Method for reducing dopant diffusion
First Claim
1. A process for inhibiting dopant diffusion in a semiconductor material, comprising the steps of:
- a. providing a semiconductor body having an upper surface and at least one unimplanted region devoid of dopant;
b. selecting a dopant for introduction into said semiconductor body to form at least one active region in said unimplanted region;
c. providing a dopant blocking layer in overlying relation with said at least one active region and introducing by way of a diffusion mechanism utilizing one of lattice vacancies or interstitial sites into said active region in accordance with the diffusion mechanism of said selected dopant;
d. introducing said selected dopant through said blocking layer and into said semiconductor body; and
e. activating said introduced dopant by heating said semiconductor body.
1 Assignment
0 Petitions
Accused Products
Abstract
A process is disclosed for inhibiting undesired diffusion of implanted dopants during and after dopant activation, as can occur during source/drain anneal. Undesired dopant diffusion is minimized by a dopant blocking layer, which is applied to the semiconductor body prior to dopant activation, and preferably prior to dopant implantation. The composition of the blocking layer is selected in accordance with the diffusion mechanism of the dopant to be implanted so that the concentration of lattice vacancies or interstitials (depending upon the dopant diffusion mechanism) is reduced, thereby inhibiting undesired migration of the implanted species.
28 Citations
20 Claims
-
1. A process for inhibiting dopant diffusion in a semiconductor material, comprising the steps of:
-
a. providing a semiconductor body having an upper surface and at least one unimplanted region devoid of dopant; b. selecting a dopant for introduction into said semiconductor body to form at least one active region in said unimplanted region; c. providing a dopant blocking layer in overlying relation with said at least one active region and introducing by way of a diffusion mechanism utilizing one of lattice vacancies or interstitial sites into said active region in accordance with the diffusion mechanism of said selected dopant; d. introducing said selected dopant through said blocking layer and into said semiconductor body; and e. activating said introduced dopant by heating said semiconductor body. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
-
-
18. A process for inhibiting dopant diffusion in a semiconductor material comprising the steps of:
-
a. providing a semiconductor body having an upper surface and at least one unimplanted region devoid of dopant; b. selecting a dopant for introduction into said semiconductor body to form at least one active region in said unimplanted region; c. introducing said dopant into said semiconductor body in a direction substantially transverse to said upper surface; d. providing a blocking layer in overlying relation with said at least one active region and introducing by way of a diffusion mechanism utilizing one of lattice vacancies or interstitial sites into said active regions in accordance with the diffusion mechanism of said selected dopant; and e. activating said implanted dopant by heating said semiconductor body. - View Dependent Claims (19, 20)
-
Specification