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Megasonic cleaning system

  • US 5,534,076 A
  • Filed: 10/03/1994
  • Issued: 07/09/1996
  • Est. Priority Date: 10/03/1994
  • Status: Expired due to Fees
First Claim
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1. An apparatus for processing semiconductor wafers comprising:

  • a tank having a wall including a portion forming a transmitter of sonic energy;

    a frame mounted to an exterior surface of said tank wall;

    a flexible diaphragm extending across and supported by said frame;

    a transducer carrier supported on the diaphragm with the carrier having a surface held by said diaphragm adjacent to the transmitter; and

    a transducer mounted to an opposite surface of said carrier.

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