Strain sensing device

• US 5,520,051 A
• Filed: 05/25/1994
• Issued: 05/28/1996
• Est. Priority Date: 09/27/1989
• Status: Expired due to Term

• Current Assignee: Nippondenso Co., Ltd. (DENSO Corporation)
• Original Assignee: Nippondenso Co., Ltd. (DENSO Corporation)
• Inventors: Gotoh, Yoshitaka, Fujii, Tetsuo, Kuroyanagi, Susumu
• Primary Examiner(s): CHAPMAN JR, JOHN E
• Application Number:
  US08/249,082
• Time in Patent Office: 734 Days
• Field of Search: 73/517 R, 73/514, 73/862.65, 73/862.382, 73/862.627, 73/862.632, 73/862.634, 338/2, 338/5
• US Class Current: 73/514.36
• CPC Class Codes: G01L 15/00 Devices or apparatus for measuring two or more fluid pressure values simultaneously
• CPC Class Codes: G01L 9/0042 Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms details about the integration or bonding of piezoresistor in or on the diaphragm G01L9/0052 and G01L9/0057 respectively
• CPC Class Codes: G01P 15/0802 Details
• CPC Class Codes: G01P 15/123 by piezo-resistive elements, e.g. semiconductor strain gauges

Abstract

Device including a strain generating portion supported at least at one end on a substrate and formed in a displaceable manner with respect to the substrate in a cavity of the substrate. A semiconductor strain sensing element, which is disposed at the strain generating portion, detects the amount of strain of the strain generating portion. A support is disposed at a connection point between the strain generating portion and the substrate so as to reinforce the connection point.

Claims

1. A strain sensing device comprising:

a substrate consisting essentially of one substance, said substrate having a depression defined in a main surface thereof, said substrate including side walls and a bottom wall defining said depression;

a weight filling in almost all of said depression, said weight having side walls and a bottom wall and being set inside said depression so that substantially an entire area of each of said side walls of said weight and substantially an entire area of said bottom wall of said weight are substantially parallel with said side walls and bottom wall of said substrate defining said depression, respectively, so that contact between said substantially entire area of side walls of said weight and said side walls of said substrate defining said depression limits lateral movement of said weight, and so that contact between said substantially entire area bottom wall of said weight and said bottom wall of said substrate defining said depression limits downward movement of said weight, said weight also having a connecting portion on an upper surface thereof;

a beam extending from said substrate for supporting said weight in said depression and being connected to said weight at said connecting portion of said weight;

a strain sensing element for detecting an amount of displacement of said weight and provided on said beam; and

an upper stopper member provided on an upper surface of said substrate for limiting upward movement of said weight, wherein a lower surface of said upper stopper member facing said depression and a lower surface of said beam facing said depression are fabricated concurrently with one another and made from a same material, and

wherein a cavity is defined between said upper surface of said weight and a portion of a length of said beam extending from a contacting point formed between said beam and said substrate and said connecting portion of said weight, a distance of said beam from said contacting point to said connecting portion of said weight being dependent on a size of said cavity, and wherein a thickness of said connecting portion of said weight is thicker than a thickness of a portion of said weight adjacent said cavity.

2. A strain sensing device according to claim 1, wherein said side walls and said bottom wall of said substrate defining said depression are covered with an insulation film.

3. A strain sensing device according to claim 1, wherein said side walls and said bottom wall defining external surfaces of said weight opposite to said side walls and said bottom wall of said depression formed on said substrate are covered with an insulation film.

4. A strain sensing device according to claim 2, wherein said side walls and said bottom wall defining external surfaces of said weight opposite to said side walls and said bottom wall of said depression formed on said substrate are covered with an insulation film.

5. A strain sensing device according to claim 1, wherein said strain sensing element comprises a piezoresistor element provided on said beam.

6. A strain sensing device according to claim 1, wherein said weight includes a movement limiting portion defined on an upper surface of said weight, a thickness of said movement limiting portion of said weight being thinner than that of said connecting portion of said weight, and wherein said upper stopper member is arranged above said movement limiting portion of said weight, said upper stopper member extending from a peripheral portion of said depression.

7. A strain sensing device according to claim 1, further comprising an additional weight located in an area on an upper surface of said weight, except for an area opposing a lower surface of said beam.

8. A strain sensing device according to claim 1, wherein said beam is supported by both ends on said substrate and said weight is connected to a central portion of said beam.

9. A strain sensing device according to claim 6, wherein said beam is supported by both ends on said substrate and said weight is connected to a central portion of said beam.

10. A strain sensing device according to claim 7, wherein said beam is supported by both ends on said substrate and said weight is connected to a central portion of said beam.

