 μ

m.

10. The optical waveguide of claim 5 in which the organopolysiloxane resin is capable of forming a silica glass top coating layer having a refractive index not larger than the refractive index of the overcladding layer.

11. A method for preparing an optical waveguide which is an integral body comprising forming a transparent undercladding layer of silica glass on the surface of a substrate plate, forming a transparent elongated core line of silica glass having a square or rectangular cross section on the undercladding layer by depositing silica from the vapor phase to form a porous layer, vitrifying the porous layer and patterning the vitrified layer into an elongated line;

and coating the core line and undercladding layer altogether with an organopolysiloxane resin, heating the resin coating in an oxidizing atmosphere to form a layer of silica and vitrifying the layer of silica to form a transparent overcladding layer of silica glass, wherein the refractive index of the core line is greater than the refractive index of the undercladding layer and the overcladding layer.

12. The method of claim 11 wherein the undercladding layer of silica glass has a thickness in the range from 10 to 1000 μ

m.

13. The method of claim 11 wherein the cross section of the core line of silica glass has a width and height each in the range from 4 to 10 μ

m.

14. A method for making an optical waveguide which is an integral body comprising forming a transparent undercladding layer of silica glass on the surface of a substrate plate, forming a transparent elongated core line of silica glass having a square or rectangular cross section on the undercladding layer by depositing silica from the vapor phase to form a porous layer, vitrifying the porous layer and patterning the vitrified layer into an elongated line;

forming a transparent overcladding layer of silica glass on the surface of the core line and the undercladding layer by depositing silica thereon from the vapor phase to form a porous layer and vitrifying the porous layer; and

forming a transparent top coating layer of silica glass by coating the overcladding layer with an organopolysiloxane resin, heating the organopolysiloxane resin in an oxidizing atmosphere to form a layer of silica and vitrifying the silica layer, wherein the refractive index of the core line is larger than the refractive index of the undercladding layer and the overcladding layer.

15. The method of claim 14 wherein the undercladding layer of silica glass has a thickness in the range from 10 to 1000 μ

m.

16. The method of claim 14 wherein the cross section of the core line of silica glass has a width and height each in the range from 4 to 10 μ

m.

17. The method of claim 14 wherein the overcladding layer of silica glass has a thickness in the range from 3 to 10 μ

m.

18. The method of claim 14 wherein the top coating layer of silica glass has thickness in the range from 3 to 300 μ

m.

19. The method of claim 14 in which the organopolysiloxane resin is capable of forming a silica glass top coating layer having a refractive index not larger than the refractive index of the overcladding layer.