Microwave energized ion source for ion implantation

• US 5,523,652 A
• Filed: 09/26/1994
• Issued: 06/04/1996
• Est. Priority Date: 09/26/1994
• Status: Expired due to Term

• Current Assignee: Axcelis Technologies Incorporated
• Original Assignee: Eaton Corp. (Wisconsin) (Eaton Corporation PLC.)
• Inventors: Trueira, Frank R., Sferlazzo, Piero, Rose, Peter H.
• Primary Examiner(s): Pascal, Robert
• Assistant Examiner(s): VU, DAVID HUNG
• Application Number:
  US08/312,142
• Time in Patent Office: 617 Days
• Field of Search: 315/111.81, 315/39, 315/111.41, 250/427, 250/425, 250/492.2, 250/423 R, 313/360.1, 313/363.1
• US Class Current: 315/111.41
• CPC Class Codes: H01J 2237/0817 Microwaves
• CPC Class Codes: H01J 2237/31701 Ion implantation
• CPC Class Codes: H01J 27/18 with an applied axial magnetic field

Abstract

A microwave energized ion source apparatus is supported by a support tube extending into a cavity defined by a housing assembly and includes a dielectric plasma chamber, a pair of vaporizers, a microwave tuning and transmission assembly and a magnetic field generating assembly. The chamber defines an interior region into which source material and ionizable gas are routed. The chamber is overlied by a cap having an arc slit through which generated ions exit the chamber. The microwave tuning and transmission assembly, which feeds microwave energy to the chamber in the TEM mode, includes a coaxial microwave energy transmission line center conductor. One end of the conductor fits into a recessed portion of the chamber and transmits microwave energy to the chamber. The center conductor extends through an evacuated portion of a coaxial tube surrounding the conductor. A vacuum seal is disposed in or adjacent the coaxial tube and from the boundary between the evacuated coaxial tube and a non-evacuated region. The arc slit cap is secured to a chamber housing surrounding the chamber and is adapted to interfit with a clamping assembly secured to an end of the support tube such that the arc slit is aligned with a predetermined ion beam line. The energy transmission center conductor is coupled to a tuning center conductor which is slideably overlied by a pair of slug tuners. Moving the slug tuners along their paths of travel changes an impedance of the microwave energy input to the chamber.

Claims

1. An ion source apparatus comprising:

a) a plasma chamber defining a chamber interior into which source materials and an ionizing gas are routed, the plasma chamber including an opening and a chamber wall spaced from the opening having an energy-emitting surface for injecting energy into the plasma chamber;

b) a plasma chamber cap adapted to sealingly engage the opening in the plasma chamber, the plasma chamber cap including an elongated arc slit through which ions exit the plasma chamber to define an ion beam;

c) structure for supporting the plasma chamber in an evacuated region; and

d) an energy transmission assembly for accelerating electrons within the plasma chamber to ionize the gas within the plasma chamber, the energy transmission assembly including;

i) an end portion adapted to abut the plasma chamber wall and transmit energy through the wall to the chamber interior,

ii) a transmission for routing microwave or RF energy through a vacuum region to the end portion, and

iii) a seal separated at a distance from the end portion along the transmission to isolate the vacuum region of the transmission from a non-vacuum region.

2. The ion source apparatus of claim 1 wherein the apparatus additionally includes a magnetic field generator for generating a magnetic field within the chamber interior such that the magnetic field is axially aligned with the elongated arc slit.

3. The ion source apparatus of claim 1 wherein the transmission comprises a center conductor disposed within an evacuated coaxial tube.

4. The ion source apparatus of claim 3 comprising a tuner assembly coupled to the transmission, the tuner assembly including at least one slug tuner having an annular collar slideably overlying a portion of an energy-transmitting center conductor for altering the frequency of the microwave or RF energy input to the plasma chamber.

5. The ion source apparatus of claim 1 wherein the apparatus includes at least one vaporizer in fluid communication with the chamber interior, the vaporizer adapted to accept source materials and vaporize the source materials which are routed to the chamber interior.

6. The ion source apparatus of claim 5 including a source housing having a recessed portion dimensioned to support the plasma chamber and having at least one passageway to route vapor from an outlet orifice of the vaporizer through an aperture in a plasma chamber wall.

7. The ion source apparatus of claim 6 wherein the source housing includes a heater for providing heat to the chamber interior.

8. The ion source apparatus of claim 1 wherein the wall of the plasma chamber for injecting energy into the chamber interior comprises a wall segment that has a cylindrical side and generally planar end which defines a cavity into which the end portion extends.