11. A strain sensing device according to claim 8, wherein at least two beams intersect with each other at a substantially right angle to form a four-directional support arrangement.

12. A strain sensing device according to claim 9, wherein at least two beams intersect with each other at a substantially right angle to form a four-directional support arrangement.

14. A strain sensing device according to claim 1, wherein said substrate is made of semiconductor material.

13. A strain sensing device according to clam 10, wherein at least two beams intersect with each other at a substantially right angle to form a four-directional support arrangement.

15. A strain sensing device comprising:

a substrate consisting essentially of one substance, said substrate having a depression defined in a main surface thereof, said substrate including side walls and a bottom wall defining said depression;

a weight filling in almost all of said depression, said weight having side walls and a bottom wall and being set inside said depression so that said side walls and said bottom wall thereof are substantially parallel with said side walls and bottom wall of said substrate defining said depression respectively, said weight also having a connecting portion on an upper surface thereof;

a beam extending from said substrate for supporting said weight in said depression and being connected to said weight at said connecting portion of said weight;

a strain sensing element for detecting an amount of displacement of said weight and provided on said beam;

a protrusion extending from said substrate, said protrusion being located inside said depression at a substantially central portion thereof, said weight being arranged so as to surround said protrusion, said beam supporting said weight at both end portions of said beam and a center portion of said beam being fixed to said protrusion,

wherein a cavity is defined between said upper surface of said weight and a portion of a length of said beam extending from a contacting point formed between said beam and said substrate and said connecting portion of said weight, a distance of said beam from said contacting point to said connecting portion of said weight being dependent on a size of said cavity, and wherein a thickness of said connecting portion of said weight is thicker than a thickness of a portion of said weight adjacent said cavity.

16. A strain sensing device according to claim 15, further comprising a wiring having a takeout portion that extends laterally over said weight to thereby define a bridge between said protrusion and a peripheral portion of said depression.

17. A strain sensing device according to claim 16, wherein said weight includes a movement limiting portion defined on an upper surface of said weight, a thickness of said movement limiting portion of said weight being thinner than that of said connecting portion of said weight, said strain sensing device further comprising an upper stopper means arranged above said movement limiting portion of said weight, said upper stopper means extending from a peripheral portion of said depression, wherein a lower surface of said stopper means corresponds to a surface in which a lower surface of said beam is formed.

18. A strain sensing device according to claim 17, wherein a distance between a lower surface of said takeout portion of said wiring and an upper surface of said weight opposing said lower surface of said takeout portion of said wiring is identical to a distance between a lower surface of said upper stopper means and a surface of said movement limiting portion of said weight so that said takeout portion of said wiring serves as another upper stopper means.

19. A strain sensing device according to claim 16, wherein an upper surface of said weight opposing said takeout portion of a wiring is covered with an insulating film.

20. A strain sensing device comprising:

a substrate consisting essentially of one substance, said substrate having a ring-shaped depression formed at a main surface thereof, said ring-shaped depression being defined by walls of said substrate;

a ring-shaped weight almost completely filling in said depression;

a beam supporting said weight inside said depression, said beam being fixed to a protrusion located inside said depression formed in said substrate, wherein a cavity is defined between an upper surface of said weight and a lower surface of said beam and

a semiconductor strain sensing element disposed on said beam and which detects an amount of strain of said beam by displacement of said ring-shaped weight.

21. A strain sensing device according to claim 20, wherein said substrate is made of a semiconductor substance.

22. A strain sensing device according to claim 21, wherein at least one of said walls of said substrate defining said depression are covered with an insulation film.

23. A strain sensing device according to claim 22, wherein at least one external surface of said weight opposing said walls of said substrate defining said depression are covered with an insulation film.

24. A strain sensing device according to claim 20, wherein a takeout portion of a wiring is provided so as to laterally extend over said weight to thereby define a bridge between said protrusion and a peripheral portion of said depression.

25. A strain sensing device according to claim 24, wherein said weight includes a movement limiting portion defined on an upper surface of said weight, a thickness of said movement limiting portion of said weight being thinner than that of a connecting portion of said weight at which said weight is connected to said beam, said strain sensing device further comprising an upper stopper means arranged above said movement limiting portion of said weight, said upper stopper means extending from a peripheral portion of said depression, and wherein a lower surface of said upper stopping means corresponds to a surface in which a lower surface of said beam is formed.

26. A strain sensing device according to claim 23, further comprising a wiring including a takeout portion extending laterally over said weight to thereby define a bridge between said protrusion and a peripheral portion of said depression.

27. A strain sensing device according to claim 26, wherein an upper surface of said weight opposing said takeout portion of a wiring is covered with an insulating film.