Parabolic dielectric multilayer reflector
First Claim
1. A reflector having a parabolic reflective surface of rotation, on which a dielectric multilayer coating is deposited so as to reflect only visible light emanating from a light source located at a focal point of said parabolic reflective surface of rotation, said dielectric multilayer coating comprising an alternating structure of silicon dioxide layers and titanium dioxide layers so as to have a spectral transmittance of 20% for said visible light having a wavelength equal to or shorter than approximately 430 nm on a short wavelength side and a spectral transmittance of 50% for said visible light having a wavelength equal to or longer than approximately 830 nm on a longer wavelength side,said alternating structure further comprising an under alternating structure of silicon dioxide layers each of which has a thickness of approximately 80 nm alternating with titanium dioxide layers each of which has a thickness of approximately 50 nm and a top alternating structure, deposited on the top of said under alternating structure, of silicon dioxide layers each of which has a thickness of approximately 110 nm alternating with titanium dioxide layers of a thickness of approximately 70 nm.
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Accused Products
Abstract
A reflector used for a light source material of a liquid crystal video projector provides a good projection image and causes no color shading to occur in the periphery of a screen. The reflector has a surface on which a dielectric multifilm coating is deposited. The reflector reflects only visible light beams and has a wavelength λ1, which has a spectral transmittance on a short wave side (with normal incidence) of 20% and is equal to or smaller than 440 nm and, at the same time, has a wavelength λ2, which has a spectral transmittance on a long wave side (with normal incidence) of 50% and is equal to or greater than 820 nm.
6 Citations
4 Claims
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1. A reflector having a parabolic reflective surface of rotation, on which a dielectric multilayer coating is deposited so as to reflect only visible light emanating from a light source located at a focal point of said parabolic reflective surface of rotation, said dielectric multilayer coating comprising an alternating structure of silicon dioxide layers and titanium dioxide layers so as to have a spectral transmittance of 20% for said visible light having a wavelength equal to or shorter than approximately 430 nm on a short wavelength side and a spectral transmittance of 50% for said visible light having a wavelength equal to or longer than approximately 830 nm on a longer wavelength side,
said alternating structure further comprising an under alternating structure of silicon dioxide layers each of which has a thickness of approximately 80 nm alternating with titanium dioxide layers each of which has a thickness of approximately 50 nm and a top alternating structure, deposited on the top of said under alternating structure, of silicon dioxide layers each of which has a thickness of approximately 110 nm alternating with titanium dioxide layers of a thickness of approximately 70 nm.
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3. An optical device comprising:
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a light source for generating visible light; a reflector having a parabolic reflective surface of rotation on which is deposited a dielectric multilayer coating for reflecting visible light generated from said light source located at a focal point of said parabolic reflective surface of rotation; and a liquid crystal display panel to which said visible light reflected by said reflector is converted and directed in parallel beams; said dielectric multilayer coating comprising an alternating structure of silicon dioxide layers and titanium dioxide layers so as to have a spectral transmittance of 20% for said visible light having a wavelength equal to or shorter than approximately 430 nm on a short wavelength side and a spectral transmittance of 50% for said visible light having a wavelength equal to or longer than approximately 830 nm on a longer wavelength side; said alternating structure comprising an under alternating structure of silicon dioxide layers each of which has a thickness of approximately 80 nm alternating with titanium dioxide layers each of which has a thickness of approximately 50 nm and a top alternating structure, deposited on the top of said under alternating structure, of silicon dioxide layers each of which has a thickness of approximately 110 nm alternating with titanium dioxide layers of a thickness of approximately 70 nm. - View Dependent Claims (4)
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Specification