9. The ion source apparatus of claim 1 wherein at least a portion of the chamber interior is coated with an inert material.

10. An ion source apparatus supported by a support tube extending into an evacuated cavity defined by an ion source housing assembly, the apparatus comprising:

a) a microwave or RF energy source disposed outside the ion source housing assembly in a non-evacuated region;

b) a plasma chamber disposed within the evacuated cavity and supported by the support tube, the plasma chamber having an open end and defining an interior region into which source materials and ionizable gas are routed and subjected to the energy transmitted to the chamber from the energy source whereby plasma is formed in the chamber and ions are generated;

c) a cap overlying the open end of the plasma chamber and including an elongated arc slit through which generated ions exit the plasma chamber interior region; and

d) an energy transmission assembly coupled to the energy source and the plasma chamber for transmitting energy from the energy source and through a vacuum region to the plasma chamber, the energy transmission assembly including;

i) an energy transmitting coaxial transmission line center conductor having an end engaging a portion of an outer wall of the plasma chamber,

ii) a coaxial tube overlying the center conductor, at least a portion of the coaxial tube being evacuated to form the vacuum region, and

iii) a vacuum seal spaced at a distance from the center conductor end engaging the plasma chamber outer wall portion and forming a vacuum seal between the evacuated portion of the coaxial tube and the non-evacuated region outside the ion source housing assembly.

11. The ion source apparatus of claim 10 wherein the vacuum seal includes a ceramic ring coupled to the center conductor by a flange.

12. The ion source apparatus of claim 10 wherein the plasma chamber includes a recessed portion in the outer wall which interfits with the center conductor end.

13. The ion source apparatus of claim 10 wherein the ion source apparatus includes locating structure for maintaining an axial alignment of the cap arc slit with a predetermined ion beam path.

14. The ion source apparatus of claim 10 wherein the apparatus additionally includes a heater for heating the plasma chamber interior region to a temperature greater than or equal to 800°

C.

15. The ion source apparatus of claim 10 wherein the apparatus additionally includes a removable magnet holder fitting around said plasma chamber used in combination with a set of two or more permanent magnets oriented to provide a shaped dipole magnetic field configuration within the plasma chamber interior region.

16. The ion source apparatus of claim 15 wherein the magnet holder is adapted to support different sets of magnets having different orientations to provide shaped hexapole and cusp magnetic field configurations in the plasma chamber interior region.

17. The ion source apparatus of claim 10 including at least one heated vaporizer to vaporize the source materials, the at least one heated vaporizer having an outlet in fluid communication with the plasma chamber interior region.

18. The ion source apparatus of claim 17 wherein the at least one heated vaporizer is removable from the ion source apparatus.

19. An ion source apparatus comprising:

a) a plasma chamber defining an interior region and having an energy interface wall, the plasma chamber having an opening through which ions exit from the interior region of the plasma chamber;

b) a coaxial tube configured to maintain a vacuum region within the coaxial tube;

c) an energy conductor disposed within the coaxial tube for transmitting energy through the vacuum region to an end of the energy conductor;

d) a plasma chamber source housing configured for supporting the plasma chamber and for supporting the end of the energy conductor in relation with the energy interface wall such that energy is transmitted from the energy conductor and through the energy interface wall to the plasma chamber; and

e) a vacuum seal separated at a distance from the end of the energy conductor along the energy conductor to isolate the vacuum region of the coaxial tube from a non-vacuum region.

20. The ion source apparatus of claim 19, wherein the energy interface wall of the plasma chamber includes a recessed portion configured for receiving the end of the energy conductor.

21. The ion source apparatus of claim 19, including a magnetic field generator configured with the plasma chamber for generating a magnetic field within the plasma chamber.

22. The ion source apparatus of claim 19, including a cap configured over the opening of the plasma chamber, the cap having a slit through which ions exit from the interior region of the plasma chamber.

23. The ion source apparatus of claim 19, including a heater for heating the interior region of the plasma chamber.

24. The ion source apparatus of claim 19, including a vaporizer configured with the plasma chamber source housing for vaporizing source material to be routed into the interior region of the plasma chamber.

25. The ion source apparatus of claim 19, including a tuner assembly configured with the energy conductor for tuning a frequency of the energy transmitted to the plasma chamber.

26. The ion source apparatus of claim 19, including a microwave energy source coupled to the energy conductor.

27. The ion source apparatus of claim 19, in combination with an ion implantation station.